IL127236A0 - Apparatus for sputtering or arc evaporation - Google Patents

Apparatus for sputtering or arc evaporation

Info

Publication number
IL127236A0
IL127236A0 IL12723698A IL12723698A IL127236A0 IL 127236 A0 IL127236 A0 IL 127236A0 IL 12723698 A IL12723698 A IL 12723698A IL 12723698 A IL12723698 A IL 12723698A IL 127236 A0 IL127236 A0 IL 127236A0
Authority
IL
Israel
Prior art keywords
sputtering
arc evaporation
evaporation
arc
Prior art date
Application number
IL12723698A
Other languages
English (en)
Original Assignee
Vapor Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vapor Technologies Inc filed Critical Vapor Technologies Inc
Publication of IL127236A0 publication Critical patent/IL127236A0/xx
Priority claimed from CA002385393A external-priority patent/CA2385393A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
IL12723698A 1997-11-26 1998-11-24 Apparatus for sputtering or arc evaporation IL127236A0 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97910097A 1997-11-26 1997-11-26
CA002385393A CA2385393A1 (en) 1997-11-26 2002-05-06 Linear magnetron arc evaporation or sputtering source

Publications (1)

Publication Number Publication Date
IL127236A0 true IL127236A0 (en) 1999-09-22

Family

ID=32714129

Family Applications (1)

Application Number Title Priority Date Filing Date
IL12723698A IL127236A0 (en) 1997-11-26 1998-11-24 Apparatus for sputtering or arc evaporation

Country Status (13)

Country Link
US (1) US6350356B1 (pt)
JP (1) JP4253385B2 (pt)
AU (1) AU9410498A (pt)
BR (1) BR9816084B1 (pt)
CA (1) CA2254677C (pt)
DE (1) DE19853943B4 (pt)
FR (1) FR2772185B1 (pt)
GB (1) GB2331768B (pt)
IL (1) IL127236A0 (pt)
IT (1) IT1302881B1 (pt)
PL (1) PL329905A1 (pt)
RU (1) RU2168233C2 (pt)
TW (1) TW404986B (pt)

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US7498587B2 (en) * 2006-05-01 2009-03-03 Vapor Technologies, Inc. Bi-directional filtered arc plasma source
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US7772571B2 (en) 2007-10-08 2010-08-10 Advanced Ion Beam Technology, Inc. Implant beam utilization in an ion implanter
WO2009052544A1 (en) * 2007-10-26 2009-04-30 Steven Arnold Sesselmann Ion implantation device
US9175383B2 (en) 2008-01-16 2015-11-03 Applied Materials, Inc. Double-coating device with one process chamber
EP2081212B1 (en) * 2008-01-16 2016-03-23 Applied Materials, Inc. Double-Coating Device with one Process Chamber
US8574410B2 (en) * 2008-04-22 2013-11-05 The Regents Of The University Of California Method and apparatus for improved high power impulse magnetron sputtering
US9153422B2 (en) * 2011-08-02 2015-10-06 Envaerospace, Inc. Arc PVD plasma source and method of deposition of nanoimplanted coatings
CN104046943B (zh) 2013-03-15 2018-06-05 蒸汽技术公司 低压电弧等离子体浸没涂层气相沉积和离子处理
DE102013206210B4 (de) * 2013-04-09 2017-05-04 Von Ardenne Gmbh Vakuumbeschichtungsvorrichtung und Verfahren zur Mehrfachbeschichtung
RU2532779C1 (ru) * 2013-04-19 2014-11-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский государственный технический университет имени Н.Э. Баумана" (МГТУ им. Н.Э. Баумана) Способ и устройство для ускоренного азотирования деталей машин с использованием импульсов электромагнитного поля
AT13830U1 (de) * 2013-04-22 2014-09-15 Plansee Se Lichtbogenverdampfungs-Beschichtungsquelle
UA86105U (uk) * 2013-07-09 2013-12-10 Общество С Ограниченной Ответственностью "Грэсэм Иновейшн" Плазмово-дуговий пристрій формування покриттів
CA2867451C (en) 2013-10-28 2021-06-29 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
JP6403269B2 (ja) * 2014-07-30 2018-10-10 株式会社神戸製鋼所 アーク蒸発源
DE102015004856A1 (de) * 2015-04-15 2016-10-20 Oerlikon Metaplas Gmbh Bipolares Arc-Beschichtungsverfahren
KR102140598B1 (ko) * 2016-07-12 2020-08-03 어플라이드 머티어리얼스, 인코포레이티드 스퍼터 증착 소스, 스퍼터 증착 장치 및 스퍼터 증착 소스를 동작시키는 방법
US11322338B2 (en) * 2017-08-31 2022-05-03 Taiwan Semiconductor Manufacturing Co., Ltd. Sputter target magnet
US11053670B2 (en) 2018-08-23 2021-07-06 Spectrum Brands, Inc. Faucet spray head alignment system
MX2021001061A (es) 2018-08-23 2021-05-27 Spectrum Brands Inc Sistema de alineacion de cabezal de rociado de grifo.
RU2685828C1 (ru) * 2018-09-26 2019-04-23 Акционерное общество "Научно-производственное объединение "Центральный научно-исследовательский институт технологии машиностроения", АО "НПО "ЦНИИТМАШ" Устройство для нанесения покрытия вакуумно-дуговым испарением
CN114823252B (zh) * 2022-04-29 2023-07-14 电子科技大学 一种基于冷阴极的双向多注行波级联放大器

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Also Published As

Publication number Publication date
DE19853943B4 (de) 2006-04-20
GB9825775D0 (en) 1999-01-20
GB2331768B (en) 2003-03-05
BR9816084B1 (pt) 2010-10-19
BR9816084A (pt) 2004-07-13
CA2254677C (en) 2002-10-01
PL329905A1 (en) 1999-06-07
CA2254677A1 (en) 1999-05-26
RU2168233C2 (ru) 2001-05-27
JP2000026966A (ja) 2000-01-25
US6350356B1 (en) 2002-02-26
DE19853943A1 (de) 1999-07-15
FR2772185A1 (fr) 1999-06-11
FR2772185B1 (fr) 2003-06-27
JP4253385B2 (ja) 2009-04-08
GB2331768A (en) 1999-06-02
AU9410498A (en) 1999-06-17
ITRM980725A1 (it) 2000-05-26
TW404986B (en) 2000-09-11
IT1302881B1 (it) 2000-10-10

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