IT1010161B - Sistema perfezionato di registra zione di un fascio di elettroni - Google Patents

Sistema perfezionato di registra zione di un fascio di elettroni

Info

Publication number
IT1010161B
IT1010161B IT21992/74A IT2199274A IT1010161B IT 1010161 B IT1010161 B IT 1010161B IT 21992/74 A IT21992/74 A IT 21992/74A IT 2199274 A IT2199274 A IT 2199274A IT 1010161 B IT1010161 B IT 1010161B
Authority
IT
Italy
Prior art keywords
recording
improved system
electron bundle
bundle
electron
Prior art date
Application number
IT21992/74A
Other languages
English (en)
Italian (it)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT1010161B publication Critical patent/IT1010161B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Radar Systems Or Details Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
IT21992/74A 1973-06-08 1974-04-29 Sistema perfezionato di registra zione di un fascio di elettroni IT1010161B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US368384A US3924113A (en) 1973-06-08 1973-06-08 Electron beam registration system

Publications (1)

Publication Number Publication Date
IT1010161B true IT1010161B (it) 1977-01-10

Family

ID=23450995

Family Applications (1)

Application Number Title Priority Date Filing Date
IT21992/74A IT1010161B (it) 1973-06-08 1974-04-29 Sistema perfezionato di registra zione di un fascio di elettroni

Country Status (7)

Country Link
US (1) US3924113A (enrdf_load_stackoverflow)
JP (1) JPS5248060B2 (enrdf_load_stackoverflow)
CA (1) CA1009766A (enrdf_load_stackoverflow)
DE (1) DE2424313C2 (enrdf_load_stackoverflow)
FR (1) FR2240484B1 (enrdf_load_stackoverflow)
GB (1) GB1427695A (enrdf_load_stackoverflow)
IT (1) IT1010161B (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2320665A1 (fr) * 1975-08-04 1977-03-04 Telecommunications Sa Perfectionnements aux filtres electromecaniques passe-bande de frequences
JPS5315076A (en) * 1976-07-28 1978-02-10 Nippon Telegr & Teleph Corp <Ntt> Electron beam position detection method
JPS5319764A (en) * 1976-08-09 1978-02-23 Nippon Telegr & Teleph Corp <Ntt> Mark detection system in electron beam exposure
DE2702448C2 (de) * 1977-01-20 1982-12-16 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Positionierung eines mit einer Marke versehenen Werkstückes relativ zu einem Abtastfeld bzw. zu einer Maske
DE2846316A1 (de) * 1978-10-24 1980-06-04 Siemens Ag Verfahren und vorrichtung zur automatischen ausrichtung von zwei aufeinander einzujustierenden objekten
JPS6058793B2 (ja) * 1980-03-24 1985-12-21 日電アネルバ株式会社 プラズマ分光監視装置
US4387433A (en) * 1980-12-24 1983-06-07 International Business Machines Corporation High speed data interface buffer for digitally controlled electron beam exposure system
JPS57106130A (en) * 1980-12-24 1982-07-01 Jeol Ltd Detecting method for mark
JPS57122517A (en) * 1981-01-22 1982-07-30 Nippon Telegr & Teleph Corp <Ntt> Alignment mark detector for electron beam exposure
JPS58122725A (ja) * 1982-01-14 1983-07-21 Nippon Telegr & Teleph Corp <Ntt> ビ−ム形状測定装置
US4546260A (en) * 1983-06-30 1985-10-08 International Business Machines Corporation Alignment technique
FR2586506B1 (fr) * 1985-08-20 1988-01-29 Primat Didier Procede et dispositif optique et electronique pour assurer la decoupe automatique de plaques
US4803644A (en) * 1985-09-20 1989-02-07 Hughes Aircraft Company Alignment mark detector for electron beam lithography
DE3735154C2 (de) * 1986-10-17 1994-10-20 Canon Kk Verfahren zum Erfassen der Lage einer auf einem Objekt vorgesehenen Marke
JPH0724256B2 (ja) * 1987-08-13 1995-03-15 日本電子株式会社 サイズ測定装置
US10566169B1 (en) 2008-06-30 2020-02-18 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
US10991545B2 (en) 2008-06-30 2021-04-27 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
DE102015117693A1 (de) * 2015-10-16 2017-04-20 Ald Vacuum Technologies Gmbh Verfahren zur Bestimmung der sich verändernden Lage des Auftreffpunktes eines energetischen Strahles auf einer begrenzten Fläche

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3328795A (en) * 1959-11-18 1967-06-27 Ling Temco Vought Inc Fixtaking means and method
US3329813A (en) * 1964-08-25 1967-07-04 Jeol Ltd Backscatter electron analysis apparatus to determine elemental content or surface topography of a specimen
US3535516A (en) * 1966-10-17 1970-10-20 Hitachi Ltd Electron microscope employing a modulated scanning beam and a phase sensitive detector to improve the signal to noise ratio
US3614736A (en) * 1968-05-21 1971-10-19 Ibm Pattern recognition apparatus and methods invariant to translation, scale change and rotation
US3646333A (en) * 1969-12-12 1972-02-29 Us Navy Digital correlator and integrator
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3745317A (en) * 1970-05-04 1973-07-10 Commissariat Energie Atomique System for generating the fourier transform of a function
US3644899A (en) * 1970-07-29 1972-02-22 Cogar Corp Method for determining partial memory chip categories
US3717756A (en) * 1970-10-30 1973-02-20 Electronic Communications High precision circulating digital correlator
US3777133A (en) * 1971-01-26 1973-12-04 C Wormald Cross correlator
CA953010A (en) * 1971-12-03 1974-08-13 Her Majesty In Right Of Canada As Represented By The Minister Of Transpo Rt Radar cross correlator
US3718813A (en) * 1972-01-19 1973-02-27 O Williams Technique for correlation method of determining system impulse response

Also Published As

Publication number Publication date
DE2424313C2 (de) 1984-03-01
DE2424313A1 (de) 1975-01-02
US3924113A (en) 1975-12-02
FR2240484A1 (enrdf_load_stackoverflow) 1975-03-07
CA1009766A (en) 1977-05-03
JPS5248060B2 (enrdf_load_stackoverflow) 1977-12-07
JPS5023782A (enrdf_load_stackoverflow) 1975-03-14
FR2240484B1 (enrdf_load_stackoverflow) 1976-06-25
GB1427695A (en) 1976-03-10

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