DE68921757T2 - Verfahren zum Trocknen von Oberflächen. - Google Patents
Verfahren zum Trocknen von Oberflächen.Info
- Publication number
- DE68921757T2 DE68921757T2 DE1989621757 DE68921757T DE68921757T2 DE 68921757 T2 DE68921757 T2 DE 68921757T2 DE 1989621757 DE1989621757 DE 1989621757 DE 68921757 T DE68921757 T DE 68921757T DE 68921757 T2 DE68921757 T2 DE 68921757T2
- Authority
- DE
- Germany
- Prior art keywords
- drying surfaces
- drying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/14—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects using gases or vapours other than air or steam, e.g. inert gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP19890121671 EP0428784B1 (de) | 1989-11-23 | 1989-11-23 | Verfahren zum Trocknen von Oberflächen |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68921757D1 DE68921757D1 (de) | 1995-04-20 |
DE68921757T2 true DE68921757T2 (de) | 1995-10-26 |
Family
ID=8202157
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1989621757 Expired - Lifetime DE68921757T2 (de) | 1989-11-23 | 1989-11-23 | Verfahren zum Trocknen von Oberflächen. |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0428784B1 (de) |
DE (1) | DE68921757T2 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5352328A (en) * | 1992-12-15 | 1994-10-04 | At&T Bell Laboratories | Control of time-dependent haze in the manufacture of integrated circuits |
WO1997033702A1 (en) * | 1996-03-14 | 1997-09-18 | All In One Microservice, Inc. | Method and apparatus for drying and cleaning objects using aerosols |
JPH1126423A (ja) * | 1997-07-09 | 1999-01-29 | Sugai:Kk | 半導体ウエハ等の処理方法並びにその処理装置 |
US5983907A (en) * | 1997-08-05 | 1999-11-16 | Seh America, Inc. | Method of drying semiconductor wafers using hot deionized water and infrared drying |
US5884640A (en) * | 1997-08-07 | 1999-03-23 | Applied Materials, Inc. | Method and apparatus for drying substrates |
US6558964B2 (en) * | 2000-12-27 | 2003-05-06 | Lam Research Corporation | Method and apparatus for monitoring a semiconductor wafer during a spin drying operation |
DE102004026565B4 (de) * | 2004-05-29 | 2008-07-31 | Khs Ag | Verfahren zum Reinigen von Flaschen o.dgl. Behälter sowie Reinigungsmaschine |
CN111578680B (zh) * | 2019-02-15 | 2022-01-11 | 北京北方华创微电子装备有限公司 | 一种晶圆的干燥方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4778532A (en) * | 1985-06-24 | 1988-10-18 | Cfm Technologies Limited Partnership | Process and apparatus for treating wafers with process fluids |
EP0233184B1 (de) * | 1985-06-24 | 1992-04-01 | Cfm Technologies, Inc. | Behandlung von halbleiterscheiben mit einer flüssigkeitsströmung |
JPH01210092A (ja) * | 1988-02-18 | 1989-08-23 | Sonitsuku Fueroo Kk | 精密洗浄の乾燥方法 |
-
1989
- 1989-11-23 DE DE1989621757 patent/DE68921757T2/de not_active Expired - Lifetime
- 1989-11-23 EP EP19890121671 patent/EP0428784B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0428784A1 (de) | 1991-05-29 |
EP0428784B1 (de) | 1995-03-15 |
DE68921757D1 (de) | 1995-04-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8365 | Fully valid after opposition proceedings |