HK71587A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
HK71587A
HK71587A HK715/87A HK71587A HK71587A HK 71587 A HK71587 A HK 71587A HK 715/87 A HK715/87 A HK 715/87A HK 71587 A HK71587 A HK 71587A HK 71587 A HK71587 A HK 71587A
Authority
HK
Hong Kong
Prior art keywords
semiconductor device
semiconductor
Prior art date
Application number
HK715/87A
Other languages
English (en)
Inventor
Isao Shimizu
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of HK71587A publication Critical patent/HK71587A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0804Emitter regions of bipolar transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/7302Bipolar junction transistors structurally associated with other devices
    • H01L29/7304Bipolar junction transistors structurally associated with other devices the device being a resistive element, e.g. ballasting resistor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
HK715/87A 1980-12-12 1987-10-01 Semiconductor device HK71587A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55174499A JPS5799771A (en) 1980-12-12 1980-12-12 Semiconductor device

Publications (1)

Publication Number Publication Date
HK71587A true HK71587A (en) 1987-10-09

Family

ID=15979556

Family Applications (2)

Application Number Title Priority Date Filing Date
HK715/87A HK71587A (en) 1980-12-12 1987-10-01 Semiconductor device
HK701/87A HK70187A (en) 1980-12-12 1987-10-01 Semiconductor device

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK701/87A HK70187A (en) 1980-12-12 1987-10-01 Semiconductor device

Country Status (8)

Country Link
US (1) US4639757A (xx)
JP (1) JPS5799771A (xx)
DE (1) DE3148323A1 (xx)
GB (2) GB2089564B (xx)
HK (2) HK71587A (xx)
IT (1) IT1140324B (xx)
MY (1) MY8700615A (xx)
SG (1) SG36387G (xx)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5799771A (en) * 1980-12-12 1982-06-21 Hitachi Ltd Semiconductor device
US5298785A (en) * 1987-05-15 1994-03-29 Fuji Electric Co., Ltd. Semiconductor device
FR2615326B1 (fr) * 1987-05-15 1990-08-31 Fuji Electric Co Ltd Dispositif a semi-conducteurs du type multi-emetteur
JPH0262048A (ja) * 1988-08-27 1990-03-01 Fuji Electric Co Ltd トランジスタ
JPH07109831B2 (ja) * 1990-01-25 1995-11-22 株式会社東芝 半導体装置
US5387813A (en) * 1992-09-25 1995-02-07 National Semiconductor Corporation Transistors with emitters having at least three sides
US6064109A (en) * 1992-10-08 2000-05-16 Sgs-Thomson Microelectronics, Inc. Ballast resistance for producing varied emitter current flow along the emitter's injecting edge
EP0592157B1 (en) * 1992-10-08 1998-11-25 STMicroelectronics, Inc. Integrated thin film approach to achieve high ballast levels for overlay structures
US5374844A (en) * 1993-03-25 1994-12-20 Micrel, Inc. Bipolar transistor structure using ballast resistor
US6946720B2 (en) * 2003-02-13 2005-09-20 Intersil Americas Inc. Bipolar transistor for an integrated circuit having variable value emitter ballast resistors
JP2006332117A (ja) * 2005-05-23 2006-12-07 Sharp Corp トランジスタ構造および電子機器
USD848384S1 (en) * 2017-08-17 2019-05-14 Epistar Corporation Transistor

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3358197A (en) * 1963-05-22 1967-12-12 Itt Semiconductor device
US3609460A (en) * 1968-06-28 1971-09-28 Rca Corp Power transistor having ballasted emitter fingers interdigitated with base fingers
US3619741A (en) * 1969-11-24 1971-11-09 Texas Instruments Inc Method of providing integrated diffused emitter ballast resistors for improved power capabilities of semiconductor devices
GB1324507A (en) * 1969-12-18 1973-07-25 Mullard Ltd Methods of manufacturing a semiconductor device
DE2137976C3 (de) * 1971-07-29 1978-08-31 Ibm Deutschland Gmbh, 7000 Stuttgart Monolithischer Speicher und Verfahren zur Herstellung
US3884732A (en) * 1971-07-29 1975-05-20 Ibm Monolithic storage array and method of making
JPS5223715B2 (xx) * 1972-03-27 1977-06-25
GB1556169A (en) * 1975-12-23 1979-11-21 Ferranti Ltd Transistor logic circuits
US4149177A (en) * 1976-09-03 1979-04-10 Fairchild Camera And Instrument Corporation Method of fabricating conductive buried regions in integrated circuits and the resulting structures
FR2374742A1 (fr) * 1976-12-20 1978-07-13 Radiotechnique Compelec Transistor multicouche pour tensions elevees et son procede de fabrication
US4151540A (en) * 1977-12-08 1979-04-24 Fairchild Camera And Instrument Corporation High beta, high frequency transistor structure
NL184185C (nl) * 1978-04-07 1989-05-01 Philips Nv Darlingtonschakeling met een geintegreerde halfgeleiderdiode.
JPS55138273A (en) * 1979-04-11 1980-10-28 Fujitsu Ltd Transistor
JPS5799771A (en) * 1980-12-12 1982-06-21 Hitachi Ltd Semiconductor device

Also Published As

Publication number Publication date
JPS5799771A (en) 1982-06-21
GB2089564B (en) 1985-11-20
GB2089564A (en) 1982-06-23
GB2149575A (en) 1985-06-12
GB8428941D0 (en) 1984-12-27
MY8700615A (en) 1987-12-31
IT1140324B (it) 1986-09-24
SG36387G (en) 1987-07-24
IT8125510A0 (it) 1981-12-10
JPH0133954B2 (xx) 1989-07-17
HK70187A (en) 1987-10-09
GB2149575B (en) 1985-12-04
DE3148323A1 (de) 1982-09-09
US4639757A (en) 1987-01-27

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Legal Events

Date Code Title Description
NR Patent deemed never to have been added to the register under section 13(7) of patents (transitional arrangements) rules