HK1252618A1 - 表面位置檢測裝置、曝光裝置和曝光方法 - Google Patents

表面位置檢測裝置、曝光裝置和曝光方法

Info

Publication number
HK1252618A1
HK1252618A1 HK18111918.6A HK18111918A HK1252618A1 HK 1252618 A1 HK1252618 A1 HK 1252618A1 HK 18111918 A HK18111918 A HK 18111918A HK 1252618 A1 HK1252618 A1 HK 1252618A1
Authority
HK
Hong Kong
Prior art keywords
exposure
position detection
surface position
detection apparatus
exposure method
Prior art date
Application number
HK18111918.6A
Other languages
English (en)
Inventor
Yasuhiro Hidaka
Tadashi Nagayama
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1252618A1 publication Critical patent/HK1252618A1/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Automatic Focus Adjustment (AREA)
  • Optical Elements Other Than Lenses (AREA)
HK18111918.6A 2005-07-08 2018-09-17 表面位置檢測裝置、曝光裝置和曝光方法 HK1252618A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005200178 2005-07-08

Publications (1)

Publication Number Publication Date
HK1252618A1 true HK1252618A1 (zh) 2019-05-31

Family

ID=37636945

Family Applications (7)

Application Number Title Priority Date Filing Date
HK08108984.3A HK1121229A1 (zh) 2005-07-08 2008-08-13 面位置檢測裝置、曝光裝置及曝光方法
HK08110767.2A HK1118895A1 (zh) 2005-07-08 2008-09-26 表面位置檢測設備、曝光設備和曝光方法
HK13101034.1A HK1174103A1 (zh) 2005-07-08 2008-09-26 表面位置檢測設備、曝光設備和曝光方法
HK16103184.2A HK1215306A1 (zh) 2005-07-08 2016-03-18 面位置檢測裝置、曝光裝置及曝光方法
HK16103183.3A HK1215305A1 (zh) 2005-07-08 2016-03-18 面位置檢測裝置、曝光裝置及曝光方法
HK16108559.8A HK1220516A1 (zh) 2005-07-08 2016-07-19 曝光裝置與曝光方法
HK18111918.6A HK1252618A1 (zh) 2005-07-08 2018-09-17 表面位置檢測裝置、曝光裝置和曝光方法

Family Applications Before (6)

Application Number Title Priority Date Filing Date
HK08108984.3A HK1121229A1 (zh) 2005-07-08 2008-08-13 面位置檢測裝置、曝光裝置及曝光方法
HK08110767.2A HK1118895A1 (zh) 2005-07-08 2008-09-26 表面位置檢測設備、曝光設備和曝光方法
HK13101034.1A HK1174103A1 (zh) 2005-07-08 2008-09-26 表面位置檢測設備、曝光設備和曝光方法
HK16103184.2A HK1215306A1 (zh) 2005-07-08 2016-03-18 面位置檢測裝置、曝光裝置及曝光方法
HK16103183.3A HK1215305A1 (zh) 2005-07-08 2016-03-18 面位置檢測裝置、曝光裝置及曝光方法
HK16108559.8A HK1220516A1 (zh) 2005-07-08 2016-07-19 曝光裝置與曝光方法

Country Status (7)

Country Link
US (5) US8149382B2 (zh)
EP (7) EP2463715B1 (zh)
JP (10) JP4883006B2 (zh)
KR (7) KR101447391B1 (zh)
CN (5) CN105204302A (zh)
HK (7) HK1121229A1 (zh)
WO (1) WO2007007549A1 (zh)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2463715B1 (en) * 2005-07-08 2015-06-10 Nikon Corporation Surface position detection apparatus, exposure apparatus, and exposure method
JP5622068B2 (ja) 2005-11-15 2014-11-12 株式会社ニコン 面位置検出装置、露光装置、およびデバイスの製造方法
US9019466B2 (en) 2007-07-24 2015-04-28 Asml Netherlands B.V. Lithographic apparatus, reflective member and a method of irradiating the underside of a liquid supply system
US7916269B2 (en) 2007-07-24 2011-03-29 Asml Netherlands B.V. Lithographic apparatus and contamination removal or prevention method
JP2009054730A (ja) * 2007-08-24 2009-03-12 Nikon Corp 移動体駆動方法及び移動体駆動システム、パターン形成方法及び装置、露光及び装置、並びにデバイス製造方法
US8111406B2 (en) 2007-11-14 2012-02-07 Nikon Corporation Surface position detecting apparatus, surface position detecting method, exposure apparatus, and device manufacturing method
DE102010013386A1 (de) * 2010-03-30 2011-10-06 Emz-Hanauer Gmbh & Co. Kgaa Vorrichtung zum Erfassen der Relativposition eines lageveränderlichen Bauteils relativ zu einem Referenzbauteil eines Wäschebehandlungsgeräts sowie entsprechendes Wäschebehandlungsgerät
CN103365103B (zh) * 2012-04-10 2015-09-30 上海微电子装备有限公司 一种调焦调平装置及调焦调平方法
US8993974B2 (en) 2012-06-12 2015-03-31 Nikon Corporation Color time domain integration camera having a single charge coupled device and fringe projection auto-focus system
JP6066627B2 (ja) * 2012-08-23 2017-01-25 キヤノン株式会社 位置検出装置、およびそれを用いたリソグラフィー装置並びにデバイスの製造方法
US11885738B1 (en) 2013-01-22 2024-01-30 J.A. Woollam Co., Inc. Reflectometer, spectrophotometer, ellipsometer or polarimeter system including sample imaging system that simultaneously meet the scheimpflug condition and overcomes keystone error
CN104166315B (zh) * 2014-08-14 2017-05-17 深圳市华星光电技术有限公司 曝光方法及曝光机
KR101774647B1 (ko) 2015-09-23 2017-09-05 현병찬 화분용 급수통
JP6682263B2 (ja) * 2015-12-25 2020-04-15 キヤノン株式会社 検出装置、露光装置および物品の製造方法
KR102522899B1 (ko) * 2016-02-05 2023-04-19 (주)테크윙 전자부품 적재상태 점검장치
JP6774714B2 (ja) * 2016-07-25 2020-10-28 株式会社アドテックエンジニアリング ワークステージ及び露光装置
CN108121179A (zh) 2016-11-30 2018-06-05 上海微电子装备（集团）股份有限公司 一种调焦调平装置
WO2018147313A1 (ja) 2017-02-08 2018-08-16 日本電信電話株式会社 通信装置及び通信方法
JP6969164B2 (ja) * 2017-05-31 2021-11-24 株式会社リコー 評価装置、評価プログラム及び評価方法
CN108008541B (zh) * 2017-10-25 2020-07-10 中国航空工业集团公司洛阳电光设备研究所 一种装调双光楔的方法
WO2019192865A1 (en) * 2018-04-06 2019-10-10 Asml Netherlands B.V. Inspection apparatus having non-linear optics
EP3929529A4 (en) * 2019-02-21 2022-10-12 Nikon Corporation SURFACE POSITION DETECTION DEVICE, EXPOSURE DEVICE, SUBSTRATE PROCESSING SYSTEM AND METHOD OF MAKING THE DEVICE
JP2020148463A (ja) * 2019-03-11 2020-09-17 株式会社日立ハイテク 高さ測定装置及びビーム照射装置
CN112684572B (zh) * 2021-01-21 2022-03-29 浙江大学 一种兼具自动调平功能的自动对焦方法及装置
KR102545519B1 (ko) * 2022-01-03 2023-06-21 (주)오로스 테크놀로지 편광 변조가 최소화된 반사형 광학계 및 이를 구비한 분광 타원계

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4864123A (en) * 1987-05-08 1989-09-05 Nikon Corporation Apparatus for detecting the level of an object surface
JPH0718699B2 (ja) * 1987-05-08 1995-03-06 株式会社ニコン 表面変位検出装置
EP0342061B1 (en) * 1988-05-13 1995-11-02 Canon Kabushiki Kaisha Projection exposure apparatus
NL9100410A (nl) * 1991-03-07 1992-10-01 Asm Lithography Bv Afbeeldingsapparaat voorzien van een focusfout- en/of scheefstandsdetectie-inrichting.
JP3204406B2 (ja) * 1991-10-30 2001-09-04 株式会社ニコン 面位置検出方法及び装置、半導体露光装置、並びに前記方法を用いた露光方法
JP3360321B2 (ja) 1992-09-17 2002-12-24 株式会社ニコン 面位置検出装置及び方法並びに露光装置及び方法
JPH07221013A (ja) * 1993-12-09 1995-08-18 Nikon Corp 面位置検出装置
JPH07239212A (ja) * 1994-02-28 1995-09-12 Nikon Corp 位置検出装置
JP3177104B2 (ja) 1994-09-16 2001-06-18 日本アイ・ビー・エム株式会社 フレア防止光学系、フレア防止方法、浮上量測定装置
JPH09178415A (ja) * 1995-12-25 1997-07-11 Nikon Corp 光波干渉測定装置
JPH1082611A (ja) * 1996-09-10 1998-03-31 Nikon Corp 面位置検出装置
JP3955985B2 (ja) 1996-10-16 2007-08-08 株式会社ニコン マーク位置検出装置及び方法
KR20030096435A (ko) * 1996-11-28 2003-12-31 가부시키가이샤 니콘 노광장치 및 노광방법
AU2076699A (en) * 1998-02-02 1999-08-16 Nikon Corporation Surface position sensor and position sensor
JP3003671B2 (ja) * 1998-06-01 2000-01-31 株式会社日立製作所 試料表面の高さ検出方法及びその装置
US7116401B2 (en) * 1999-03-08 2006-10-03 Asml Netherlands B.V. Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
JP2001296105A (ja) 2000-04-12 2001-10-26 Nikon Corp 面位置検出装置、並びに該検出装置を用いた露光装置および露光方法
US7053394B2 (en) * 2001-08-08 2006-05-30 Matsushita Electric Industrial Co., Ltd. Recording device of master disk for information recording medium
US6813397B2 (en) * 2001-11-21 2004-11-02 Dong Lin Micro-optic polarization beam multiplexing/de-multiplexing system
JP2004163555A (ja) * 2002-11-12 2004-06-10 Olympus Corp 落射顕微鏡及び落射顕微鏡用対物レンズ
KR100606502B1 (ko) 2003-01-14 2006-08-02 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치용 레벨센서
US7265364B2 (en) * 2004-06-10 2007-09-04 Asml Netherlands B.V. Level sensor for lithographic apparatus
KR101248674B1 (ko) * 2004-06-16 2013-03-28 가부시키가이샤 니콘 표면 검사 장치 및 표면 검사 방법
EP2463715B1 (en) * 2005-07-08 2015-06-10 Nikon Corporation Surface position detection apparatus, exposure apparatus, and exposure method

Also Published As

Publication number Publication date
JP6555222B2 (ja) 2019-08-07
HK1121229A1 (zh) 2009-04-17
US9519223B2 (en) 2016-12-13
US20170075227A1 (en) 2017-03-16
CN103728849B (zh) 2017-08-01
KR20080026121A (ko) 2008-03-24
CN105204303A (zh) 2015-12-30
CN105204302A (zh) 2015-12-30
WO2007007549A1 (ja) 2007-01-18
JP6128178B2 (ja) 2017-05-17
JP4883056B2 (ja) 2012-02-22
JP2012053048A (ja) 2012-03-15
EP2733535A3 (en) 2014-08-13
KR101868218B1 (ko) 2018-06-15
JP2008258655A (ja) 2008-10-23
JP2018081314A (ja) 2018-05-24
JP2016029483A (ja) 2016-03-03
JPWO2007007549A1 (ja) 2009-01-29
EP2463715A2 (en) 2012-06-13
KR20180067714A (ko) 2018-06-20
EP1909062A1 (en) 2008-04-09
JP5673772B2 (ja) 2015-02-18
EP2463715A3 (en) 2012-09-05
JP4883006B2 (ja) 2012-02-22
JP5854106B2 (ja) 2016-02-09
KR101447391B1 (ko) 2014-10-06
JP2008258654A (ja) 2008-10-23
JP2013070075A (ja) 2013-04-18
US8149382B2 (en) 2012-04-03
KR20140018336A (ko) 2014-02-12
EP2520978A2 (en) 2012-11-07
EP2463715B1 (en) 2015-06-10
EP3321741A2 (en) 2018-05-16
EP2993525A1 (en) 2016-03-09
EP2463716B1 (en) 2015-03-18
CN101218482B (zh) 2015-10-21
KR101574918B1 (ko) 2015-12-04
EP2463716A3 (en) 2012-09-05
CN103728848A (zh) 2014-04-16
EP2463716B8 (en) 2015-05-20
KR20140084306A (ko) 2014-07-04
US20150248064A1 (en) 2015-09-03
EP2520978A3 (en) 2013-09-25
EP2993525B1 (en) 2017-10-04
HK1174103A1 (zh) 2013-05-31
US9927713B2 (en) 2018-03-27
EP1909062B1 (en) 2014-03-05
KR20130130094A (ko) 2013-11-29
EP1909062A4 (en) 2009-10-21
HK1215305A1 (zh) 2016-08-19
EP2463716A2 (en) 2012-06-13
CN103728849A (zh) 2014-04-16
JP2014057078A (ja) 2014-03-27
CN101218482A (zh) 2008-07-09
US20180188657A1 (en) 2018-07-05
EP2733535A2 (en) 2014-05-21
HK1220516A1 (zh) 2017-05-05
US20100129739A1 (en) 2010-05-27
KR101269298B1 (ko) 2013-05-29
CN105204303B (zh) 2018-03-20
CN103728848B (zh) 2017-06-30
KR20150142063A (ko) 2015-12-21
JP4883055B2 (ja) 2012-02-22
EP3321741A3 (en) 2018-08-01
KR101447407B1 (ko) 2014-10-06
EP2733535B1 (en) 2015-08-05
KR101484436B1 (ko) 2015-01-19
EP2520978B1 (en) 2015-04-29
HK1118895A1 (zh) 2009-02-20
JP5565449B2 (ja) 2014-08-06
JP2015057837A (ja) 2015-03-26
KR20130019028A (ko) 2013-02-25
HK1215306A1 (zh) 2016-08-19
US20120162623A1 (en) 2012-06-28
JP2017021382A (ja) 2017-01-26
US9069261B2 (en) 2015-06-30
JP5464191B2 (ja) 2014-04-09

Similar Documents

Publication Publication Date Title
HK1252618A1 (zh) 表面位置檢測裝置、曝光裝置和曝光方法
HK1199771A1 (zh) 曝光裝置和方法
TWI348596B (en) Exposure apparatus and method
HK1173786A1 (zh) 位置檢測裝置、曝光裝置以及元件製造方法
IL231308A0 (en) Device and detection method
IL188276A0 (en) Exposure method and exposure apparatus, and device manufacturing method
EP1947683A4 (en) EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
GB2426591B (en) Sensing apparatus and method
GB2431485B (en) Device, method and apparatus
EP1876635A4 (en) EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
GB0504664D0 (en) Method, device and apparatus
IL187322A0 (en) Object detection method and apparatus
EP1895570A4 (en) EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD
EP1965414A4 (en) EXPOSURE METHOD, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
EP1922588A4 (en) METHOD AND SHAPE EXPOSURE DEVICE
IL186919A0 (en) Exposure method, exposure apparatus, and device manufacturing method
EP1850371A4 (en) EXPOSURE METHOD, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
EP1865466A4 (en) DEVICE AND METHOD FOR DETECTING OPERATION
EP1865542A4 (en) EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
GB2422970B (en) Detection apparatus
GB2432948B (en) Detection apparatus
GB0504361D0 (en) Detection apparatus
EP1950795A4 (en) EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING THE APPARATUS
GB0404195D0 (en) Detection apparatus
TWI350485B (en) Apparatus and method for detecting asset position