AU2076699A - Surface position sensor and position sensor - Google Patents

Surface position sensor and position sensor

Info

Publication number
AU2076699A
AU2076699A AU20766/99A AU2076699A AU2076699A AU 2076699 A AU2076699 A AU 2076699A AU 20766/99 A AU20766/99 A AU 20766/99A AU 2076699 A AU2076699 A AU 2076699A AU 2076699 A AU2076699 A AU 2076699A
Authority
AU
Australia
Prior art keywords
position sensor
surface position
sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU20766/99A
Inventor
Naoto Kondou
Hideo Mizutani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2076699A publication Critical patent/AU2076699A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU20766/99A 1998-02-02 1999-02-02 Surface position sensor and position sensor Abandoned AU2076699A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2070998 1998-02-02
JP10-20709 1998-02-02
JP10-95472 1998-03-24
JP9547298 1998-03-24
PCT/JP1999/000426 WO1999039376A1 (en) 1998-02-02 1999-02-02 Surface position sensor and position sensor

Publications (1)

Publication Number Publication Date
AU2076699A true AU2076699A (en) 1999-08-16

Family

ID=26357686

Family Applications (1)

Application Number Title Priority Date Filing Date
AU20766/99A Abandoned AU2076699A (en) 1998-02-02 1999-02-02 Surface position sensor and position sensor

Country Status (2)

Country Link
AU (1) AU2076699A (en)
WO (1) WO1999039376A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180067714A (en) * 2005-07-08 2018-06-20 가부시키가이샤 니콘 Surface position detection apparatus, exposure apparatus, and exposure method
JP2007052226A (en) 2005-08-18 2007-03-01 Seiko Epson Corp Illuminating device and projector
JP5622068B2 (en) 2005-11-15 2014-11-12 株式会社ニコン Surface position detection apparatus, exposure apparatus, and device manufacturing method
US7898662B2 (en) 2006-06-20 2011-03-01 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
NL1036245A1 (en) 2007-12-17 2009-06-18 Asml Netherlands Bv Diffraction based overlay metrology tool and method or diffraction based overlay metrology.
US20110071784A1 (en) 2009-09-21 2011-03-24 Nikon Corporation Goos-Hanchen compensation in autofocus systems
CN114440785B (en) * 2022-02-08 2023-02-07 山东大学 Device and method for measuring photoinduced deformation coefficient of material based on optical interference principle

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0334307A (en) * 1990-06-06 1991-02-14 Matsushita Electric Ind Co Ltd Semiconductor wafer exposing method
JP2827566B2 (en) * 1991-03-29 1998-11-25 キヤノン株式会社 Alignment apparatus, exposure apparatus, and method of manufacturing semiconductor device using the same

Also Published As

Publication number Publication date
WO1999039376A1 (en) 1999-08-05

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase