IN157312B - - Google Patents

Info

Publication number
IN157312B
IN157312B IN1046/CAL/82A IN1046CA1982A IN157312B IN 157312 B IN157312 B IN 157312B IN 1046CA1982 A IN1046CA1982 A IN 1046CA1982A IN 157312 B IN157312 B IN 157312B
Authority
IN
India
Application number
IN1046/CAL/82A
Inventor
John Francis Corboy Jr
Lubomir Leon Jastrzebski
Scott Carlton Blackstone
Robert Henry Pagliaro Jr
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23326867&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=IN157312(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Rca Corp filed Critical Rca Corp
Publication of IN157312B publication Critical patent/IN157312B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02381—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/0242—Crystalline insulating materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
    • H01L21/02639—Preparation of substrate for selective deposition
    • H01L21/02642—Mask materials other than SiO2 or SiN
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
    • H01L21/02647—Lateral overgrowth
IN1046/CAL/82A 1982-01-12 1982-09-10 IN157312B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US33895882A 1982-01-12 1982-01-12

Publications (1)

Publication Number Publication Date
IN157312B true IN157312B (en) 1986-03-01

Family

ID=23326867

Family Applications (1)

Application Number Title Priority Date Filing Date
IN1046/CAL/82A IN157312B (en) 1982-01-12 1982-09-10

Country Status (8)

Country Link
JP (1) JPS58120595A (en)
DE (1) DE3300716A1 (en)
FR (1) FR2522695B1 (en)
GB (1) GB2113465B (en)
IN (1) IN157312B (en)
IT (1) IT1173651B (en)
SE (1) SE462756B (en)
YU (1) YU6083A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6214424A (en) * 1985-07-11 1987-01-23 Fujitsu Ltd Manufacture of semiconductor device
JP2505754B2 (en) * 1986-07-11 1996-06-12 キヤノン株式会社 Method for manufacturing photoelectric conversion device
US4829016A (en) * 1987-10-19 1989-05-09 Purdue Research Foundation Bipolar transistor by selective and lateral epitaxial overgrowth
US5403771A (en) * 1990-12-26 1995-04-04 Canon Kabushiki Kaisha Process for producing a solar cell by means of epitaxial growth process
JP3272532B2 (en) * 1993-12-27 2002-04-08 富士通株式会社 Method for manufacturing semiconductor device
JP4832022B2 (en) * 2005-07-29 2011-12-07 株式会社日立国際電気 Substrate processing equipment
JP2010141079A (en) * 2008-12-11 2010-06-24 Hitachi Kokusai Electric Inc Method of manufacturing semiconductor device
JP2010147142A (en) * 2008-12-17 2010-07-01 Hitachi Kokusai Electric Inc Method for manufacturing semiconductor, and apparatus
JP2012054364A (en) * 2010-08-31 2012-03-15 Nobuyuki Akiyama Manufacturing method of silicon thin film, manufacturing method of silicon thin film solar cell, silicon thin film, silicon thin film solar cell
CN115198352B (en) * 2022-08-24 2024-03-26 西安奕斯伟材料科技股份有限公司 Epitaxial growth method and epitaxial wafer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL131048C (en) * 1960-01-15
US3746608A (en) * 1963-05-14 1973-07-17 Nitto Boseki Co Ltd Shaped article of synthetic resin having mechanically disordered orientation
DE2059116C3 (en) * 1970-12-01 1974-11-21 Siemens Ag, 1000 Berlin Und 8000 Muenchen Method for manufacturing a semiconductor component
US3945864A (en) * 1974-05-28 1976-03-23 Rca Corporation Method of growing thick expitaxial layers of silicon
DE3008058A1 (en) * 1980-03-03 1981-09-17 Robert Bosch Gmbh, 7000 Stuttgart Monolithic integrated circuit mfr. - by partial etching and refilling of conductor zones through mask

Also Published As

Publication number Publication date
IT8319043A0 (en) 1983-01-10
YU6083A (en) 1985-10-31
JPH0435439B2 (en) 1992-06-11
DE3300716A1 (en) 1983-07-21
FR2522695A1 (en) 1983-09-09
GB2113465B (en) 1986-08-06
SE8300040D0 (en) 1983-01-04
GB2113465A (en) 1983-08-03
FR2522695B1 (en) 1987-02-27
IT1173651B (en) 1987-06-24
JPS58120595A (en) 1983-07-18
DE3300716C2 (en) 1993-01-21
SE8300040L (en) 1983-07-13
SE462756B (en) 1990-08-27

Similar Documents

Publication Publication Date Title
FR2521793B1 (en)
DE3332617C2 (en)
DE8308439U1 (en)
FR2519544B1 (en)
DE3300700C2 (en)
DE8311722U1 (en)
DE3309908C2 (en)
DE8301364U1 (en)
DE3310082C2 (en)
DE3230566C2 (en)
IN157312B (en)
DE8209597U1 (en)
FR2520342B1 (en)
FR2519745B3 (en)
DE3337157C2 (en)
DE3213413C2 (en)
FR2524856B1 (en)
FR2520615B1 (en)
FR2520847B1 (en)
FR2521219B1 (en)
DE3201946C2 (en)
FR2519796B1 (en)
DE8208609U1 (en)
CH659266B (en)
FR2511229B1 (en)