IN2014DN08844A - - Google Patents

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Publication number
IN2014DN08844A
IN2014DN08844A IN8844DEN2014A IN2014DN08844A IN 2014DN08844 A IN2014DN08844 A IN 2014DN08844A IN 8844DEN2014 A IN8844DEN2014 A IN 8844DEN2014A IN 2014DN08844 A IN2014DN08844 A IN 2014DN08844A
Authority
IN
India
Application number
Other languages
English (en)
Inventor
Frédéric Mayer
Original Assignee
E2V Semiconductors
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by E2V Semiconductors filed Critical E2V Semiconductors
Publication of IN2014DN08844A publication Critical patent/IN2014DN08844A/en

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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/15Charge-coupled device [CCD] image sensors
    • H10F39/151Geometry or disposition of pixel elements, address lines or gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/15Charge-coupled device [CCD] image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00Charge transfer devices
    • H10D44/40Charge-coupled devices [CCD]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/891Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D44/00, e.g. integration of charge-coupled devices [CCD] or charge injection devices [CID
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/15Charge-coupled device [CCD] image sensors
    • H10F39/152One-dimensional array CCD image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/15Charge-coupled device [CCD] image sensors
    • H10F39/153Two-dimensional or three-dimensional array CCD image sensors
    • H10F39/1538Time-delay and integration
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/806Optical elements or arrangements associated with the image sensors
    • H10F39/8063Microlenses
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/15Charge-coupled device [CCD] image sensors
    • H10F39/156CCD or CID colour image sensors
IN8844DEN2014 2012-05-03 2014-10-21 IN2014DN08844A (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1254070A FR2990299B1 (fr) 2012-05-03 2012-05-03 Capteur d'image matriciel a transfert de charges bidirectionnel a grilles dissymetriques
PCT/EP2013/057546 WO2013164169A1 (fr) 2012-05-03 2013-04-11 Capteur d'image matriciel a transfert de charges bidirectionnel a grilles dissymetriques

Publications (1)

Publication Number Publication Date
IN2014DN08844A true IN2014DN08844A (https=) 2015-05-22

Family

ID=46754595

Family Applications (1)

Application Number Title Priority Date Filing Date
IN8844DEN2014 IN2014DN08844A (https=) 2012-05-03 2014-10-21

Country Status (9)

Country Link
US (1) US9093353B2 (https=)
EP (1) EP2845231B1 (https=)
JP (1) JP6133973B2 (https=)
KR (1) KR102105730B1 (https=)
CN (1) CN104303306B (https=)
FR (1) FR2990299B1 (https=)
IL (1) IL235437B (https=)
IN (1) IN2014DN08844A (https=)
WO (1) WO2013164169A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2999387B2 (ja) 1995-02-22 2000-01-17 日本鋼管株式会社 チタン合金製ゴルフクラブヘッドおよびその製造方法
DE112016006634T5 (de) * 2016-03-23 2018-12-06 Psemi Corporation Anliegender bodykontakt für soi-transistor
KR20240042465A (ko) * 2021-08-12 2024-04-02 레니쇼우 피엘씨 위치 인코더 장치
CN119008646B (zh) * 2024-10-24 2025-01-24 合肥晶合集成电路股份有限公司 背照式图像传感器及其制备方法、电子设备

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3474638B2 (ja) * 1994-06-30 2003-12-08 株式会社東芝 固体撮像装置
US6906749B1 (en) 1998-09-16 2005-06-14 Dalsa, Inc. CMOS TDI image sensor
US6465820B1 (en) * 1998-09-16 2002-10-15 Dalsa, Inc. CMOS compatible single phase CCD charge transfer device
US6633058B1 (en) * 1999-07-26 2003-10-14 Dalsa, Inc. Variable reticulation time delay and integrate sensor
JP2003511920A (ja) 1999-10-05 2003-03-25 カリフォルニア インスティテュート オブ テクノロジー 能動画素センサによる時間遅延積分画像形成
US20020097330A1 (en) * 2001-01-25 2002-07-25 Spears Kurt E. Photosensor array using segmented charge transfer gates to improve processing time for small images
US8446508B2 (en) * 2005-07-27 2013-05-21 Sony Corporation Solid state imaging device with optimized locations of internal electrical components
FR2906080B1 (fr) 2006-09-19 2008-11-28 E2V Semiconductors Soc Par Act Capteur d'image en defilement par integrations successives et sommation, a pixels cmos actifs
US7923763B2 (en) 2007-03-08 2011-04-12 Teledyne Licensing, Llc Two-dimensional time delay integration visible CMOS image sensor
JP2009033286A (ja) * 2007-07-25 2009-02-12 Advanced Mask Inspection Technology Kk 蓄積型センサの駆動方法および蓄積型センサ
FR2924532B1 (fr) * 2007-11-30 2009-12-18 E2V Semiconductors Capteur d'image a pixel a quatre ou cinq transistors avec reduction de bruit de reinitialisation
JP5300577B2 (ja) * 2009-04-23 2013-09-25 三菱電機株式会社 Tdi方式のイメージセンサ、及び該イメージセンサの駆動方法
KR101621278B1 (ko) * 2009-07-27 2016-05-17 삼성전자주식회사 광 감지 장치 및 그 단위 픽셀
JP5568934B2 (ja) * 2009-09-29 2014-08-13 ソニー株式会社 固体撮像装置、固体撮像装置の製造方法、電子機器、レンズアレイ
FR2953642B1 (fr) * 2009-12-09 2012-07-13 E2V Semiconductors Capteur d'image multilineaire a integration de charges.
JP5509846B2 (ja) * 2009-12-28 2014-06-04 ソニー株式会社 固体撮像装置とその製造方法、及び電子機器
FR2959902B1 (fr) * 2010-05-04 2013-08-23 E2V Semiconductors Capteur d'image lineaire a defilement et sommation analogique et numerique et procede correspondant
FR2960341B1 (fr) 2010-05-18 2012-05-11 E2V Semiconductors Capteur d'image matriciel a transfert de charges a grille dissymetrique.
FR2961347B1 (fr) * 2010-06-15 2012-08-24 E2V Semiconductors Capteur d'image a multiplication d'electrons
FR2973162B1 (fr) * 2011-03-23 2013-11-22 E2V Semiconductors Capteur d'image a tres haute dynamique

Also Published As

Publication number Publication date
FR2990299B1 (fr) 2014-05-09
CN104303306A (zh) 2015-01-21
JP6133973B2 (ja) 2017-05-24
EP2845231B1 (fr) 2016-04-06
KR20150017698A (ko) 2015-02-17
JP2015524159A (ja) 2015-08-20
FR2990299A1 (fr) 2013-11-08
CN104303306B (zh) 2017-04-12
US20150123174A1 (en) 2015-05-07
US9093353B2 (en) 2015-07-28
KR102105730B1 (ko) 2020-04-28
IL235437B (en) 2019-05-30
IL235437A0 (en) 2014-12-31
WO2013164169A1 (fr) 2013-11-07
EP2845231A1 (fr) 2015-03-11

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