HK1118871A1 - Apparatus and method for coating a substrate - Google Patents

Apparatus and method for coating a substrate

Info

Publication number
HK1118871A1
HK1118871A1 HK08110106.2A HK08110106A HK1118871A1 HK 1118871 A1 HK1118871 A1 HK 1118871A1 HK 08110106 A HK08110106 A HK 08110106A HK 1118871 A1 HK1118871 A1 HK 1118871A1
Authority
HK
Hong Kong
Prior art keywords
coating
substrate
Prior art date
Application number
HK08110106.2A
Other languages
English (en)
Inventor
J A F M Schade Van Westrum
Laurent Christophe Bernard Baptiste
Gerardus Gleijm
Original Assignee
Tata Steel Nederland Technology Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tata Steel Nederland Technology Bv filed Critical Tata Steel Nederland Technology Bv
Publication of HK1118871A1 publication Critical patent/HK1118871A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
HK08110106.2A 2005-05-31 2008-09-11 Apparatus and method for coating a substrate HK1118871A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP05076265 2005-05-31
PCT/EP2006/003924 WO2006128532A1 (en) 2005-05-31 2006-04-27 Apparatus and method for coating a substrate

Publications (1)

Publication Number Publication Date
HK1118871A1 true HK1118871A1 (en) 2009-02-20

Family

ID=34981132

Family Applications (1)

Application Number Title Priority Date Filing Date
HK08110106.2A HK1118871A1 (en) 2005-05-31 2008-09-11 Apparatus and method for coating a substrate

Country Status (21)

Country Link
US (1) US8435352B2 (xx)
EP (1) EP1902152B1 (xx)
JP (1) JP5394061B2 (xx)
KR (1) KR101235457B1 (xx)
CN (1) CN101175866B (xx)
AR (1) AR053487A1 (xx)
AT (1) ATE471997T1 (xx)
AU (1) AU2006254452B2 (xx)
BR (1) BRPI0610874A2 (xx)
CA (1) CA2605147C (xx)
DE (1) DE602006015055D1 (xx)
ES (1) ES2346902T3 (xx)
HK (1) HK1118871A1 (xx)
MX (1) MX2007014483A (xx)
MY (1) MY141409A (xx)
NZ (1) NZ562697A (xx)
RU (1) RU2388846C2 (xx)
TW (1) TWI461553B (xx)
UA (1) UA87916C2 (xx)
WO (1) WO2006128532A1 (xx)
ZA (1) ZA200709026B (xx)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060226003A1 (en) * 2003-01-22 2006-10-12 John Mize Apparatus and methods for ionized deposition of a film or thin layer
US9659758B2 (en) 2005-03-22 2017-05-23 Honeywell International Inc. Coils utilized in vapor deposition applications and methods of production
DE102009042972A1 (de) 2009-09-16 2011-03-24 Technische Universität Ilmenau Vorrichtung und Verfahren zum Manipulieren einer levitierten elektrisch leitfähigen Substanz
US9267203B2 (en) * 2010-12-13 2016-02-23 Posco Continuous coating apparatus
KR101207719B1 (ko) 2010-12-27 2012-12-03 주식회사 포스코 건식 코팅 장치
DE102011018675A1 (de) 2011-04-18 2012-10-18 Technische Universität Ilmenau Vorrichtung und Verfahren zum aktiven Manipulieren einer elektrisch leitfähigen Substanz
EP3448666A1 (en) * 2016-04-27 2019-03-06 Essilor International Substrate holder for coating equiped with moveable shutters and method for using the same
US11183373B2 (en) 2017-10-11 2021-11-23 Honeywell International Inc. Multi-patterned sputter traps and methods of making
WO2019116082A1 (en) * 2017-12-14 2019-06-20 Arcelormittal Vacuum deposition facility and method for coating a substrate
WO2019116081A1 (en) * 2017-12-14 2019-06-20 Arcelormittal Vacuum deposition facility and method for coating a substrate
CN112553578B (zh) 2019-09-26 2022-01-14 宝山钢铁股份有限公司 一种具有抑流式喷嘴的真空镀膜装置
CN112553577A (zh) 2019-09-26 2021-03-26 宝山钢铁股份有限公司 一种提高真空镀膜收得率的真空镀膜装置
CN112575308B (zh) 2019-09-29 2023-03-24 宝山钢铁股份有限公司 一种能在真空下带钢高效镀膜的真空镀膜装置
CN113957390B (zh) * 2020-07-21 2024-03-08 宝山钢铁股份有限公司 一种具有气垫缓冲腔的真空镀膜装置
CN113957392B (zh) 2020-07-21 2022-09-20 宝山钢铁股份有限公司 一种采用混匀缓冲结构均匀分配金属蒸汽的真空镀膜装置
CN113957388B (zh) 2020-07-21 2022-08-16 宝山钢铁股份有限公司 一种采用导流板式结构均匀分配金属蒸汽的真空镀膜装置
CN113957391B (zh) * 2020-07-21 2023-09-12 宝山钢铁股份有限公司 一种采用芯棒加热结构均匀分配金属蒸汽的真空镀膜装置
CN113957389B (zh) * 2020-07-21 2023-08-11 宝山钢铁股份有限公司 一种具有多孔降噪及均匀化分配金属蒸汽的真空镀膜装置
KR102547666B1 (ko) * 2021-01-21 2023-06-27 울산대학교 산학협력단 진공 박막 증착용 분자빔 증발원

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5740758A (en) * 1980-08-22 1982-03-06 Sekisui Chem Co Ltd Method and device for manufacturing magnetic recording medium
DE3632027C1 (de) * 1986-09-20 1988-02-18 Rudnay Andre Dr De Verfahren und Vakuumbedampfungsanlage zum Metallisieren von Folienoberflaechen
JPH0793249B2 (ja) * 1991-03-22 1995-10-09 松下電器産業株式会社 金属化フィルムの製造方法
JPH06228740A (ja) * 1993-01-29 1994-08-16 Sony Corp 真空蒸着装置
JPH07252639A (ja) * 1994-03-15 1995-10-03 Kao Corp 金属薄膜体の製造方法
JPH0835059A (ja) * 1994-07-22 1996-02-06 Sony Corp 原料蒸気供給装置及び薄膜形成装置
JPH08104981A (ja) * 1994-10-05 1996-04-23 Sumitomo Electric Ind Ltd Ｐｖｄ装置
JP2000328239A (ja) 1999-05-19 2000-11-28 Shin Meiwa Ind Co Ltd 薄膜形成装置
US6830626B1 (en) * 1999-10-22 2004-12-14 Kurt J. Lesker Company Method and apparatus for coating a substrate in a vacuum
EP1174526A1 (en) 2000-07-17 2002-01-23 Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO Continuous vapour deposition
DE10128091C1 (de) * 2001-06-11 2002-10-02 Applied Films Gmbh & Co Kg Vorrichtung für die Beschichtung eines flächigen Substrats
NL1020059C2 (nl) * 2002-02-21 2003-08-25 Corus Technology B V Werkwijze en inrichting voor het bekleden van een substraat.
US6749906B2 (en) * 2002-04-25 2004-06-15 Eastman Kodak Company Thermal physical vapor deposition apparatus with detachable vapor source(s) and method
EP1560467B1 (en) * 2002-07-19 2014-02-26 LG Display Co., Ltd. Source for thermal physical vapor deposition of organic electroluminescent layers
JP2004099961A (ja) * 2002-09-09 2004-04-02 Nippon Steel Corp 金属箔コート設備及びコーティング金属箔の製造方法
DE10256038A1 (de) * 2002-11-30 2004-06-17 Applied Films Gmbh & Co. Kg Bedampfungsvorrichtung
WO2004105095A2 (en) * 2003-05-16 2004-12-02 Svt Associates Inc. Thin-film deposition evaporator

Also Published As

Publication number Publication date
CA2605147C (en) 2011-12-13
DE602006015055D1 (de) 2010-08-05
ATE471997T1 (de) 2010-07-15
EP1902152A1 (en) 2008-03-26
RU2007148502A (ru) 2009-07-20
BRPI0610874A2 (pt) 2010-08-03
NZ562697A (en) 2009-12-24
WO2006128532A1 (en) 2006-12-07
MX2007014483A (es) 2008-02-05
RU2388846C2 (ru) 2010-05-10
CA2605147A1 (en) 2006-12-07
KR20080016642A (ko) 2008-02-21
EP1902152B1 (en) 2010-06-23
KR101235457B1 (ko) 2013-02-20
AU2006254452B2 (en) 2010-11-18
JP2008542537A (ja) 2008-11-27
AU2006254452A1 (en) 2006-12-07
CN101175866A (zh) 2008-05-07
CN101175866B (zh) 2010-12-15
AR053487A1 (es) 2007-05-09
UA87916C2 (ru) 2009-08-25
ES2346902T3 (es) 2010-10-21
US20080280066A1 (en) 2008-11-13
TW200730648A (en) 2007-08-16
US8435352B2 (en) 2013-05-07
ZA200709026B (en) 2009-01-28
MY141409A (en) 2010-04-30
TWI461553B (zh) 2014-11-21
JP5394061B2 (ja) 2014-01-22

Similar Documents

Publication Publication Date Title
HK1118871A1 (en) Apparatus and method for coating a substrate
PL1841579T3 (pl) Sposób do formowania i powlekania podłoża
EP1874485A4 (en) DEVICE AND METHOD FOR COATING ANALYTICAL SUBSTRATES
IL178956A0 (en) METHOD FOR FORMING A COATING ON A SUBSTRATE AND A PLATINUM MODIFIED NiCoCrAIY COATING
GB0423685D0 (en) Improved method for coating a substrate
EP1975979A4 (en) COATING DEVICE AND METHOD
TWI349168B (en) Coating method and coating apparatus
PL1800813T3 (pl) Sposób i urządzenie do powlekania elementów konstrukcyjnych
ZA200709469B (en) Method for coating a substrate surface and coated product
TWI367130B (en) Film coating apparatus and film coating method
EP2060327A4 (en) COATING METHOD AND COATING APPARATUS
ZA200902935B (en) Method for coating a substrate and coated product
PL1775353T3 (pl) Urządzenie powlekające i sposób eksploatacji urządzenia powlekającego
SG121162A1 (en) Apparatus and method for procesing a substrate
ZA200803947B (en) Method for coating a component
TWI367539B (en) Methods and apparatus for purging a substrate carrier
TWI350561B (en) Apparatus and system for cleaning a substrate
TWI370503B (en) Apparatus and method for treating substrate
GB2453892B (en) Method and apparatus for clamping a substrate
GB0716234D0 (en) Method and apparatus for producing a coating of substrate
ZA200601506B (en) Method for preparing a coated substrate
EP2099062A4 (en) FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD
TWI368071B (en) Apparatus and method for attaching substrates
EP1976806A4 (en) METHOD AND DEVICE FOR PROCESSING A SUBSTRATE
EP1954408A4 (en) COATING METHOD AND DEVICE

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20150427