AU4410499A - Target for pvd and similar processes - Google Patents

Target for pvd and similar processes

Info

Publication number
AU4410499A
AU4410499A AU44104/99A AU4410499A AU4410499A AU 4410499 A AU4410499 A AU 4410499A AU 44104/99 A AU44104/99 A AU 44104/99A AU 4410499 A AU4410499 A AU 4410499A AU 4410499 A AU4410499 A AU 4410499A
Authority
AU
Australia
Prior art keywords
pvd
target
similar processes
processes
similar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU44104/99A
Inventor
Kevin Williams
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SPUTTERING MATERIALS Inc
Original Assignee
SPUTTERING MATERIALS Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SPUTTERING MATERIALS Inc filed Critical SPUTTERING MATERIALS Inc
Publication of AU4410499A publication Critical patent/AU4410499A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
AU44104/99A 1998-05-28 1999-05-28 Target for pvd and similar processes Abandoned AU4410499A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US8737198P 1998-05-28 1998-05-28
US60087371 1998-05-28
PCT/US1999/012085 WO1999061679A1 (en) 1998-05-28 1999-05-28 Target for pvd and similar processes

Publications (1)

Publication Number Publication Date
AU4410499A true AU4410499A (en) 1999-12-13

Family

ID=22204788

Family Applications (1)

Application Number Title Priority Date Filing Date
AU44104/99A Abandoned AU4410499A (en) 1998-05-28 1999-05-28 Target for pvd and similar processes

Country Status (2)

Country Link
AU (1) AU4410499A (en)
WO (1) WO1999061679A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10760156B2 (en) 2017-10-13 2020-09-01 Honeywell International Inc. Copper manganese sputtering target
US11035036B2 (en) 2018-02-01 2021-06-15 Honeywell International Inc. Method of forming copper alloy sputtering targets with refined shape and microstructure
CN114231940A (en) * 2021-12-08 2022-03-25 安徽光智科技有限公司 Method for preparing molybdenum sputtering target material by using molybdenum carbonyl as precursor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5055246A (en) * 1991-01-22 1991-10-08 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Method of forming high purity metal silicides targets for sputtering
DE4138926A1 (en) * 1991-11-27 1993-06-03 Leybold Ag Prodn. of indium-tin oxide targets in CVD reactor - by depositing thermally decomposable tin and indium cpds. with addn. of oxygen@ onto substrate
DE4418906B4 (en) * 1994-05-31 2004-03-25 Unaxis Deutschland Holding Gmbh Process for coating a substrate and coating system for carrying it out

Also Published As

Publication number Publication date
WO1999061679A1 (en) 1999-12-02

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase