BR9816084B1 - catodo para evaporação catódica ou evaporação a arco e aparelho para revestimento ou implantação de ìons de substratos. - Google Patents

catodo para evaporação catódica ou evaporação a arco e aparelho para revestimento ou implantação de ìons de substratos.

Info

Publication number
BR9816084B1
BR9816084B1 BRPI9816084-2A BR9816084A BR9816084B1 BR 9816084 B1 BR9816084 B1 BR 9816084B1 BR 9816084 A BR9816084 A BR 9816084A BR 9816084 B1 BR9816084 B1 BR 9816084B1
Authority
BR
Brazil
Prior art keywords
evaporation
cathode
coating
cathodic
substrate ions
Prior art date
Application number
BRPI9816084-2A
Other languages
English (en)
Other versions
BR9816084A (pt
Inventor
Richard P Welty
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority claimed from CA002385393A external-priority patent/CA2385393A1/en
Publication of BR9816084A publication Critical patent/BR9816084A/pt
Publication of BR9816084B1 publication Critical patent/BR9816084B1/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
BRPI9816084-2A 1997-11-26 1998-11-26 catodo para evaporação catódica ou evaporação a arco e aparelho para revestimento ou implantação de ìons de substratos. BR9816084B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97910097A 1997-11-26 1997-11-26
CA002385393A CA2385393A1 (en) 1997-11-26 2002-05-06 Linear magnetron arc evaporation or sputtering source

Publications (2)

Publication Number Publication Date
BR9816084A BR9816084A (pt) 2004-07-13
BR9816084B1 true BR9816084B1 (pt) 2010-10-19

Family

ID=32714129

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI9816084-2A BR9816084B1 (pt) 1997-11-26 1998-11-26 catodo para evaporação catódica ou evaporação a arco e aparelho para revestimento ou implantação de ìons de substratos.

Country Status (13)

Country Link
US (1) US6350356B1 (pt)
JP (1) JP4253385B2 (pt)
AU (1) AU9410498A (pt)
BR (1) BR9816084B1 (pt)
CA (1) CA2254677C (pt)
DE (1) DE19853943B4 (pt)
FR (1) FR2772185B1 (pt)
GB (1) GB2331768B (pt)
IL (1) IL127236A0 (pt)
IT (1) IT1302881B1 (pt)
PL (1) PL329905A1 (pt)
RU (1) RU2168233C2 (pt)
TW (1) TW404986B (pt)

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CA2867451C (en) 2013-10-28 2021-06-29 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
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DE102015004856A1 (de) * 2015-04-15 2016-10-20 Oerlikon Metaplas Gmbh Bipolares Arc-Beschichtungsverfahren
KR102140598B1 (ko) * 2016-07-12 2020-08-03 어플라이드 머티어리얼스, 인코포레이티드 스퍼터 증착 소스, 스퍼터 증착 장치 및 스퍼터 증착 소스를 동작시키는 방법
US11322338B2 (en) * 2017-08-31 2022-05-03 Taiwan Semiconductor Manufacturing Co., Ltd. Sputter target magnet
US11053670B2 (en) 2018-08-23 2021-07-06 Spectrum Brands, Inc. Faucet spray head alignment system
CN112639227B (zh) 2018-08-23 2023-02-28 品谱股份有限公司 水龙头喷头对准系统
RU2685828C1 (ru) * 2018-09-26 2019-04-23 Акционерное общество "Научно-производственное объединение "Центральный научно-исследовательский институт технологии машиностроения", АО "НПО "ЦНИИТМАШ" Устройство для нанесения покрытия вакуумно-дуговым испарением
CN114823252B (zh) * 2022-04-29 2023-07-14 电子科技大学 一种基于冷阴极的双向多注行波级联放大器

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Also Published As

Publication number Publication date
FR2772185A1 (fr) 1999-06-11
CA2254677A1 (en) 1999-05-26
IT1302881B1 (it) 2000-10-10
GB2331768A (en) 1999-06-02
ITRM980725A1 (it) 2000-05-26
TW404986B (en) 2000-09-11
JP4253385B2 (ja) 2009-04-08
GB2331768B (en) 2003-03-05
AU9410498A (en) 1999-06-17
DE19853943A1 (de) 1999-07-15
RU2168233C2 (ru) 2001-05-27
BR9816084A (pt) 2004-07-13
CA2254677C (en) 2002-10-01
DE19853943B4 (de) 2006-04-20
PL329905A1 (en) 1999-06-07
FR2772185B1 (fr) 2003-06-27
GB9825775D0 (en) 1999-01-20
US6350356B1 (en) 2002-02-26
IL127236A0 (en) 1999-09-22
JP2000026966A (ja) 2000-01-25

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