IL141671A0 - Pellicle and method of using the same - Google Patents

Pellicle and method of using the same

Info

Publication number
IL141671A0
IL141671A0 IL14167101A IL14167101A IL141671A0 IL 141671 A0 IL141671 A0 IL 141671A0 IL 14167101 A IL14167101 A IL 14167101A IL 14167101 A IL14167101 A IL 14167101A IL 141671 A0 IL141671 A0 IL 141671A0
Authority
IL
Israel
Prior art keywords
pellicle
adhesive
bonding
ultra
same
Prior art date
Application number
IL14167101A
Other languages
English (en)
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of IL141671A0 publication Critical patent/IL141671A0/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Medical Preparation Storing Or Oral Administration Devices (AREA)
IL14167101A 2000-06-01 2001-02-27 Pellicle and method of using the same IL141671A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000164473 2000-06-01

Publications (1)

Publication Number Publication Date
IL141671A0 true IL141671A0 (en) 2002-03-10

Family

ID=18668087

Family Applications (1)

Application Number Title Priority Date Filing Date
IL14167101A IL141671A0 (en) 2000-06-01 2001-02-27 Pellicle and method of using the same

Country Status (7)

Country Link
US (1) US6713200B2 (de)
EP (1) EP1160624B1 (de)
KR (1) KR20010109470A (de)
AT (1) ATE324619T1 (de)
DE (1) DE60119026T2 (de)
IL (1) IL141671A0 (de)
TW (1) TWI269367B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000292908A (ja) * 1999-04-02 2000-10-20 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2003302745A (ja) * 2002-04-12 2003-10-24 Dainippon Printing Co Ltd 異物の無害化方法
US6984058B2 (en) 2003-06-04 2006-01-10 3M Innovative Properties Company Optical filters comprising opacified portion
US7829248B2 (en) * 2007-07-24 2010-11-09 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle stress relief
JP5169206B2 (ja) * 2007-12-21 2013-03-27 日本電気株式会社 フォトマスク受納器並びにこれを用いるレジスト検査方法及びその装置
JP4979088B2 (ja) * 2008-05-14 2012-07-18 信越化学工業株式会社 半導体リソグラフィー用ペリクル
WO2013158335A1 (en) * 2012-04-18 2013-10-24 Applied Materials, Inc. Apparatus and method to reduce particles in advance anneal process
JP7091121B2 (ja) 2018-04-18 2022-06-27 信越石英株式会社 石英ガラス板
KR102579196B1 (ko) * 2018-07-05 2023-09-14 어플라이드 머티어리얼스, 인코포레이티드 포토마스크 펠리클 접착제 잔류물 제거
JP7061288B2 (ja) * 2018-08-28 2022-04-28 日本軽金属株式会社 フラットパネルディスプレイ用ペリクル枠体及びその製造方法
CN113253566B (zh) * 2020-02-10 2024-04-09 永恒光实业股份有限公司 复合精细遮罩
CN112707016B (zh) * 2021-01-04 2023-02-17 长鑫存储技术有限公司 光罩保护装置及光罩保护系统

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63262651A (ja) * 1987-04-21 1988-10-28 Seiko Epson Corp フオトマスク保護膜
JPH01265513A (ja) * 1988-04-15 1989-10-23 Nec Corp 縮小投影露光装置
US5531857A (en) * 1988-07-08 1996-07-02 Cauldron Limited Partnership Removal of surface contaminants by irradiation from a high energy source
JP2938636B2 (ja) * 1991-09-26 1999-08-23 信越化学工業株式会社 リソグラフィ−用ペリクル
JPH0772617A (ja) 1993-09-02 1995-03-17 Shin Etsu Chem Co Ltd ペリクル
US5453816A (en) * 1994-09-22 1995-09-26 Micro Lithography, Inc. Protective mask for pellicle
JP3529062B2 (ja) * 1994-10-07 2004-05-24 株式会社渡辺商行 ペリクル及びレチクル
KR100253381B1 (ko) * 1997-12-17 2000-06-01 김영환 재활용 마스크 및 그 제조방법과 재활용방법
US6197454B1 (en) * 1998-12-29 2001-03-06 Intel Corporation Clean-enclosure window to protect photolithographic mask

Also Published As

Publication number Publication date
US6713200B2 (en) 2004-03-30
TWI269367B (en) 2006-12-21
DE60119026D1 (de) 2006-06-01
EP1160624B1 (de) 2006-04-26
EP1160624A2 (de) 2001-12-05
ATE324619T1 (de) 2006-05-15
DE60119026T2 (de) 2006-11-30
US20020007907A1 (en) 2002-01-24
KR20010109470A (ko) 2001-12-10
EP1160624A3 (de) 2003-10-22

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