HK188895A - Vertical cavity surface emitting lasers with transparent electrodes - Google Patents
Vertical cavity surface emitting lasers with transparent electrodesInfo
- Publication number
- HK188895A HK188895A HK188895A HK188895A HK188895A HK 188895 A HK188895 A HK 188895A HK 188895 A HK188895 A HK 188895A HK 188895 A HK188895 A HK 188895A HK 188895 A HK188895 A HK 188895A
- Authority
- HK
- Hong Kong
- Prior art keywords
- surface emitting
- transparent electrodes
- cavity surface
- vertical cavity
- emitting lasers
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04252—Electrodes, e.g. characterised by the structure characterised by the material
- H01S5/04253—Electrodes, e.g. characterised by the structure characterised by the material having specific optical properties, e.g. transparent electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/18—Semiconductor lasers with special structural design for influencing the near- or far-field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04254—Electrodes, e.g. characterised by the structure characterised by the shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
- H01S5/06216—Pulse modulation or generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
- H01S5/2063—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion obtained by particle bombardment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
- H01S5/3432—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs the whole junction comprising only (AI)GaAs
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/637,245 US5115441A (en) | 1991-01-03 | 1991-01-03 | Vertical cavity surface emmitting lasers with transparent electrodes |
Publications (1)
Publication Number | Publication Date |
---|---|
HK188895A true HK188895A (en) | 1995-12-22 |
Family
ID=24555144
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK188895A HK188895A (en) | 1991-01-03 | 1995-12-14 | Vertical cavity surface emitting lasers with transparent electrodes |
Country Status (9)
Country | Link |
---|---|
US (1) | US5115441A (de) |
EP (1) | EP0497052B1 (de) |
JP (1) | JP2975201B2 (de) |
KR (1) | KR0127911B1 (de) |
CA (1) | CA2054404C (de) |
DE (1) | DE69104342T2 (de) |
HK (1) | HK188895A (de) |
SG (1) | SG28332G (de) |
TW (1) | TW212255B (de) |
Families Citing this family (87)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1992017925A1 (en) * | 1991-03-28 | 1992-10-15 | Seiko Epson Corporation | Surface emitting type semiconductor laser and its manufacturing method |
US5258990A (en) * | 1991-11-07 | 1993-11-02 | The United States Of America As Represented By The Secretary Of The United States Department Of Energy | Visible light surface emitting semiconductor laser |
US5226053A (en) * | 1991-12-27 | 1993-07-06 | At&T Bell Laboratories | Light emitting diode |
US5212703A (en) * | 1992-02-18 | 1993-05-18 | Eastman Kodak Company | Surface emitting lasers with low resistance bragg reflectors |
US5258316A (en) * | 1992-03-26 | 1993-11-02 | Motorola, Inc. | Patterened mirror vertical cavity surface emitting laser |
US5256596A (en) * | 1992-03-26 | 1993-10-26 | Motorola, Inc. | Top emitting VCSEL with implant |
US5245622A (en) * | 1992-05-07 | 1993-09-14 | Bandgap Technology Corporation | Vertical-cavity surface-emitting lasers with intra-cavity structures |
US5293392A (en) * | 1992-07-31 | 1994-03-08 | Motorola, Inc. | Top emitting VCSEL with etch stop layer |
US5317587A (en) * | 1992-08-06 | 1994-05-31 | Motorola, Inc. | VCSEL with separate control of current distribution and optical mode |
US5343487A (en) * | 1992-10-01 | 1994-08-30 | Optical Concepts, Inc. | Electrical pumping scheme for vertical-cavity surface-emitting lasers |
JP2797883B2 (ja) * | 1993-03-18 | 1998-09-17 | 株式会社日立製作所 | 多色発光素子とその基板 |
US5345462A (en) * | 1993-03-29 | 1994-09-06 | At&T Bell Laboratories | Semiconductor surface emitting laser having enhanced polarization control and transverse mode selectivity |
US5643369A (en) * | 1993-06-24 | 1997-07-01 | Fuji Xerox Co., Ltd. | Photoelectric conversion element having an infrared transmissive indium-tin oxide film |
US5323416A (en) * | 1993-08-20 | 1994-06-21 | Bell Communications Research, Inc. | Planarized interference mirror |
US5388120A (en) * | 1993-09-21 | 1995-02-07 | Motorola, Inc. | VCSEL with unstable resonator |
US5546209A (en) * | 1994-03-11 | 1996-08-13 | University Of Southern California | One-to-many simultaneous and reconfigurable optical two-dimensional plane interconnections using multiple wavelength, vertical cavity, surface-emitting lasers and wavelength-dependent detector planes |
GB2295269A (en) * | 1994-11-14 | 1996-05-22 | Sharp Kk | Resonant cavity laser having oxide spacer region |
US5530715A (en) * | 1994-11-29 | 1996-06-25 | Motorola, Inc. | Vertical cavity surface emitting laser having continuous grading |
US5493577A (en) * | 1994-12-21 | 1996-02-20 | Sandia Corporation | Efficient semiconductor light-emitting device and method |
US5627854A (en) * | 1995-03-15 | 1997-05-06 | Lucent Technologies Inc. | Saturable bragg reflector |
US5513204A (en) * | 1995-04-12 | 1996-04-30 | Optical Concepts, Inc. | Long wavelength, vertical cavity surface emitting laser with vertically integrated optical pump |
US5625617A (en) * | 1995-09-06 | 1997-04-29 | Lucent Technologies Inc. | Near-field optical apparatus with a laser having a non-uniform emission face |
US5724376A (en) * | 1995-11-30 | 1998-03-03 | Hewlett-Packard Company | Transparent substrate vertical cavity surface emitting lasers fabricated by semiconductor wafer bonding |
US5719891A (en) * | 1995-12-18 | 1998-02-17 | Picolight Incorporated | Conductive element with lateral oxidation barrier |
US5978408A (en) * | 1997-02-07 | 1999-11-02 | Xerox Corporation | Highly compact vertical cavity surface emitting lasers |
US6304588B1 (en) * | 1997-02-07 | 2001-10-16 | Xerox Corporation | Method and structure for eliminating polarization instability in laterally-oxidized VCSELs |
WO1999012235A1 (en) | 1997-09-05 | 1999-03-11 | Micron Optics, Inc. | Tunable fiber fabry-perot surface-emitting lasers |
US6026111A (en) * | 1997-10-28 | 2000-02-15 | Motorola, Inc. | Vertical cavity surface emitting laser device having an extended cavity |
US5960024A (en) | 1998-03-30 | 1999-09-28 | Bandwidth Unlimited, Inc. | Vertical optical cavities produced with selective area epitaxy |
US5991326A (en) | 1998-04-14 | 1999-11-23 | Bandwidth9, Inc. | Lattice-relaxed verticle optical cavities |
US6487230B1 (en) | 1998-04-14 | 2002-11-26 | Bandwidth 9, Inc | Vertical cavity apparatus with tunnel junction |
US6493373B1 (en) | 1998-04-14 | 2002-12-10 | Bandwidth 9, Inc. | Vertical cavity apparatus with tunnel junction |
US6493372B1 (en) | 1998-04-14 | 2002-12-10 | Bandwidth 9, Inc. | Vertical cavity apparatus with tunnel junction |
US6760357B1 (en) | 1998-04-14 | 2004-07-06 | Bandwidth9 | Vertical cavity apparatus with tunnel junction |
US6487231B1 (en) | 1998-04-14 | 2002-11-26 | Bandwidth 9, Inc. | Vertical cavity apparatus with tunnel junction |
US6535541B1 (en) | 1998-04-14 | 2003-03-18 | Bandwidth 9, Inc | Vertical cavity apparatus with tunnel junction |
US6493371B1 (en) | 1998-04-14 | 2002-12-10 | Bandwidth9, Inc. | Vertical cavity apparatus with tunnel junction |
JP3697903B2 (ja) * | 1998-07-06 | 2005-09-21 | 富士ゼロックス株式会社 | 面発光レーザおよび面発光レーザアレイ |
US6144682A (en) * | 1998-10-29 | 2000-11-07 | Xerox Corporation | Spatial absorptive and phase shift filter layer to reduce modal reflectivity for higher order modes in a vertical cavity surface emitting laser |
US6845118B1 (en) * | 1999-01-25 | 2005-01-18 | Optical Communication Products, Inc. | Encapsulated optoelectronic devices with controlled properties |
GB2346258A (en) * | 1999-01-30 | 2000-08-02 | Mitel Semiconductor Ab | Monitoring the light output of surface emitting lasers |
US6226425B1 (en) | 1999-02-24 | 2001-05-01 | Bandwidth9 | Flexible optical multiplexer |
US6852968B1 (en) * | 1999-03-08 | 2005-02-08 | Canon Kabushiki Kaisha | Surface-type optical apparatus |
GB2349739A (en) * | 1999-04-12 | 2000-11-08 | Mitel Semiconductor Ab | Vertical cavity surface emitting lasers |
US6275513B1 (en) | 1999-06-04 | 2001-08-14 | Bandwidth 9 | Hermetically sealed semiconductor laser device |
US6233263B1 (en) | 1999-06-04 | 2001-05-15 | Bandwidth9 | Monitoring and control assembly for wavelength stabilized optical system |
US20020048301A1 (en) * | 1999-07-30 | 2002-04-25 | Peidong Wang | Single mode operation of microelectromechanically tunable, half-symmetric, vertical cavity surface emitting lasers |
US6577658B1 (en) | 1999-09-20 | 2003-06-10 | E20 Corporation, Inc. | Method and apparatus for planar index guided vertical cavity surface emitting lasers |
JP2001223384A (ja) * | 2000-02-08 | 2001-08-17 | Toshiba Corp | 半導体発光素子 |
US6744805B2 (en) * | 2000-04-05 | 2004-06-01 | Nortel Networks Limited | Single mode operation of microelectromechanically tunable, half-symmetric, vertical cavity surface emitting lasers |
KR100708081B1 (ko) * | 2000-05-18 | 2007-04-16 | 삼성전자주식회사 | 선택적 산화법에 의한 표면광 레이저의 어퍼쳐 제조 장치및 방법 |
DE10026262B4 (de) * | 2000-05-26 | 2005-03-17 | Osram Opto Semiconductors Gmbh | Vertikalresonator-Laserdiode (VCSEL) |
NL1015714C2 (nl) * | 2000-07-14 | 2002-01-15 | Dsm Nv | Werkwijze voor het kristalliseren van enantiomeer verrijkt 2-acetylthio-3-fenylpropaanzuur. |
US6570905B1 (en) | 2000-11-02 | 2003-05-27 | U-L-M Photonics Gmbh | Vertical cavity surface emitting laser with reduced parasitic capacitance |
US6548835B1 (en) | 2000-11-02 | 2003-04-15 | U-L-M Photonics Gmbh | Optoelectronic device having a highly conductive carrier tunneling current aperture |
US6639932B1 (en) * | 2001-03-16 | 2003-10-28 | Coretek, Inc. | Vertical-cavity surface-emitting laser (VCSEL) with cavity compensated gain |
US6975661B2 (en) | 2001-06-14 | 2005-12-13 | Finisar Corporation | Method and apparatus for producing VCSELS with dielectric mirrors and self-aligned gain guide |
DE10129616A1 (de) * | 2001-06-20 | 2003-01-09 | Infineon Technologies Ag | Halbleiterlaser, Verfahren zum Herstellen eines Halbleiterlasers und Verfahren zum Betreiben eines Halbleiterlasers |
GB2379797A (en) * | 2001-09-15 | 2003-03-19 | Zarlink Semiconductor Ab | Surface Emitting Laser |
US6795478B2 (en) * | 2002-03-28 | 2004-09-21 | Applied Optoelectronics, Inc. | VCSEL with antiguide current confinement layer |
US6890781B2 (en) * | 2002-06-25 | 2005-05-10 | Uni Light Technology Inc. | Transparent layer of a LED device and the method for growing the same |
EP1558955A4 (de) * | 2002-10-15 | 2006-04-19 | Micron Optics Inc | Waferlose faser-fabry-perot-filter |
EP1583989A4 (de) * | 2002-12-20 | 2006-07-05 | Micron Optics Inc | Temperatur kompensierter ferrulen halter für einen fabry-perot-faserfilter |
US20040213312A1 (en) * | 2003-04-25 | 2004-10-28 | Tan Michael R. | Semiconductor laser having improved high-frequency, large signal response at reduced operating current |
US7054345B2 (en) * | 2003-06-27 | 2006-05-30 | Finisar Corporation | Enhanced lateral oxidation |
US7075962B2 (en) * | 2003-06-27 | 2006-07-11 | Finisar Corporation | VCSEL having thermal management |
JP2005123416A (ja) * | 2003-10-17 | 2005-05-12 | Ricoh Co Ltd | 面発光レーザ素子およびその作製方法および面発光レーザアレイおよび光伝送システム |
US7218660B2 (en) * | 2003-10-27 | 2007-05-15 | Avago Technologies Fiber Ip (Singapore) Pte. Ltd. | Single-mode vertical cavity surface emitting lasers and methods of making the same |
US20050201436A1 (en) * | 2004-03-15 | 2005-09-15 | Doug Collins | Method for processing oxide-confined VCSEL semiconductor devices |
US20060029112A1 (en) * | 2004-03-31 | 2006-02-09 | Young Ian A | Surface emitting laser with an integrated absorber |
JP2005311089A (ja) * | 2004-04-22 | 2005-11-04 | Fuji Xerox Co Ltd | 垂直共振器型面発光半導体レーザ装置 |
US20050243881A1 (en) * | 2004-04-30 | 2005-11-03 | Hoki Kwon | InAlAs having enhanced oxidation rate grown under very low V/III ratio |
JP4747516B2 (ja) * | 2004-06-08 | 2011-08-17 | 富士ゼロックス株式会社 | 垂直共振器型面発光半導体レーザ装置 |
US7564887B2 (en) * | 2004-06-30 | 2009-07-21 | Finisar Corporation | Long wavelength vertical cavity surface emitting lasers |
US7400665B2 (en) * | 2004-11-05 | 2008-07-15 | Hewlett-Packard Developement Company, L.P. | Nano-VCSEL device and fabrication thereof using nano-colonnades |
US20070188951A1 (en) * | 2006-02-10 | 2007-08-16 | Crews Darren S | Optoelectronic device ESD protection |
US7483212B2 (en) * | 2006-10-11 | 2009-01-27 | Rensselaer Polytechnic Institute | Optical thin film, semiconductor light emitting device having the same and methods of fabricating the same |
TW200834969A (en) * | 2007-02-13 | 2008-08-16 | Epistar Corp | Light-emitting diode and method for manufacturing the same |
US9070851B2 (en) | 2010-09-24 | 2015-06-30 | Seoul Semiconductor Co., Ltd. | Wafer-level light emitting diode package and method of fabricating the same |
CN205944139U (zh) | 2016-03-30 | 2017-02-08 | 首尔伟傲世有限公司 | 紫外线发光二极管封装件以及包含此的发光二极管模块 |
CA3069723C (en) * | 2017-07-17 | 2024-01-16 | Thorlabs,Inc. | Mid-infrared vertical cavity laser |
US11973307B2 (en) | 2018-04-12 | 2024-04-30 | Suzhou Lekin Semiconductor Co., Ltd. | Surface-emitting laser device |
US10987631B2 (en) | 2018-04-17 | 2021-04-27 | Smartflow Technologies, Inc. | Filter cassette article, and filter comprising same |
KR102551471B1 (ko) | 2018-07-27 | 2023-07-06 | 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 | 표면발광 레이저소자 및 이를 포함하는 발광장치 |
US11025033B2 (en) * | 2019-05-21 | 2021-06-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Bump bonding structure to mitigate space contamination for III-V dies and CMOS dies |
CN111817129A (zh) * | 2020-08-31 | 2020-10-23 | 江西铭德半导体科技有限公司 | 一种vcsel芯片及其制造方法 |
CN113206446A (zh) * | 2021-04-30 | 2021-08-03 | 厦门大学 | 基于导电氧化物dbr的氮化物垂直腔面发射激光器的制作方法 |
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US4495514A (en) * | 1981-03-02 | 1985-01-22 | Eastman Kodak Company | Transparent electrode light emitting diode and method of manufacture |
JPS6081888A (ja) * | 1983-10-12 | 1985-05-09 | Rohm Co Ltd | 面発光レ−ザおよびその製造方法 |
JPS6097684A (ja) * | 1983-10-31 | 1985-05-31 | Rohm Co Ltd | 半導体レーザ |
JPH01264285A (ja) * | 1988-04-15 | 1989-10-20 | Omron Tateisi Electron Co | 面発光型半導体レーザ |
JPS6446996A (en) * | 1988-08-03 | 1989-02-21 | Agency Ind Science Techn | Method for realizing optical bistable function and optical bistable function element |
US4873696A (en) * | 1988-10-31 | 1989-10-10 | The Regents Of The University Of California | Surface-emitting lasers with periodic gain and a parallel driven nipi structure |
US5018157A (en) * | 1990-01-30 | 1991-05-21 | At&T Bell Laboratories | Vertical cavity semiconductor lasers |
US5012486A (en) * | 1990-04-06 | 1991-04-30 | At&T Bell Laboratories | Vertical cavity semiconductor laser with lattice-mismatched mirror stack |
-
1991
- 1991-01-03 US US07/637,245 patent/US5115441A/en not_active Expired - Lifetime
- 1991-10-29 CA CA002054404A patent/CA2054404C/en not_active Expired - Fee Related
- 1991-11-14 TW TW080108948A patent/TW212255B/zh active
- 1991-12-10 SG SG1995903290A patent/SG28332G/en unknown
- 1991-12-10 DE DE69104342T patent/DE69104342T2/de not_active Expired - Fee Related
- 1991-12-10 EP EP91311481A patent/EP0497052B1/de not_active Expired - Lifetime
- 1991-12-27 JP JP3345666A patent/JP2975201B2/ja not_active Expired - Lifetime
- 1991-12-30 KR KR1019910025274A patent/KR0127911B1/ko not_active IP Right Cessation
-
1995
- 1995-12-14 HK HK188895A patent/HK188895A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69104342T2 (de) | 1995-02-16 |
CA2054404C (en) | 1994-03-08 |
US5115441A (en) | 1992-05-19 |
DE69104342D1 (de) | 1994-11-03 |
JPH04276681A (ja) | 1992-10-01 |
EP0497052A1 (de) | 1992-08-05 |
KR0127911B1 (ko) | 1998-04-07 |
EP0497052B1 (de) | 1994-09-28 |
CA2054404A1 (en) | 1992-07-04 |
KR920015668A (ko) | 1992-08-27 |
TW212255B (de) | 1993-09-01 |
SG28332G (en) | 1995-09-01 |
JP2975201B2 (ja) | 1999-11-10 |
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