IL128313A - מתקן לטפול בגז פליטה - Google Patents
מתקן לטפול בגז פליטהInfo
- Publication number
- IL128313A IL128313A IL12831399A IL12831399A IL128313A IL 128313 A IL128313 A IL 128313A IL 12831399 A IL12831399 A IL 12831399A IL 12831399 A IL12831399 A IL 12831399A IL 128313 A IL128313 A IL 128313A
- Authority
- IL
- Israel
- Prior art keywords
- exhaust gas
- air
- oxygen
- fluorine compound
- enriched air
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D53/229—Integrated processes (Diffusion and at least one other process, e.g. adsorption, absorption)
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
- B01D53/70—Organic halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Analytical Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Treating Waste Gases (AREA)
- Incineration Of Waste (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10022300A JPH11218318A (ja) | 1998-02-03 | 1998-02-03 | 排ガス処理設備 |
Publications (2)
Publication Number | Publication Date |
---|---|
IL128313A0 IL128313A0 (en) | 2000-01-31 |
IL128313A true IL128313A (he) | 2001-09-13 |
Family
ID=12078905
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL12831399A IL128313A (he) | 1998-02-03 | 1999-02-01 | מתקן לטפול בגז פליטה |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0933120A1 (he) |
JP (1) | JPH11218318A (he) |
KR (1) | KR19990072340A (he) |
IL (1) | IL128313A (he) |
SG (1) | SG73609A1 (he) |
TW (1) | TW457115B (he) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001104702A (ja) * | 1999-10-01 | 2001-04-17 | Air Liquide Japan Ltd | ガスの集合回収装置および集合回収方法 |
KR20010000569A (ko) * | 2000-10-06 | 2001-01-05 | 김형모 | 산소부화방식을 이용한 pfc 처리 시스템 |
US6527828B2 (en) | 2001-03-19 | 2003-03-04 | Advanced Technology Materials, Inc. | Oxygen enhanced CDA modification to a CDO integrated scrubber |
JP4454176B2 (ja) * | 2001-04-20 | 2010-04-21 | Nec液晶テクノロジー株式会社 | Pfcガス燃焼除害装置及びpfcガス燃焼除害方法 |
WO2002087732A2 (de) * | 2001-04-27 | 2002-11-07 | Infineon Technologies Ag | Zentrale verbrennungsanlage zur behandlung pfc-haltiger abluft |
US6551381B2 (en) * | 2001-07-23 | 2003-04-22 | Advanced Technology Materials, Inc. | Method for carbon monoxide reduction during thermal/wet abatement of organic compounds |
US6596054B2 (en) * | 2001-07-23 | 2003-07-22 | Advanced Technology Materials, Inc. | Method for carbon monoxide reduction during thermal/wet abatement of organic compounds |
US7736599B2 (en) | 2004-11-12 | 2010-06-15 | Applied Materials, Inc. | Reactor design to reduce particle deposition during process abatement |
JP2007095847A (ja) * | 2005-09-27 | 2007-04-12 | Sanyo Electric Co Ltd | デバイス製造方法およびデバイス製造装置 |
EP1954926A2 (en) | 2005-10-31 | 2008-08-13 | Applied Materials, Inc. | Process abatement reactor |
JP5468216B2 (ja) * | 2008-06-10 | 2014-04-09 | 昭和電工株式会社 | 過弗化物処理装置および過弗化物処理方法 |
JP5371734B2 (ja) | 2009-12-25 | 2013-12-18 | 三菱重工業株式会社 | Co2回収装置およびco2回収方法 |
TW201226039A (en) * | 2010-12-31 | 2012-07-01 | Cheng Yuan Environmental Technology Entpr Co Ltd | Gas-collection pipeline and method to reduce the total gas-collection flow quantity |
JP5622686B2 (ja) * | 2011-08-19 | 2014-11-12 | 大陽日酸株式会社 | 燃焼除害装置 |
GB2513300B (en) * | 2013-04-04 | 2017-10-11 | Edwards Ltd | Vacuum pumping and abatement system |
CN113446609A (zh) * | 2021-07-05 | 2021-09-28 | 北京京仪自动化装备技术股份有限公司 | 用于处理半导体制程中产生的清洁气体的系统及方法、装置 |
KR20230132267A (ko) * | 2022-03-08 | 2023-09-15 | 크라이오에이치앤아이(주) | 배기 가스 처리 장치 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS517765A (en) * | 1974-07-10 | 1976-01-22 | Uesuton Kogyo Kk | Tososochiniokeru haikidatsushushorihoho |
US5032148A (en) * | 1989-11-07 | 1991-07-16 | Membrane Technology & Research, Inc. | Membrane fractionation process |
WO1994005399A1 (en) * | 1992-09-09 | 1994-03-17 | Great Lakes Chemical Corporation | Method of decomposing gaseous halocarbons |
JP3091335B2 (ja) * | 1992-09-30 | 2000-09-25 | 神奈川県 | 爆轟波分解装置 |
JP2774751B2 (ja) * | 1993-02-18 | 1998-07-09 | 日本ファーネス工業株式会社 | 超低発熱量ガス燃焼装置 |
JP3277340B2 (ja) * | 1993-04-22 | 2002-04-22 | 日本酸素株式会社 | 半導体製造工場向け各種ガスの製造方法及び装置 |
JPH08946A (ja) * | 1994-06-22 | 1996-01-09 | Kenichi Nakagawa | 排ガスの脱臭方法 |
US5785741A (en) * | 1995-07-17 | 1998-07-28 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges, Claude | Process and system for separation and recovery of perfluorocompound gases |
US5858065A (en) * | 1995-07-17 | 1999-01-12 | American Air Liquide | Process and system for separation and recovery of perfluorocompound gases |
JP3486022B2 (ja) * | 1995-10-16 | 2004-01-13 | ジャパン・エア・ガシズ株式会社 | 排ガス処理装置 |
JP3382082B2 (ja) * | 1996-03-15 | 2003-03-04 | 株式会社東芝 | 廃棄物の処理方法および処理装置 |
-
1998
- 1998-02-03 JP JP10022300A patent/JPH11218318A/ja active Pending
-
1999
- 1999-01-26 TW TW088101143A patent/TW457115B/zh not_active IP Right Cessation
- 1999-01-29 EP EP99400206A patent/EP0933120A1/en not_active Withdrawn
- 1999-02-01 IL IL12831399A patent/IL128313A/he not_active IP Right Cessation
- 1999-02-01 KR KR1019990003185A patent/KR19990072340A/ko not_active Application Discontinuation
- 1999-02-01 SG SG1999000298A patent/SG73609A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
SG73609A1 (en) | 2000-06-20 |
IL128313A0 (en) | 2000-01-31 |
TW457115B (en) | 2001-10-01 |
EP0933120A1 (en) | 1999-08-04 |
JPH11218318A (ja) | 1999-08-10 |
KR19990072340A (ko) | 1999-09-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IL128313A (he) | מתקן לטפול בגז פליטה | |
JP3486022B2 (ja) | 排ガス処理装置 | |
KR100766749B1 (ko) | 과불화화합물 가스를 포함하는 대용량 배기가스 처리방법및 그 처리장치 | |
US7972582B2 (en) | Method and apparatus for treating exhaust gas | |
JP4153942B2 (ja) | 廃ガス処理装置 | |
US20060099123A1 (en) | Utilisation of waste gas streams | |
TWI434729B (zh) | 用於自氣體流移除氟之方法及裝置 | |
US20050249643A1 (en) | Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas | |
US20100258510A1 (en) | Methods and apparatus for treating effluent | |
WO1996024804A1 (en) | Improved closed loop incineration process | |
KR20160060116A (ko) | 소각 공정으로부터의 폐기물 기체 스트림의 오존 첨가에 의한 처리 방법 | |
KR20020034964A (ko) | 기체 스트림으로부터 유해물질의 제거방법 | |
US5817909A (en) | Purification of waste/industrial effluents comprising organic/inorganic pollutants | |
JP6595148B2 (ja) | 排ガスの減圧除害装置 | |
KR20110023253A (ko) | 폐냉매 처리 장치 및 방법 | |
JP2005224797A (ja) | フッ素生成により生じる水素を処理するための方法と装置、及び同装置を備えたフッ素発生器 | |
JP2881210B2 (ja) | 有毒性排ガスの処理方法及び装置 | |
JP2022507799A (ja) | ペルフルオロ化合物の除害方法 | |
JPH02103311A (ja) | 有毒性排ガスの燃焼処理方法 | |
KR100335737B1 (ko) | 유해개스 처리를 위한 플라즈마 처리 시스템 | |
JPH02126014A (ja) | 有毒性ガスの燃焼処理方法及び装置 | |
KR101635065B1 (ko) | 사전 수처리 장치를 포함하는 스크러버 | |
JP3908818B2 (ja) | 排ガスの処理方法 | |
JP2013044479A (ja) | 塩化珪素化合物を含む排ガスの浄化方法 | |
KR20160127925A (ko) | 난분해성 유해가스의 처리장치 및 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM9K | Patent not in force due to non-payment of renewal fees |