IL104708A - Device and method for optical inspection of items - Google Patents

Device and method for optical inspection of items

Info

Publication number
IL104708A
IL104708A IL10470893A IL10470893A IL104708A IL 104708 A IL104708 A IL 104708A IL 10470893 A IL10470893 A IL 10470893A IL 10470893 A IL10470893 A IL 10470893A IL 104708 A IL104708 A IL 104708A
Authority
IL
Israel
Prior art keywords
axis
objective lens
light
contrast
phase compensator
Prior art date
Application number
IL10470893A
Other languages
English (en)
Hebrew (he)
Other versions
IL104708A0 (en
Original Assignee
Orbotech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orbotech Ltd filed Critical Orbotech Ltd
Priority to IL10470893A priority Critical patent/IL104708A/en
Publication of IL104708A0 publication Critical patent/IL104708A0/xx
Priority to US08/193,568 priority patent/US5450201A/en
Priority to DE69406563T priority patent/DE69406563T2/de
Priority to EP94102147A priority patent/EP0610945B1/fr
Priority to AT94102147T priority patent/ATE160015T1/de
Priority to JP6017492A priority patent/JPH06250092A/ja
Publication of IL104708A publication Critical patent/IL104708A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Ultra Sonic Daignosis Equipment (AREA)
  • Holo Graphy (AREA)
  • Microscoopes, Condenser (AREA)
IL10470893A 1993-02-12 1993-02-12 Device and method for optical inspection of items IL104708A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
IL10470893A IL104708A (en) 1993-02-12 1993-02-12 Device and method for optical inspection of items
US08/193,568 US5450201A (en) 1993-02-12 1994-02-08 Apparatus and method for optical inspection of articles
DE69406563T DE69406563T2 (de) 1993-02-12 1994-02-11 Anordnung und Verfahren zur optischen Untersuchung von Gegenständen
EP94102147A EP0610945B1 (fr) 1993-02-12 1994-02-11 Dispositif et méthode pour l'inspection optique d'objets
AT94102147T ATE160015T1 (de) 1993-02-12 1994-02-11 Anordnung und verfahren zur optischen untersuchung von gegenständen
JP6017492A JPH06250092A (ja) 1993-02-12 1994-02-14 物体の光学的検査のための装置及び方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL10470893A IL104708A (en) 1993-02-12 1993-02-12 Device and method for optical inspection of items

Publications (2)

Publication Number Publication Date
IL104708A0 IL104708A0 (en) 1993-06-10
IL104708A true IL104708A (en) 1995-12-31

Family

ID=11064521

Family Applications (1)

Application Number Title Priority Date Filing Date
IL10470893A IL104708A (en) 1993-02-12 1993-02-12 Device and method for optical inspection of items

Country Status (6)

Country Link
US (1) US5450201A (fr)
EP (1) EP0610945B1 (fr)
JP (1) JPH06250092A (fr)
AT (1) ATE160015T1 (fr)
DE (1) DE69406563T2 (fr)
IL (1) IL104708A (fr)

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US5608526A (en) * 1995-01-19 1997-03-04 Tencor Instruments Focused beam spectroscopic ellipsometry method and system
DE19708036C2 (de) * 1997-02-27 2000-06-29 Gunther Elender Ellipsometrisches Mikroskop
US6483580B1 (en) 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
DE19827175C1 (de) * 1998-06-18 2000-01-27 Leica Microsystems Analysator-Einschub für ein Polarisationsmikroskop
US6020966A (en) * 1998-09-23 2000-02-01 International Business Machines Corporation Enhanced optical detection of minimum features using depolarization
US6132044A (en) * 1998-11-20 2000-10-17 Luxottica Leasing S.P.A Filter for a special purpose lens and method of making filter
ATE374923T1 (de) * 1999-08-06 2007-10-15 Inverness Medical Biostar Inc Bindungsanalyseinstrumente basierend auf lichtabschwächung durch dünnschichten
DE10008073B4 (de) * 2000-02-22 2005-09-01 Nanofocus Materialtechnik Gmbh Polarisationsinterferometrisches Mikroskop
US7167583B1 (en) 2000-06-28 2007-01-23 Landrex Technologies Co., Ltd. Image processing system for use with inspection systems
US6552783B1 (en) 2000-06-28 2003-04-22 Teradyne, Inc. Optical system
US6750968B2 (en) * 2000-10-03 2004-06-15 Accent Optical Technologies, Inc. Differential numerical aperture methods and device
EP1215525A3 (fr) * 2000-12-14 2005-03-16 Mitsubishi Denki Kabushiki Kaisha Procédé et dispositif de détection de l'écartement d'une cellule à cristal liquide
FR2818376B1 (fr) * 2000-12-18 2003-03-28 Centre Nat Rech Scient Dispositif de visualisation bidimensionnelle ellipsometrique d'un echantillon, procede de visualisation et procede de mesure ellipsometrique avec resolution spatiale
US6870896B2 (en) 2000-12-28 2005-03-22 Osmic, Inc. Dark-field phase contrast imaging
US6804324B2 (en) * 2001-03-01 2004-10-12 Osmo, Inc. X-ray phase contrast imaging using a fabry-perot interferometer concept
US6700658B2 (en) 2001-10-05 2004-03-02 Electro Scientific Industries, Inc. Method and apparatus for circuit pattern inspection
US6862491B2 (en) * 2002-05-22 2005-03-01 Applied Materials Israel, Ltd. System and method for process variation monitor
DE10222785B4 (de) * 2002-05-23 2004-12-16 Wendlandt, Erhard Verfahren und Vorrichtung zur Probenuntersuchung
US6949115B2 (en) * 2003-10-14 2005-09-27 Southland Instruments, Inc. Polarized light analyzer
US8319975B2 (en) * 2004-03-11 2012-11-27 Nano-Or Technologies (Israel) Ltd. Methods and apparatus for wavefront manipulations and improved 3-D measurements
IL162199A (en) * 2004-05-27 2008-04-13 Nova Measuring Instr Ltd Optical measurements of articles with periodic patterns
US7515253B2 (en) * 2005-01-12 2009-04-07 Kla-Tencor Technologies Corporation System for measuring a sample with a layer containing a periodic diffracting structure
JP4625716B2 (ja) * 2005-05-23 2011-02-02 株式会社日立ハイテクノロジーズ 欠陥検査装置及び欠陥検査方法
US7567344B2 (en) * 2006-05-12 2009-07-28 Corning Incorporated Apparatus and method for characterizing defects in a transparent substrate
JP5248052B2 (ja) * 2006-10-11 2013-07-31 日東電工株式会社 光学フィルムを有するシート状製品の欠点検査装置、その検査データ処理装置、その切断装置及びその製造システム
JP5065059B2 (ja) * 2008-01-08 2012-10-31 オリンパス株式会社 顕微鏡
JP5035904B2 (ja) * 2008-02-13 2012-09-26 国立大学法人名古屋大学 膜厚分布測定装置
WO2010010556A1 (fr) 2008-07-22 2010-01-28 Orbotech Ltd. Système optique télécentrique efficace (etos)
DE102009053908A1 (de) 2009-11-20 2011-05-26 Hönig, Dirk, Dr. Reflexionsmikroskop
US9035673B2 (en) 2010-01-25 2015-05-19 Palo Alto Research Center Incorporated Method of in-process intralayer yield detection, interlayer shunt detection and correction
US9404872B1 (en) * 2011-06-29 2016-08-02 Kla-Tencor Corporation Selectably configurable multiple mode spectroscopic ellipsometry
TWI477766B (zh) 2012-12-18 2015-03-21 Ind Tech Res Inst 檢測裝置以及檢測方法
JP6128902B2 (ja) * 2013-03-08 2017-05-17 株式会社ミツトヨ 形状測定装置
JP2014191057A (ja) * 2013-03-26 2014-10-06 Toppan Printing Co Ltd Ｉｔｏパターンの撮像装置及び撮像方法
KR101414255B1 (ko) 2013-03-29 2014-07-01 에스엔유 프리시젼 주식회사 Ｔｓｖ 측정장치 및 측정방법
CA2930411C (fr) * 2013-11-15 2022-05-03 Mikroscan Technologies, Inc. Scanner geologique
DE102014114013B4 (de) * 2014-09-26 2024-03-21 Carl Zeiss Meditec Ag Medizinisch optisches Beobachtungsgerät und Verfahren zur Kontrastierung von polarisationsdrehendem Gewebe
US10162166B2 (en) * 2014-10-28 2018-12-25 Mikroscan Technologies, Inc. Microdissection viewing system
CN104503072B (zh) * 2014-12-23 2017-09-26 成都西图科技有限公司 偏光显微镜的自动偏光装置及其使用方法
NL2019089B1 (en) * 2017-06-17 2018-12-24 Acad Medisch Ct Polarization microscope
US10720354B2 (en) * 2018-08-28 2020-07-21 Axcelis Technologies, Inc. System and method for aligning light-transmitting birefringent workpieces
CN114371148B (zh) * 2022-01-19 2022-11-08 之江实验室 一种基于零椭偏暗场照明的散射干涉成像系统及方法

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US2409407A (en) * 1943-02-22 1946-10-15 Bausch & Lomb Reflecting element for polarized light
US3614195A (en) * 1969-11-10 1971-10-19 Bausch & Lomb Retardation compensator plate for a polarizing microscope
US3637280A (en) * 1970-05-12 1972-01-25 Jenoptik Jena Gmbh Devices for high-contrast imaging of phase objects in incident-light microscopy
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US4866264A (en) * 1988-10-31 1989-09-12 Northrop Corporation Method and apparatus for measuring non-reciprocal loss of thin magnetic films and magnetic mirrors
US4999014A (en) * 1989-05-04 1991-03-12 Therma-Wave, Inc. Method and apparatus for measuring thickness of thin films
US5042951A (en) * 1989-09-19 1991-08-27 Therma-Wave, Inc. High resolution ellipsometric apparatus
DE4017935A1 (de) * 1990-06-05 1991-12-12 Leonhardt Klaus Prof Dr Mikro-ellipso-profilometrie
IL96483A (en) * 1990-11-27 1995-07-31 Orbotech Ltd Optical inspection method and apparatus
EP0566657B1 (fr) * 1991-01-11 1998-08-05 Rudolph Research Corporation Ellipsometre a capacite operationnelle simultanee sous des angles et avec des longueurs d'ondes multiples et procede d'utilisation

Also Published As

Publication number Publication date
JPH06250092A (ja) 1994-09-09
IL104708A0 (en) 1993-06-10
EP0610945B1 (fr) 1997-11-05
ATE160015T1 (de) 1997-11-15
EP0610945A1 (fr) 1994-08-17
US5450201A (en) 1995-09-12
DE69406563D1 (de) 1997-12-11
DE69406563T2 (de) 1998-03-05

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