HK1154577A1 - -聯苯甲基咪唑化合物的製備方法 - Google Patents

-聯苯甲基咪唑化合物的製備方法

Info

Publication number
HK1154577A1
HK1154577A1 HK11108788.6A HK11108788A HK1154577A1 HK 1154577 A1 HK1154577 A1 HK 1154577A1 HK 11108788 A HK11108788 A HK 11108788A HK 1154577 A1 HK1154577 A1 HK 1154577A1
Authority
HK
Hong Kong
Prior art keywords
producing
biphenylmethylimidazole
compound
biphenylmethylimidazole compound
Prior art date
Application number
HK11108788.6A
Other languages
English (en)
Inventor
Koji Sato
Tsutomu Yagi
Kenji Sakuratani
Yuichiro Tani
Original Assignee
Daiichi Sankyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daiichi Sankyo Co Ltd filed Critical Daiichi Sankyo Co Ltd
Publication of HK1154577A1 publication Critical patent/HK1154577A1/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
    • C07D403/10—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/30—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group
    • C07C67/313—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by introduction of doubly bound oxygen containing functional groups, e.g. carboxyl groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/66—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D233/90—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/14—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
HK11108788.6A 2008-06-09 2011-08-19 -聯苯甲基咪唑化合物的製備方法 HK1154577A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008150686 2008-06-09
PCT/JP2009/060419 WO2009151016A1 (ja) 2008-06-09 2009-06-08 １－ビフェニルメチルイミダゾール化合物の製造方法

Publications (1)

Publication Number Publication Date
HK1154577A1 true HK1154577A1 (zh) 2012-04-27

Family

ID=41416721

Family Applications (1)

Application Number Title Priority Date Filing Date
HK11108788.6A HK1154577A1 (zh) 2008-06-09 2011-08-19 -聯苯甲基咪唑化合物的製備方法

Country Status (12)

Country Link
US (1) US8735598B2 (zh)
EP (1) EP2298763B1 (zh)
JP (1) JP5415416B2 (zh)
KR (1) KR101630885B1 (zh)
CN (1) CN102083823B (zh)
CA (1) CA2727220C (zh)
ES (1) ES2540062T3 (zh)
HK (1) HK1154577A1 (zh)
HU (1) HUE025230T2 (zh)
IL (1) IL209909A (zh)
TW (1) TWI438194B (zh)
WO (1) WO2009151016A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2760031C (en) 2009-04-28 2015-03-10 Daiichi Sankyo Company, Limited Acetone solvate crystals of trityl olmesartan medoxomil
ES2527686T3 (es) 2009-04-28 2015-01-28 Daiichi Sankyo Company, Limited Procedimiento de producción de olmesartán medoxomil
WO2013126015A1 (en) 2012-02-23 2013-08-29 N. V. Nutricia Composition comprising non- digestible oligosaccharides

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5728703B2 (zh) * 1972-05-05 1982-06-18
US5616599A (en) * 1991-02-21 1997-04-01 Sankyo Company, Limited Angiotensin II antagosist 1-biphenylmethylimidazole compounds and their therapeutic use
FI112942B3 (fi) 1991-02-21 2012-03-13 Daiichi Sankyo Co Ltd Menetelmä kohonneen verenpaineen hoitoon ja ennaltaehkäisyyn käyttökelpoisten 4'-(1H-imidatsol-1-yylimetyyli)-1,1' -bifenyylijohdannaisten valmistamiseksi
JPH07121918A (ja) 1993-08-30 1995-05-12 Tdk Corp 光磁気記録媒体
JP3521304B2 (ja) 1996-03-21 2004-04-19 東洋化成工業株式会社 １−（テトラゾリルビフェニルメチル）イミダゾール誘導体の製造方法
JP3671266B2 (ja) * 1996-03-21 2005-07-13 東洋化成工業株式会社 ５−置換テトラゾール類の製造方法
JP2004217542A (ja) * 2003-01-10 2004-08-05 Fuji Photo Film Co Ltd ４，５−ジアルコキシカルボニルイミダゾールの製造方法
JP2004300118A (ja) * 2003-04-01 2004-10-28 Fuji Photo Film Co Ltd ４，５−ジ置換カルボニルイミダゾールの製造方法
JP4437141B2 (ja) 2004-09-02 2010-03-24 テバ ファーマシューティカル インダストリーズ リミティド オルメサルタンメドキソミルの精製法
US20070054948A1 (en) * 2004-09-02 2007-03-08 Lilach Hedvati Purification of olmesartan medoxomil
CN1993355A (zh) 2004-09-02 2007-07-04 特瓦制药工业有限公司 奥美沙坦酯的纯化方法
JP2006111586A (ja) * 2004-10-15 2006-04-27 Nippon Petrochemicals Co Ltd 置換芳香族化合物の酸化方法
KR20090108739A (ko) * 2005-01-03 2009-10-16 테바 파마슈티컬 인더스트리즈 리미티드 불순물의 양이 감소된 올메사탄 메독소밀
SI22092A (sl) 2005-07-29 2007-02-28 Krka, Tovarna Zdravil, D.D., Novo Mesto Postopek za pripravo olmesartan medoksomila
US7943779B2 (en) 2005-07-29 2011-05-17 Krka Process for the preparation of olmesartan medoxomil
WO2007047838A2 (en) 2005-10-20 2007-04-26 Dr. Reddy's Laboratories Ltd. Process for preparing olmesartan medoxomil
CZ299902B6 (cs) 2005-10-27 2008-12-29 Zentiva, A. S Zpusob odstranování trifenylmethanové chránicí skupiny u prekurzoru antihypertenzních léciv
US8048904B2 (en) * 2006-06-19 2011-11-01 Matrix Laboratories Ltd. Process for the preparation of olmesartan medoxomil
ITMI20061848A1 (it) 2006-09-27 2008-03-28 Dipharma Spa Procedimento per la preparazione di composti feniltetrazolici
EP2074116A2 (en) 2006-10-09 2009-07-01 Cipla Limited Process for preparing trityl olmesartan medoxomil and olmesartan medoxomil
CA2707334C (en) 2007-08-08 2015-11-24 Lek Pharmaceuticals D.D. A process for the preparation or purification of olmesartan medoxomil
EP2036904A1 (en) 2007-08-08 2009-03-18 LEK Pharmaceuticals D.D. A process for the preparation of olmesartan medoxomil
EP2334668B1 (en) 2008-09-05 2014-04-02 Krka Tovarna Zdravil, D.D., Novo Mesto Process for preparing olmesartan medoxomil intermediate
WO2011014611A2 (en) 2009-07-30 2011-02-03 Dr. Reddy's Laboratories Ltd. Preparation of olmesartan medoxomil
WO2012001694A1 (en) 2010-06-28 2012-01-05 Hetero Research Foundation Process for olmesartan medoxomil
JP7121918B2 (ja) * 2016-12-14 2022-08-19 大日本印刷株式会社 蒸着マスク装置及び蒸着マスク装置の製造方法

Also Published As

Publication number Publication date
EP2298763B1 (en) 2015-03-25
ES2540062T3 (es) 2015-07-08
TW201002673A (en) 2010-01-16
CN102083823B (zh) 2015-10-07
WO2009151016A1 (ja) 2009-12-17
JPWO2009151016A1 (ja) 2011-11-17
EP2298763A1 (en) 2011-03-23
KR20110015428A (ko) 2011-02-15
CA2727220A1 (en) 2009-12-17
IL209909A (en) 2014-07-31
EP2298763A4 (en) 2011-10-05
US20110092713A1 (en) 2011-04-21
CN102083823A (zh) 2011-06-01
HUE025230T2 (en) 2016-02-29
JP5415416B2 (ja) 2014-02-12
KR101630885B1 (ko) 2016-06-15
IL209909A0 (en) 2011-02-28
US8735598B2 (en) 2014-05-27
TWI438194B (zh) 2014-05-21
CA2727220C (en) 2015-07-28

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210604