IL296656B2 - שיטה לטיפול במצע מתכת להכנת אלקטרודות - Google Patents
שיטה לטיפול במצע מתכת להכנת אלקטרודותInfo
- Publication number
- IL296656B2 IL296656B2 IL296656A IL29665622A IL296656B2 IL 296656 B2 IL296656 B2 IL 296656B2 IL 296656 A IL296656 A IL 296656A IL 29665622 A IL29665622 A IL 29665622A IL 296656 B2 IL296656 B2 IL 296656B2
- Authority
- IL
- Israel
- Prior art keywords
- metal substrate
- nickel
- electrode
- oxides
- current density
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 122
- 239000002184 metal Substances 0.000 title claims description 122
- 239000000758 substrate Substances 0.000 title claims description 110
- 238000000034 method Methods 0.000 title claims description 69
- 238000011282 treatment Methods 0.000 title description 26
- 238000002360 preparation method Methods 0.000 title description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 70
- 238000000576 coating method Methods 0.000 claims description 37
- 239000011248 coating agent Substances 0.000 claims description 36
- 229910052759 nickel Inorganic materials 0.000 claims description 35
- 230000003197 catalytic effect Effects 0.000 claims description 34
- 230000008569 process Effects 0.000 claims description 20
- 238000004381 surface treatment Methods 0.000 claims description 18
- 239000003792 electrolyte Substances 0.000 claims description 13
- 150000002739 metals Chemical class 0.000 claims description 13
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 9
- 229910000510 noble metal Inorganic materials 0.000 claims description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 8
- 238000007654 immersion Methods 0.000 claims description 8
- 150000002910 rare earth metals Chemical group 0.000 claims description 8
- 238000005868 electrolysis reaction Methods 0.000 claims description 7
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 4
- 238000004070 electrodeposition Methods 0.000 claims description 4
- 229910017604 nitric acid Inorganic materials 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- 229910002065 alloy metal Inorganic materials 0.000 claims description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 3
- 239000004327 boric acid Substances 0.000 claims description 3
- 239000003014 ion exchange membrane Substances 0.000 claims description 3
- 150000002815 nickel Chemical class 0.000 claims description 2
- 239000000243 solution Substances 0.000 description 21
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 20
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 19
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 14
- 238000007788 roughening Methods 0.000 description 13
- 230000004580 weight loss Effects 0.000 description 13
- 239000002253 acid Substances 0.000 description 12
- 238000005530 etching Methods 0.000 description 11
- 229910052777 Praseodymium Inorganic materials 0.000 description 10
- 229910052763 palladium Inorganic materials 0.000 description 10
- 229910052697 platinum Inorganic materials 0.000 description 10
- 238000005488 sandblasting Methods 0.000 description 10
- 239000004576 sand Substances 0.000 description 9
- 238000010561 standard procedure Methods 0.000 description 8
- 230000010287 polarization Effects 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 229910052593 corundum Inorganic materials 0.000 description 4
- 239000010431 corundum Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000002484 cyclic voltammetry Methods 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000001033 granulometry Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/06—Etching of iron or steel
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
- C25B11/03—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form perforated or foraminous
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/10—Other heavy metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/02—Hydrogen or oxygen
- C25B1/04—Hydrogen or oxygen by electrolysis of water
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
- C25B1/46—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis in diaphragm cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/061—Metal or alloy
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
- C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
- C25B9/19—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Electrolytic Production Of Metals (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Battery Electrode And Active Subsutance (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT202000006187 | 2020-03-24 | ||
| PCT/EP2021/057498 WO2021191241A1 (en) | 2020-03-24 | 2021-03-23 | Method for the treatment of a metal substrate for the preparation of electrodes |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| IL296656A IL296656A (he) | 2022-11-01 |
| IL296656B1 IL296656B1 (he) | 2024-01-01 |
| IL296656B2 true IL296656B2 (he) | 2024-05-01 |
Family
ID=70918869
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL296656A IL296656B2 (he) | 2020-03-24 | 2021-03-23 | שיטה לטיפול במצע מתכת להכנת אלקטרודות |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US20230151503A1 (he) |
| EP (1) | EP4127275B1 (he) |
| JP (1) | JP2023523690A (he) |
| KR (1) | KR20220158061A (he) |
| CN (1) | CN115335556A (he) |
| AR (1) | AR121638A1 (he) |
| AU (1) | AU2021243591A1 (he) |
| BR (1) | BR112022019176A2 (he) |
| CA (1) | CA3175062A1 (he) |
| CL (1) | CL2022002604A1 (he) |
| ES (1) | ES2975497T3 (he) |
| IL (1) | IL296656B2 (he) |
| MX (1) | MX2022011840A (he) |
| TW (1) | TW202206653A (he) |
| WO (1) | WO2021191241A1 (he) |
| ZA (1) | ZA202210124B (he) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114481284A (zh) * | 2021-12-28 | 2022-05-13 | 清华大学 | 镍电极及其制备方法和应用 |
| CN114941153A (zh) * | 2022-05-31 | 2022-08-26 | 中自环保科技股份有限公司 | 基于质子交换膜的水电解膜电极、制备方法、组件及应用 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120305389A1 (en) * | 2010-02-10 | 2012-12-06 | Permelec Electrode Ltd. | Activated cathode for hydrogen evolution |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB526854A (en) * | 1939-03-27 | 1940-09-26 | Battelle Memorial Institute | Improvements in or relating to the electrolytic polishing of metal surfaces and an electrolyte therefor |
| IT1317969B1 (it) * | 2000-06-09 | 2003-07-21 | Nora Elettrodi De | Elettrodo caratterizzato da elevata adesione di uno strato cataliticosuperficiale. |
| CN101660194A (zh) * | 2009-09-18 | 2010-03-03 | 西北有色金属研究院 | 一种涂层导体用镍钨合金基带的电化学抛光方法 |
| WO2014069360A1 (ja) * | 2012-10-31 | 2014-05-08 | ダイソー株式会社 | ゼロギャップ式食塩電解槽用陽極、食塩電解槽、及びこれを用いる食塩電解方法 |
| CN106757299B (zh) * | 2016-12-15 | 2019-01-15 | 上海电气核电设备有限公司 | 一种镍基合金金相组织的电解抛光腐蚀剂及其使用方法 |
| CN106637377B (zh) * | 2016-12-19 | 2019-03-19 | 二重（德阳）重型装备有限公司 | 镍基合金电解抛光液及其抛光方法 |
| CN106521587A (zh) | 2016-12-29 | 2017-03-22 | 中核北方核燃料元件有限公司 | 一种不锈钢条带的镀镍方法 |
| CN108425144B (zh) * | 2018-03-23 | 2020-04-24 | 陕西师范大学 | 一种电催化全分解水产氢产氧的喀斯特泡沫镍的制备方法 |
| CN109750317B (zh) * | 2018-12-26 | 2020-06-30 | 浙江工业大学 | 一种多孔镍基铜铼复合析氢电极的制备方法 |
| CN110205670B (zh) * | 2019-07-10 | 2020-09-08 | 二重（德阳）重型装备有限公司 | 缓蚀性镍基合金电解抛光液及其抛光方法 |
| CN110592614B (zh) * | 2019-09-27 | 2021-05-11 | 西南石油大学 | 一种三维自支撑性水分解制氢电催化剂及其制备方法 |
| CN110760862A (zh) | 2019-11-26 | 2020-02-07 | 江东电子材料有限公司 | 一种光面粗化电解铜箔的生产工艺 |
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2021
- 2021-03-22 AR ARP210100715A patent/AR121638A1/es unknown
- 2021-03-23 WO PCT/EP2021/057498 patent/WO2021191241A1/en active Application Filing
- 2021-03-23 MX MX2022011840A patent/MX2022011840A/es unknown
- 2021-03-23 ES ES21713951T patent/ES2975497T3/es active Active
- 2021-03-23 JP JP2022557086A patent/JP2023523690A/ja active Pending
- 2021-03-23 KR KR1020227037070A patent/KR20220158061A/ko unknown
- 2021-03-23 AU AU2021243591A patent/AU2021243591A1/en active Pending
- 2021-03-23 CN CN202180023751.3A patent/CN115335556A/zh active Pending
- 2021-03-23 CA CA3175062A patent/CA3175062A1/en active Pending
- 2021-03-23 TW TW110110285A patent/TW202206653A/zh unknown
- 2021-03-23 BR BR112022019176A patent/BR112022019176A2/pt unknown
- 2021-03-23 IL IL296656A patent/IL296656B2/he unknown
- 2021-03-23 EP EP21713951.8A patent/EP4127275B1/en active Active
- 2021-03-23 US US17/906,429 patent/US20230151503A1/en active Pending
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2022
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120305389A1 (en) * | 2010-02-10 | 2012-12-06 | Permelec Electrode Ltd. | Activated cathode for hydrogen evolution |
Non-Patent Citations (1)
| Title |
|---|
| ORINIAKOVA, R., TURONOVA, A., KLADEKOVA, D., GALOVA, M., & SMITH, R. M., RECENT DEVELOPMENTS IN THE ELECTRODEPOSITION OF NICKEL AND SOME NICKEL-BASED ALLOYS, 30 September 2006 (2006-09-30) * |
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| US20230151503A1 (en) | 2023-05-18 |
| TW202206653A (zh) | 2022-02-16 |
| AU2021243591A1 (en) | 2022-09-29 |
| MX2022011840A (es) | 2022-10-20 |
| KR20220158061A (ko) | 2022-11-29 |
| CA3175062A1 (en) | 2021-09-30 |
| CN115335556A (zh) | 2022-11-11 |
| IL296656A (he) | 2022-11-01 |
| CL2022002604A1 (es) | 2023-04-21 |
| EP4127275A1 (en) | 2023-02-08 |
| ZA202210124B (en) | 2024-01-31 |
| IL296656B1 (he) | 2024-01-01 |
| BR112022019176A2 (pt) | 2022-11-01 |
| WO2021191241A1 (en) | 2021-09-30 |
| JP2023523690A (ja) | 2023-06-07 |
| ES2975497T3 (es) | 2024-07-08 |
| EP4127275B1 (en) | 2024-03-06 |
| AR121638A1 (es) | 2022-06-22 |
| EP4127275C0 (en) | 2024-03-06 |
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