IL126189A - Method and device for drying and cleaning objects using aerosol - Google Patents
Method and device for drying and cleaning objects using aerosolInfo
- Publication number
- IL126189A IL126189A IL12618997A IL12618997A IL126189A IL 126189 A IL126189 A IL 126189A IL 12618997 A IL12618997 A IL 12618997A IL 12618997 A IL12618997 A IL 12618997A IL 126189 A IL126189 A IL 126189A
- Authority
- IL
- Israel
- Prior art keywords
- liquid
- enclosed chamber
- drying
- rinse liquid
- chamber
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/14—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects using gases or vapours other than air or steam, e.g. inert gases
- F26B21/145—Condensing the vapour onto the surface of the materials to be dried
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/005—Drying solid materials or objects by processes not involving the application of heat by dipping them into or mixing them with a chemical liquid, e.g. organic; chemical, e.g. organic, dewatering aids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/616,165 US5685086A (en) | 1995-06-07 | 1996-03-14 | Method and apparatus for drying objects using aerosols |
US62468996A | 1996-03-25 | 1996-03-25 | |
PCT/US1997/003952 WO1997033702A1 (en) | 1996-03-14 | 1997-03-13 | Method and apparatus for drying and cleaning objects using aerosols |
Publications (2)
Publication Number | Publication Date |
---|---|
IL126189A0 IL126189A0 (en) | 1999-05-09 |
IL126189A true IL126189A (en) | 2001-08-08 |
Family
ID=27087685
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL12618997A IL126189A (en) | 1996-03-14 | 1997-03-13 | Method and device for drying and cleaning objects using aerosol |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0886548B1 (de) |
JP (1) | JP3955924B2 (de) |
KR (1) | KR100299486B1 (de) |
CA (1) | CA2248759A1 (de) |
DE (1) | DE69733686T2 (de) |
IL (1) | IL126189A (de) |
WO (1) | WO1997033702A1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU1700999A (en) * | 1997-11-26 | 1999-06-15 | Eli Lilly And Company | Tnf ligand family gene |
US6270584B1 (en) * | 1997-12-03 | 2001-08-07 | Gary W. Ferrell | Apparatus for drying and cleaning objects using controlled aerosols and gases |
TW417182B (en) * | 1998-06-02 | 2001-01-01 | Cfmt Inc | Wet processing methods for the manufacture of electronic components using liquids of varying temperature |
JP3174038B2 (ja) * | 1999-01-18 | 2001-06-11 | 東邦化成株式会社 | 基板乾燥方法およびその装置 |
KR100592997B1 (ko) * | 2000-01-17 | 2006-06-23 | 도호 카세이 가부시키가이샤 | 기판 건조방법 및 그 장치 |
JP3802446B2 (ja) | 2002-05-15 | 2006-07-26 | 東邦化成株式会社 | 基板乾燥方法およびその装置 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS553607B2 (de) * | 1973-01-05 | 1980-01-25 | ||
US4310973A (en) * | 1977-12-01 | 1982-01-19 | Phillips Petroleum Co. | Drying polymer solutions |
US4334366A (en) * | 1980-09-24 | 1982-06-15 | Jetsonic Processes, Ltd. | Sonic energy perforated drum for rotary dryers |
US4561192A (en) * | 1982-11-29 | 1985-12-31 | Dairyman's Cooperative Creamery Assoc. | Spray drying apparatus and method |
DE68921757T2 (de) * | 1989-11-23 | 1995-10-26 | Cfm Technologies Inc | Verfahren zum Trocknen von Oberflächen. |
US5054210A (en) * | 1990-02-23 | 1991-10-08 | S&K Products International, Inc. | Isopropyl alcohol vapor dryer system |
US5000208A (en) * | 1990-06-21 | 1991-03-19 | Micron Technology, Inc. | Wafer rinser/dryer |
US5143103A (en) * | 1991-01-04 | 1992-09-01 | International Business Machines Corporation | Apparatus for cleaning and drying workpieces |
JP2639771B2 (ja) * | 1991-11-14 | 1997-08-13 | 大日本スクリーン製造株式会社 | 基板の洗浄・乾燥処理方法並びにその処理装置 |
US5229171A (en) * | 1991-12-23 | 1993-07-20 | Research Triangle Institute | Apparatus and method for uniformly coating a substrate in an evacuable chamber |
US5226242A (en) * | 1992-02-18 | 1993-07-13 | Santa Clara Plastics, Division Of Preco, Inc. | Vapor jet dryer apparatus and method |
US5419351A (en) * | 1993-04-02 | 1995-05-30 | National Semiconductor Corporation | Final rinse/dry system for critical cleaning applications |
JP3347814B2 (ja) * | 1993-05-17 | 2002-11-20 | 大日本スクリーン製造株式会社 | 基板の洗浄・乾燥処理方法並びにその処理装置 |
CH688556A5 (it) * | 1993-12-09 | 1997-11-14 | Franco Carloni | Apparecchio elettrodomestico per lavare e/o asciugare utilizzante l'acqua calda dell'impianto centralizzato circolante in serpentine. |
US5653045A (en) * | 1995-06-07 | 1997-08-05 | Ferrell; Gary W. | Method and apparatus for drying parts and microelectronic components using sonic created mist |
-
1997
- 1997-03-13 WO PCT/US1997/003952 patent/WO1997033702A1/en active IP Right Grant
- 1997-03-13 JP JP53282997A patent/JP3955924B2/ja not_active Expired - Fee Related
- 1997-03-13 EP EP97916750A patent/EP0886548B1/de not_active Expired - Lifetime
- 1997-03-13 IL IL12618997A patent/IL126189A/en not_active IP Right Cessation
- 1997-03-13 CA CA002248759A patent/CA2248759A1/en not_active Abandoned
- 1997-03-13 KR KR1019980707239A patent/KR100299486B1/ko not_active IP Right Cessation
- 1997-03-13 DE DE69733686T patent/DE69733686T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69733686D1 (de) | 2005-08-11 |
EP0886548A4 (de) | 2002-03-20 |
IL126189A0 (en) | 1999-05-09 |
DE69733686T2 (de) | 2006-05-04 |
EP0886548B1 (de) | 2005-07-06 |
WO1997033702A1 (en) | 1997-09-18 |
CA2248759A1 (en) | 1997-09-18 |
KR100299486B1 (ko) | 2001-09-06 |
JP3955924B2 (ja) | 2007-08-08 |
KR19990087765A (ko) | 1999-12-27 |
JP2000507044A (ja) | 2000-06-06 |
EP0886548A1 (de) | 1998-12-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5964958A (en) | Methods for drying and cleaning objects using aerosols | |
US5685086A (en) | Method and apparatus for drying objects using aerosols | |
US5968285A (en) | Methods for drying and cleaning of objects using aerosols and inert gases | |
US6270584B1 (en) | Apparatus for drying and cleaning objects using controlled aerosols and gases | |
JP6929981B2 (ja) | 高アスペクト比半導体デバイス構造のための、汚染物質除去を伴うスティクションフリー乾燥処理 | |
KR100452542B1 (ko) | 세정물 건조장치 및 건조방법 | |
KR100397455B1 (ko) | 반도체의초미립자세정기 | |
US6374837B2 (en) | Single semiconductor wafer processor | |
US5715612A (en) | Method for precision drying surfaces | |
US5368649A (en) | Washing and drying method | |
TW490757B (en) | Apparatus for providing ozonated process fluid and methods for using same | |
US20020033186A1 (en) | Processes and apparatus for treating electronic components | |
US6343609B1 (en) | Cleaning with liquified gas and megasonics | |
TWI623968B (zh) | 使用液態二氧化碳以使半導體基板乾燥的方法及設備 | |
US5974689A (en) | Chemical drying and cleaning system | |
US6598314B1 (en) | Method of drying wafers | |
EP0886548B1 (de) | Verfahren und vorrichtung zur trocknung und reinigung von gegenständen mittels aerosolen | |
EP1235653A1 (de) | Verbesserungen bei der trocknung und reinigung von körpern unter verwendung von aerosolen und gasen | |
KR101110905B1 (ko) | 과포화된 세정 용액을 사용한 메가소닉 세정 | |
JP2004235559A (ja) | 基板処理方法および基板処理装置 | |
JP4299966B2 (ja) | 改善された化学的乾燥及び清浄化システム | |
WO2000007220A2 (en) | Wet processing methods for the manufacture of electronic components using ozonated process fluids | |
JP3137244B2 (ja) | 洗浄物の乾燥装置及びその乾燥方法 | |
US6647998B2 (en) | Electrostatic charge-free solvent-type dryer for semiconductor wafers | |
JPH0789547B2 (ja) | 乾燥方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FF | Patent granted | ||
RH1 | Patent not in force |