IN2014DN08844A - - Google Patents
Download PDFInfo
- Publication number
- IN2014DN08844A IN2014DN08844A IN8844DEN2014A IN2014DN08844A IN 2014DN08844 A IN2014DN08844 A IN 2014DN08844A IN 8844DEN2014 A IN8844DEN2014 A IN 8844DEN2014A IN 2014DN08844 A IN2014DN08844 A IN 2014DN08844A
- Authority
- IN
- India
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14831—Area CCD imagers
- H01L27/14856—Time-delay and integration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14806—Structural or functional details thereof
- H01L27/14812—Special geometry or disposition of pixel-elements, address lines or gate-electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/105—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components
- H01L27/1057—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components comprising charge coupled devices [CCD] or charge injection devices [CID]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
- H01L27/14627—Microlenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14825—Linear CCD imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/762—Charge transfer devices
- H01L29/765—Charge-coupled devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14868—CCD or CID colour imagers
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1254070A FR2990299B1 (en) | 2012-05-03 | 2012-05-03 | MATRIX IMAGE SENSOR WITH TWO-WAY CHARGING TRANSFER WITH DISSYMETRIC GRIDS |
PCT/EP2013/057546 WO2013164169A1 (en) | 2012-05-03 | 2013-04-11 | Matrix image sensor providing bidirectional charge transfer with asymmetric gates |
Publications (1)
Publication Number | Publication Date |
---|---|
IN2014DN08844A true IN2014DN08844A (en) | 2015-05-22 |
Family
ID=46754595
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN8844DEN2014 IN2014DN08844A (en) | 2012-05-03 | 2014-10-21 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9093353B2 (en) |
EP (1) | EP2845231B1 (en) |
JP (1) | JP6133973B2 (en) |
KR (1) | KR102105730B1 (en) |
CN (1) | CN104303306B (en) |
FR (1) | FR2990299B1 (en) |
IL (1) | IL235437B (en) |
IN (1) | IN2014DN08844A (en) |
WO (1) | WO2013164169A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG11201807808WA (en) * | 2016-03-23 | 2018-10-30 | Psemi Corp | Butted body contact for soi transistor |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3474638B2 (en) * | 1994-06-30 | 2003-12-08 | 株式会社東芝 | Solid-state imaging device |
US6906749B1 (en) | 1998-09-16 | 2005-06-14 | Dalsa, Inc. | CMOS TDI image sensor |
US6465820B1 (en) * | 1998-09-16 | 2002-10-15 | Dalsa, Inc. | CMOS compatible single phase CCD charge transfer device |
US6633058B1 (en) * | 1999-07-26 | 2003-10-14 | Dalsa, Inc. | Variable reticulation time delay and integrate sensor |
WO2001026382A1 (en) | 1999-10-05 | 2001-04-12 | California Institute Of Technology | Time-delayed-integration imaging with active pixel sensors |
US20020097330A1 (en) * | 2001-01-25 | 2002-07-25 | Spears Kurt E. | Photosensor array using segmented charge transfer gates to improve processing time for small images |
US8446508B2 (en) * | 2005-07-27 | 2013-05-21 | Sony Corporation | Solid state imaging device with optimized locations of internal electrical components |
FR2906080B1 (en) | 2006-09-19 | 2008-11-28 | E2V Semiconductors Soc Par Act | SCALING IMAGE SENSOR WITH SUCCESSIVE INTEGRATIONS AND SOMMATION, WITH ACTIVE CMOS PIXELS |
US7923763B2 (en) | 2007-03-08 | 2011-04-12 | Teledyne Licensing, Llc | Two-dimensional time delay integration visible CMOS image sensor |
JP2009033286A (en) * | 2007-07-25 | 2009-02-12 | Advanced Mask Inspection Technology Kk | Storage type sensor and driving method thereof |
FR2924532B1 (en) * | 2007-11-30 | 2009-12-18 | E2V Semiconductors | PIXEL FOUR OR FIVE TRANSISTOR IMAGE SENSOR WITH REDUCTION OF RESET NOISE |
JP5300577B2 (en) * | 2009-04-23 | 2013-09-25 | 三菱電機株式会社 | TDI image sensor and method for driving the image sensor |
KR101621278B1 (en) * | 2009-07-27 | 2016-05-17 | 삼성전자주식회사 | Photo detecting apparatus and unit pixel thereof |
JP5568934B2 (en) * | 2009-09-29 | 2014-08-13 | ソニー株式会社 | Solid-state imaging device, method for manufacturing solid-state imaging device, electronic device, lens array |
FR2953642B1 (en) * | 2009-12-09 | 2012-07-13 | E2V Semiconductors | MULTILINEAIRE IMAGE SENSOR WITH CHARGE INTEGRATION. |
JP5509846B2 (en) * | 2009-12-28 | 2014-06-04 | ソニー株式会社 | SOLID-STATE IMAGING DEVICE, ITS MANUFACTURING METHOD, AND ELECTRONIC DEVICE |
FR2959902B1 (en) * | 2010-05-04 | 2013-08-23 | E2V Semiconductors | LINEAR IMAGE SENSOR WITH SCROLL AND ANALOG AND DIGITAL SUMMIT AND METHOD THEREOF |
FR2960341B1 (en) * | 2010-05-18 | 2012-05-11 | E2V Semiconductors | MATRIX IMAGE SENSOR WITH TRANSFER OF DISSYMETRIC GRID LOADS. |
FR2961347B1 (en) * | 2010-06-15 | 2012-08-24 | E2V Semiconductors | ELECTRON MULTIPLICATION IMAGE SENSOR |
FR2973162B1 (en) * | 2011-03-23 | 2013-11-22 | E2V Semiconductors | VERY HIGH DYNAMIC IMAGE SENSOR |
-
2012
- 2012-05-03 FR FR1254070A patent/FR2990299B1/en not_active Expired - Fee Related
-
2013
- 2013-04-11 EP EP13714967.0A patent/EP2845231B1/en not_active Not-in-force
- 2013-04-11 US US14/397,725 patent/US9093353B2/en not_active Expired - Fee Related
- 2013-04-11 CN CN201380023055.8A patent/CN104303306B/en not_active Expired - Fee Related
- 2013-04-11 JP JP2015509353A patent/JP6133973B2/en not_active Expired - Fee Related
- 2013-04-11 WO PCT/EP2013/057546 patent/WO2013164169A1/en active Application Filing
- 2013-04-11 KR KR1020147029985A patent/KR102105730B1/en active IP Right Grant
-
2014
- 2014-10-21 IN IN8844DEN2014 patent/IN2014DN08844A/en unknown
- 2014-11-02 IL IL235437A patent/IL235437B/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
IL235437A0 (en) | 2014-12-31 |
CN104303306B (en) | 2017-04-12 |
FR2990299A1 (en) | 2013-11-08 |
JP2015524159A (en) | 2015-08-20 |
KR20150017698A (en) | 2015-02-17 |
WO2013164169A1 (en) | 2013-11-07 |
CN104303306A (en) | 2015-01-21 |
KR102105730B1 (en) | 2020-04-28 |
IL235437B (en) | 2019-05-30 |
EP2845231A1 (en) | 2015-03-11 |
US20150123174A1 (en) | 2015-05-07 |
EP2845231B1 (en) | 2016-04-06 |
US9093353B2 (en) | 2015-07-28 |
JP6133973B2 (en) | 2017-05-24 |
FR2990299B1 (en) | 2014-05-09 |