IL135550A0 - Method and apparatus for temperature controlled vapor deposition on a substrate - Google Patents

Method and apparatus for temperature controlled vapor deposition on a substrate

Info

Publication number
IL135550A0
IL135550A0 IL13555000A IL13555000A IL135550A0 IL 135550 A0 IL135550 A0 IL 135550A0 IL 13555000 A IL13555000 A IL 13555000A IL 13555000 A IL13555000 A IL 13555000A IL 135550 A0 IL135550 A0 IL 135550A0
Authority
IL
Israel
Prior art keywords
substrate
vapor deposition
layer
temperature controlled
substance
Prior art date
Application number
IL13555000A
Other languages
English (en)
Original Assignee
Acktar Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Acktar Ltd filed Critical Acktar Ltd
Priority to IL13555000A priority Critical patent/IL135550A0/xx
Priority to PCT/IL2001/000326 priority patent/WO2001076768A1/fr
Priority to JP2001574276A priority patent/JP4439156B2/ja
Priority to AU2001250604A priority patent/AU2001250604A1/en
Priority to EP01923924A priority patent/EP1390157B1/fr
Priority to DE60133838T priority patent/DE60133838T2/de
Priority to AT01923924T priority patent/ATE393840T1/de
Publication of IL135550A0 publication Critical patent/IL135550A0/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
IL13555000A 2000-04-09 2000-04-09 Method and apparatus for temperature controlled vapor deposition on a substrate IL135550A0 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
IL13555000A IL135550A0 (en) 2000-04-09 2000-04-09 Method and apparatus for temperature controlled vapor deposition on a substrate
PCT/IL2001/000326 WO2001076768A1 (fr) 2000-04-09 2001-04-05 Procede et dispositif pour depot par evaporation sous vide en temperature controlee sur un substrat
JP2001574276A JP4439156B2 (ja) 2000-04-09 2001-04-05 基板上の温度制御された気相成長のための方法および装置
AU2001250604A AU2001250604A1 (en) 2000-04-09 2001-04-05 Method and apparatus for temperature controlled vapor deposition on a substrate
EP01923924A EP1390157B1 (fr) 2000-04-09 2001-04-05 Procede de depot par evaporation sous vide en temperature controlee sur un substrat
DE60133838T DE60133838T2 (de) 2000-04-09 2001-04-05 Verfahren zur temperaturgesteuerten dampfabscheidung auf einem substrat
AT01923924T ATE393840T1 (de) 2000-04-09 2001-04-05 Verfahren zur temperaturgesteuerten dampfabscheidung auf einem substrat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL13555000A IL135550A0 (en) 2000-04-09 2000-04-09 Method and apparatus for temperature controlled vapor deposition on a substrate

Publications (1)

Publication Number Publication Date
IL135550A0 true IL135550A0 (en) 2001-05-20

Family

ID=11074035

Family Applications (1)

Application Number Title Priority Date Filing Date
IL13555000A IL135550A0 (en) 2000-04-09 2000-04-09 Method and apparatus for temperature controlled vapor deposition on a substrate

Country Status (7)

Country Link
EP (1) EP1390157B1 (fr)
JP (1) JP4439156B2 (fr)
AT (1) ATE393840T1 (fr)
AU (1) AU2001250604A1 (fr)
DE (1) DE60133838T2 (fr)
IL (1) IL135550A0 (fr)
WO (1) WO2001076768A1 (fr)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2418628B (en) 2004-10-01 2006-12-13 Acktar Ltd Improved laminates and the manufacture thereof
JP4747658B2 (ja) * 2005-04-22 2011-08-17 大日本印刷株式会社 成膜装置及び成膜方法
JP4747665B2 (ja) * 2005-05-11 2011-08-17 大日本印刷株式会社 成膜装置及び成膜方法
RU2436787C2 (ru) 2005-07-29 2011-12-20 Тиботек Фармасьютикалз Лтд. Макроциклические ингибиторы вируса гепатита с
KR20100126717A (ko) * 2008-03-04 2010-12-02 솔렉슨트 코포레이션 태양 전지의 제조 방법
JP5528727B2 (ja) * 2009-06-19 2014-06-25 富士フイルム株式会社 薄膜トランジスタ製造装置、酸化物半導体薄膜の製造方法、薄膜トランジスタの製造方法、酸化物半導体薄膜、薄膜トランジスタ及び発光デバイス
JP5278218B2 (ja) * 2009-07-15 2013-09-04 住友金属鉱山株式会社 長尺樹脂フィルム処理装置およびロール冷却装置と、ロール冷却方法および長尺樹脂フィルムとロールの冷却方法
JP5959099B2 (ja) * 2011-07-29 2016-08-02 日東電工株式会社 積層体の製造方法
CN103628046B (zh) * 2012-08-24 2015-11-11 中微半导体设备(上海)有限公司 一种调节基片表面温度的控温系统和控温方法
US9220294B2 (en) 2014-02-11 2015-12-29 Timothy McCullough Methods and devices using cannabis vapors
US10821240B2 (en) 2014-02-11 2020-11-03 Vapor Cartridge Technology Llc Methods and drug delivery devices using cannabis
US9380813B2 (en) 2014-02-11 2016-07-05 Timothy McCullough Drug delivery system and method
US12112896B2 (en) 2019-02-20 2024-10-08 Panasonic Intellectual Property Management Co., Ltd. Film production method and electrode foil production method for producing layer containing metal oxide
WO2021055079A1 (fr) 2019-09-16 2021-03-25 Vapor Cartridge Technology Llc Système d'administration de médicament avec substrats empilables

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59173266A (ja) * 1983-03-23 1984-10-01 Fuji Photo Film Co Ltd 薄膜形成装置
WO1989001230A1 (fr) * 1987-07-30 1989-02-09 Matsushita Electric Industrial Co., Ltd. Condensateur electrolytique et procede de production d'un tel condensateur
US4844009A (en) * 1987-11-28 1989-07-04 Leybold Aktiengesellschaft Apparatus for coating webs of material having an open structure in depth
WO1989010430A1 (fr) * 1988-04-27 1989-11-02 American Thin Film Laboratories, Inc. Systeme d'enduction sous vide
US5239026A (en) * 1991-08-26 1993-08-24 Minnesota Mining And Manufacturing Company Low loss high numerical aperture cladded optical fibers
US5803976A (en) * 1993-11-09 1998-09-08 Imperial Chemical Industries Plc Vacuum web coating
TW289900B (fr) * 1994-04-22 1996-11-01 Gould Electronics Inc
TW359688B (en) * 1995-02-28 1999-06-01 Nisshin Steel Co Ltd High anticorrosion Zn-Mg series-plated steel sheet and method of manufacture it
BR9610069A (pt) * 1995-08-04 2000-05-09 Microcoating Technologies Disposição de vapor quìmico e formação de pó usando-se pulverização térmica com soluções de fluido quase super-crìticas e super-crìticas

Also Published As

Publication number Publication date
AU2001250604A1 (en) 2001-10-23
DE60133838D1 (de) 2008-06-12
WO2001076768A1 (fr) 2001-10-18
EP1390157A4 (fr) 2006-06-07
EP1390157B1 (fr) 2008-04-30
ATE393840T1 (de) 2008-05-15
DE60133838T2 (de) 2009-06-10
JP4439156B2 (ja) 2010-03-24
JP2005537385A (ja) 2005-12-08
EP1390157A1 (fr) 2004-02-25

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