HK53997A - Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation - Google Patents

Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation

Info

Publication number
HK53997A
HK53997A HK53997A HK53997A HK53997A HK 53997 A HK53997 A HK 53997A HK 53997 A HK53997 A HK 53997A HK 53997 A HK53997 A HK 53997A HK 53997 A HK53997 A HK 53997A
Authority
HK
Hong Kong
Prior art keywords
phase separation
imaging method
method utilizing
solid imaging
self limiting
Prior art date
Application number
HK53997A
Other languages
English (en)
Inventor
Mario Grossa
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of HK53997A publication Critical patent/HK53997A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C9/00—Stereo-photographic or similar processes
    • G03C9/08—Producing three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Polymerisation Methods In General (AREA)
HK53997A 1989-04-21 1997-04-24 Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation HK53997A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/341,611 US4942060A (en) 1989-04-21 1989-04-21 Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation

Publications (1)

Publication Number Publication Date
HK53997A true HK53997A (en) 1997-05-02

Family

ID=23338279

Family Applications (1)

Application Number Title Priority Date Filing Date
HK53997A HK53997A (en) 1989-04-21 1997-04-24 Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation

Country Status (9)

Country Link
US (1) US4942060A (ja)
EP (1) EP0393674B1 (ja)
JP (1) JPH0767745B2 (ja)
KR (1) KR900016808A (ja)
CN (1) CN1046613A (ja)
AU (1) AU623004B2 (ja)
CA (1) CA2014807A1 (ja)
DE (1) DE69021245T2 (ja)
HK (1) HK53997A (ja)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5106288A (en) * 1988-04-11 1992-04-21 Austral Asian Lasers Pty Ltd. Laser based plastic model making workstation
US5141680A (en) * 1988-04-18 1992-08-25 3D Systems, Inc. Thermal stereolighography
US5776409A (en) * 1988-04-18 1998-07-07 3D Systems, Inc. Thermal stereolithograp using slice techniques
US5258146A (en) * 1988-09-26 1993-11-02 3D Systems, Inc. Method of and apparatus for measuring and controlling fluid level in stereolithography
US5174931A (en) * 1988-09-26 1992-12-29 3D Systems, Inc. Method of and apparatus for making a three-dimensional product by stereolithography
US5002855A (en) * 1989-04-21 1991-03-26 E. I. Du Pont De Nemours And Company Solid imaging method using multiphasic photohardenable compositions
US5128235A (en) * 1989-04-21 1992-07-07 E. I. Du Pont De Nemours And Company Method of forming a three-dimensional object comprising additives imparting reduction of shrinkage to photohardenable compositions
US5051334A (en) * 1989-04-21 1991-09-24 E. I. Du Pont De Nemours And Company Solid imaging method using photohardenable compositions containing hollow spheres
US4942066A (en) * 1989-04-21 1990-07-17 E. I. Du Pont De Nemours And Company Solid imaging method using photohardenable materials of self limiting thickness
US5009585A (en) * 1989-12-18 1991-04-23 Mitsui Engineering & Shipbuilding Co., Ltd. Optical molding apparatus and movable base device therefor
US5358673A (en) * 1990-02-15 1994-10-25 3D Systems, Inc. Applicator device and method for dispensing a liquid medium in a laser modeling machine
US5626919A (en) * 1990-03-01 1997-05-06 E. I. Du Pont De Nemours And Company Solid imaging apparatus and method with coating station
US5096530A (en) * 1990-06-28 1992-03-17 3D Systems, Inc. Resin film recoating method and apparatus
US5569349A (en) * 1990-10-04 1996-10-29 3D Systems, Inc. Thermal stereolithography
US5496682A (en) * 1993-10-15 1996-03-05 W. R. Grace & Co.-Conn. Three dimensional sintered inorganic structures using photopolymerization
US5418112A (en) * 1993-11-10 1995-05-23 W. R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
JP3117394B2 (ja) * 1994-11-29 2000-12-11 帝人製機株式会社 光学的立体造形用樹脂組成物
US5590454A (en) * 1994-12-21 1997-01-07 Richardson; Kendrick E. Method and apparatus for producing parts by layered subtractive machine tool techniques
BR9607005A (pt) * 1995-02-01 1997-10-28 3D Systems Inc Revestímento rápido de objetos tridimensionais formados em uma base transversal seccional
US5855836A (en) * 1995-09-27 1999-01-05 3D Systems, Inc. Method for selective deposition modeling
US6305769B1 (en) 1995-09-27 2001-10-23 3D Systems, Inc. Selective deposition modeling system and method
US5804301A (en) * 1996-01-11 1998-09-08 Avery Dennison Corporation Radiation-curable coating compositions
US5888649A (en) * 1996-01-11 1999-03-30 Avery Dennison Corporation Radiation-curable release coating compositions
DE69716332T2 (de) * 1996-04-15 2003-02-20 Teijin Seiki Co. Ltd., Osaka Verwendung einer photohärtbaren Harzzusammensetzung zur Herstellung eines Objektes mittels Stereolithographie
US7332537B2 (en) 1996-09-04 2008-02-19 Z Corporation Three dimensional printing material system and method
JP3724893B2 (ja) * 1996-09-25 2005-12-07 ナブテスコ株式会社 光学的立体造形用樹脂組成物
WO1998034987A1 (fr) 1997-02-05 1998-08-13 Teijin Seiki Co., Ltd. Composition de resine stereolithographique
JP4007704B2 (ja) 1998-11-10 2007-11-14 ナブテスコ株式会社 光学的立体造形用の光硬化性樹脂組成物
US7418993B2 (en) * 1998-11-20 2008-09-02 Rolls-Royce Corporation Method and apparatus for production of a cast component
US6932145B2 (en) 1998-11-20 2005-08-23 Rolls-Royce Corporation Method and apparatus for production of a cast component
WO2001034371A2 (en) 1999-11-05 2001-05-17 Z Corporation Material systems and methods of three-dimensional printing
US6545064B1 (en) 1999-11-24 2003-04-08 Avery Dennison Corporation Coating composition comprising ethoxylated diacrylates
US8481241B2 (en) 2000-03-13 2013-07-09 Stratasys Ltd. Compositions and methods for use in three dimensional model printing
US20030207959A1 (en) * 2000-03-13 2003-11-06 Eduardo Napadensky Compositions and methods for use in three dimensional model printing
US7300619B2 (en) * 2000-03-13 2007-11-27 Objet Geometries Ltd. Compositions and methods for use in three dimensional model printing
US20010050031A1 (en) 2000-04-14 2001-12-13 Z Corporation Compositions for three-dimensional printing of solid objects
FR2813609A1 (fr) * 2000-09-01 2002-03-08 Optoform Sarl Procedes De Prot Composition de mousse photopolymerisable, procede d'obtention de pieces tridimensionnelles par prototypage rapide, dispositif de mise en oeuvre, piece obtenue et utilisation
GB0112675D0 (en) * 2001-05-24 2001-07-18 Vantico Ltd Three-dimensional structured printing
ES2376237T3 (es) 2003-05-21 2012-03-12 Z Corporation Sistema de material en polvo termopl�?stico para modelos de apariencia a partir de sistemas de impresión en 3d.
CN100467255C (zh) * 2003-06-24 2009-03-11 Cmet公司 三维结构体及其制造方法
JP5280610B2 (ja) 2003-06-25 2013-09-04 シーメット株式会社 安定性の向上した活性エネルギー線硬化性の光学的立体造形用樹脂組成物
US7232850B2 (en) * 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
FR2865960B1 (fr) * 2004-02-06 2006-05-05 Nicolas Marsac Procede et machine pour realiser des objets en trois dimensions par depot de couches successives
US7261542B2 (en) 2004-03-18 2007-08-28 Desktop Factory, Inc. Apparatus for three dimensional printing using image layers
DE102004034416A1 (de) * 2004-07-15 2006-02-02 "Stiftung Caesar" (Center Of Advanced European Studies And Research) Flüssige, strahlunghärtende Zusammensetzungen
WO2006062143A1 (en) * 2004-12-07 2006-06-15 Semiconductor Energy Laboratory Co., Ltd. Memory device and semiconductor device
JP4744200B2 (ja) 2005-06-20 2011-08-10 シーメット株式会社 平滑化した造形端面を有する立体造形物
EP1757979B1 (en) 2005-08-26 2012-12-12 Cmet Inc. Rapid prototyping resin compositions
US8293810B2 (en) * 2005-08-29 2012-10-23 Cmet Inc. Rapid prototyping resin compositions
US7905951B2 (en) 2006-12-08 2011-03-15 Z Corporation Three dimensional printing material system and method using peroxide cure
JP5129267B2 (ja) 2007-01-10 2013-01-30 スリーディー システムズ インコーポレーテッド 改良された色、物品性能及び使用の容易さ、を持つ３次元印刷材料システム
US7968626B2 (en) 2007-02-22 2011-06-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
CN102380711B (zh) * 2010-09-01 2014-08-06 中国科学院光电研究院 选择性烧结激光加工系统
KR101387637B1 (ko) * 2012-12-27 2014-04-24 김지현 3ｄ프린터의 다색 출력을 위한 방법 및 용기
US11565465B2 (en) * 2017-12-07 2023-01-31 Canon Kabushiki Kaisha Method for manufacturing three-dimensional shaped object, additive manufacturing apparatus, and article

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3701748A (en) * 1966-07-20 1972-10-31 Rohm & Haas Unsaturated polyester resinous compositions
GB1276198A (en) * 1968-10-23 1972-06-01 Rohm & Haas Moulding compositions
US4005244A (en) * 1974-09-30 1977-01-25 Ppg Industries, Inc. Ultraviolet light curable opacifying compositions
US4078229A (en) * 1975-01-27 1978-03-07 Swanson Wyn K Three dimensional systems
US4288861A (en) * 1977-12-01 1981-09-08 Formigraphic Engine Corporation Three-dimensional systems
DE3041794A1 (de) * 1980-11-06 1982-05-13 Dynamit Nobel Ag, 5210 Troisdorf Verfahren zum herstellen von dessinierten formkoerpern aus einer haertbaren masse auf basis duroplastischer kunststoffe
JPS57135245A (en) * 1981-02-16 1982-08-20 Automob Antipollut & Saf Res Center Carbureter provided with starter
JPS59189969A (ja) * 1983-04-12 1984-10-27 Fuji Photo Film Co Ltd 多層塗膜の形成方法
US4575473A (en) * 1983-05-26 1986-03-11 Union Carbide Corporation Curable poly(acrylate) molding compositions containing a thermoplastic polymer low profile additive
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
JPS61162501A (ja) * 1985-01-10 1986-07-23 Nippon Paint Co Ltd 高エネルギ−線硬化樹脂組成物
ES2063737T3 (es) * 1986-06-03 1995-01-16 Cubital Ltd Aparato y metodo para modelizacion tridimensional.
US4842782A (en) * 1986-10-14 1989-06-27 Allergan, Inc. Manufacture of ophthalmic lenses by excimer laser
US4752498A (en) * 1987-03-02 1988-06-21 Fudim Efrem V Method and apparatus for production of three-dimensional objects by photosolidification
JPH0224126A (ja) * 1988-07-13 1990-01-26 Mitsui Eng & Shipbuild Co Ltd 光学的造形法
JPH0745194B2 (ja) * 1988-10-26 1995-05-17 松下電工株式会社 光硬化性樹脂および三次元形状の形成方法

Also Published As

Publication number Publication date
AU5376290A (en) 1990-10-25
DE69021245T2 (de) 1996-02-15
JPH0341126A (ja) 1991-02-21
KR900016808A (ko) 1990-11-14
JPH0767745B2 (ja) 1995-07-26
DE69021245D1 (de) 1995-09-07
CA2014807A1 (en) 1990-10-21
EP0393674A1 (en) 1990-10-24
EP0393674B1 (en) 1995-08-02
AU623004B2 (en) 1992-04-30
CN1046613A (zh) 1990-10-31
US4942060A (en) 1990-07-17

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Effective date: 20100418