IL126189A - שיטה והתקן לייבוש וניקוי עצמים בשימוש באוירוסול - Google Patents
שיטה והתקן לייבוש וניקוי עצמים בשימוש באוירוסולInfo
- Publication number
- IL126189A IL126189A IL12618997A IL12618997A IL126189A IL 126189 A IL126189 A IL 126189A IL 12618997 A IL12618997 A IL 12618997A IL 12618997 A IL12618997 A IL 12618997A IL 126189 A IL126189 A IL 126189A
- Authority
- IL
- Israel
- Prior art keywords
- liquid
- enclosed chamber
- drying
- rinse liquid
- chamber
- Prior art date
Links
- 239000000443 aerosol Substances 0.000 title claims description 46
- 238000000034 method Methods 0.000 title claims description 44
- 238000001035 drying Methods 0.000 title claims description 32
- 238000004140 cleaning Methods 0.000 title description 7
- 239000007788 liquid Substances 0.000 claims description 182
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 20
- 239000002245 particle Substances 0.000 claims description 20
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 18
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 14
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 12
- 239000000356 contaminant Substances 0.000 claims description 12
- 239000012530 fluid Substances 0.000 claims description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 8
- 235000019441 ethanol Nutrition 0.000 claims description 6
- 229960004624 perflexane Drugs 0.000 claims description 4
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 claims description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 4
- 238000004891 communication Methods 0.000 claims description 2
- 239000007791 liquid phase Substances 0.000 claims 2
- 230000008569 process Effects 0.000 description 26
- 239000010408 film Substances 0.000 description 20
- 239000007789 gas Substances 0.000 description 19
- 239000000126 substance Substances 0.000 description 15
- 239000011261 inert gas Substances 0.000 description 11
- 235000012431 wafers Nutrition 0.000 description 9
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 8
- 238000010926 purge Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000010409 thin film Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 238000013459 approach Methods 0.000 description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 230000002079 cooperative effect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/14—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects using gases or vapours other than air or steam, e.g. inert gases
- F26B21/145—Condensing the vapour onto the surface of the materials to be dried
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/005—Drying solid materials or objects by processes not involving the application of heat by dipping them into or mixing them with a chemical liquid, e.g. organic; chemical, e.g. organic, dewatering aids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/616,165 US5685086A (en) | 1995-06-07 | 1996-03-14 | Method and apparatus for drying objects using aerosols |
| US62468996A | 1996-03-25 | 1996-03-25 | |
| PCT/US1997/003952 WO1997033702A1 (en) | 1996-03-14 | 1997-03-13 | Method and apparatus for drying and cleaning objects using aerosols |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL126189A0 IL126189A0 (en) | 1999-05-09 |
| IL126189A true IL126189A (he) | 2001-08-08 |
Family
ID=27087685
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL12618997A IL126189A (he) | 1996-03-14 | 1997-03-13 | שיטה והתקן לייבוש וניקוי עצמים בשימוש באוירוסול |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP0886548B1 (he) |
| JP (1) | JP3955924B2 (he) |
| KR (1) | KR100299486B1 (he) |
| CA (1) | CA2248759A1 (he) |
| DE (1) | DE69733686T2 (he) |
| IL (1) | IL126189A (he) |
| WO (1) | WO1997033702A1 (he) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999026976A1 (en) * | 1997-11-26 | 1999-06-03 | Eli Lilly And Company | Tnf ligand family gene |
| US6270584B1 (en) * | 1997-12-03 | 2001-08-07 | Gary W. Ferrell | Apparatus for drying and cleaning objects using controlled aerosols and gases |
| US6245158B1 (en) * | 1998-06-02 | 2001-06-12 | Cfmt, Inc. | Wet processing methods for the manufacture of electronic components using liquids of varying temperature |
| JP3174038B2 (ja) | 1999-01-18 | 2001-06-11 | 東邦化成株式会社 | 基板乾燥方法およびその装置 |
| US7377053B1 (en) * | 2000-01-17 | 2008-05-27 | Daikin Industries, Ltd. | Method and device for drying substrate |
| JP3802446B2 (ja) | 2002-05-15 | 2006-07-26 | 東邦化成株式会社 | 基板乾燥方法およびその装置 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS553607B2 (he) * | 1973-01-05 | 1980-01-25 | ||
| US4310973A (en) * | 1977-12-01 | 1982-01-19 | Phillips Petroleum Co. | Drying polymer solutions |
| US4334366A (en) * | 1980-09-24 | 1982-06-15 | Jetsonic Processes, Ltd. | Sonic energy perforated drum for rotary dryers |
| US4561192A (en) * | 1982-11-29 | 1985-12-31 | Dairyman's Cooperative Creamery Assoc. | Spray drying apparatus and method |
| DE68921757T2 (de) * | 1989-11-23 | 1995-10-26 | Cfm Technologies Inc | Verfahren zum Trocknen von Oberflächen. |
| US5054210A (en) * | 1990-02-23 | 1991-10-08 | S&K Products International, Inc. | Isopropyl alcohol vapor dryer system |
| US5000208A (en) * | 1990-06-21 | 1991-03-19 | Micron Technology, Inc. | Wafer rinser/dryer |
| US5143103A (en) * | 1991-01-04 | 1992-09-01 | International Business Machines Corporation | Apparatus for cleaning and drying workpieces |
| JP2639771B2 (ja) * | 1991-11-14 | 1997-08-13 | 大日本スクリーン製造株式会社 | 基板の洗浄・乾燥処理方法並びにその処理装置 |
| US5229171A (en) * | 1991-12-23 | 1993-07-20 | Research Triangle Institute | Apparatus and method for uniformly coating a substrate in an evacuable chamber |
| US5226242A (en) * | 1992-02-18 | 1993-07-13 | Santa Clara Plastics, Division Of Preco, Inc. | Vapor jet dryer apparatus and method |
| US5419351A (en) * | 1993-04-02 | 1995-05-30 | National Semiconductor Corporation | Final rinse/dry system for critical cleaning applications |
| JP3347814B2 (ja) * | 1993-05-17 | 2002-11-20 | 大日本スクリーン製造株式会社 | 基板の洗浄・乾燥処理方法並びにその処理装置 |
| CH688556A5 (it) * | 1993-12-09 | 1997-11-14 | Franco Carloni | Apparecchio elettrodomestico per lavare e/o asciugare utilizzante l'acqua calda dell'impianto centralizzato circolante in serpentine. |
| US5653045A (en) * | 1995-06-07 | 1997-08-05 | Ferrell; Gary W. | Method and apparatus for drying parts and microelectronic components using sonic created mist |
-
1997
- 1997-03-13 JP JP53282997A patent/JP3955924B2/ja not_active Expired - Fee Related
- 1997-03-13 KR KR1019980707239A patent/KR100299486B1/ko not_active Expired - Fee Related
- 1997-03-13 DE DE69733686T patent/DE69733686T2/de not_active Expired - Lifetime
- 1997-03-13 IL IL12618997A patent/IL126189A/he not_active IP Right Cessation
- 1997-03-13 CA CA002248759A patent/CA2248759A1/en not_active Abandoned
- 1997-03-13 WO PCT/US1997/003952 patent/WO1997033702A1/en active IP Right Grant
- 1997-03-13 EP EP97916750A patent/EP0886548B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE69733686T2 (de) | 2006-05-04 |
| JP2000507044A (ja) | 2000-06-06 |
| JP3955924B2 (ja) | 2007-08-08 |
| KR100299486B1 (ko) | 2001-09-06 |
| WO1997033702A1 (en) | 1997-09-18 |
| DE69733686D1 (de) | 2005-08-11 |
| IL126189A0 (en) | 1999-05-09 |
| EP0886548A1 (en) | 1998-12-30 |
| EP0886548A4 (en) | 2002-03-20 |
| KR19990087765A (ko) | 1999-12-27 |
| CA2248759A1 (en) | 1997-09-18 |
| EP0886548B1 (en) | 2005-07-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FF | Patent granted | ||
| RH1 | Patent not in force |