HK1116725A1 - Pressing mold and method for producing the same - Google Patents

Pressing mold and method for producing the same

Info

Publication number
HK1116725A1
HK1116725A1 HK08112024.7A HK08112024A HK1116725A1 HK 1116725 A1 HK1116725 A1 HK 1116725A1 HK 08112024 A HK08112024 A HK 08112024A HK 1116725 A1 HK1116725 A1 HK 1116725A1
Authority
HK
Hong Kong
Prior art keywords
producing
same
pressing mold
mold
pressing
Prior art date
Application number
HK08112024.7A
Other languages
English (en)
Inventor
Hiroshi Fujiwara
Ichiro Kanba
Tadashi Takano
Original Assignee
Toyo Advanced Tech Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Advanced Tech Co filed Critical Toyo Advanced Tech Co
Publication of HK1116725A1 publication Critical patent/HK1116725A1/xx

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B30—PRESSES
    • B30B—PRESSES IN GENERAL
    • B30B15/00—Details of, or accessories for, presses; Auxiliary measures in connection with pressing
    • B30B15/02—Dies; Inserts therefor; Mounting thereof; Moulds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0664—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mounting, Exchange, And Manufacturing Of Dies (AREA)
  • Physical Vapour Deposition (AREA)
HK08112024.7A 2007-02-27 2008-10-31 Pressing mold and method for producing the same HK1116725A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007046935A JP4975481B2 (ja) 2007-02-27 2007-02-27 プレス用金型

Publications (1)

Publication Number Publication Date
HK1116725A1 true HK1116725A1 (en) 2009-01-02

Family

ID=39714803

Family Applications (1)

Application Number Title Priority Date Filing Date
HK08112024.7A HK1116725A1 (en) 2007-02-27 2008-10-31 Pressing mold and method for producing the same

Country Status (4)

Country Link
US (1) US8087918B2 (ja)
JP (1) JP4975481B2 (ja)
CN (1) CN101254515B (ja)
HK (1) HK1116725A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5193153B2 (ja) 2009-10-02 2013-05-08 株式会社神戸製鋼所 硬質皮膜、塑性加工用金型、塑性加工方法、及び硬質皮膜用ターゲット
CN101808063B (zh) 2010-03-30 2014-01-01 中兴通讯股份有限公司 一种控制调制器相位延迟偏置点的方法及装置
US20120003425A1 (en) * 2010-06-30 2012-01-05 Kennametal Inc. TiAIN COATINGS FOR GLASS MOLDING DIES AND TOOLING
IT1402857B1 (it) * 2010-10-29 2013-09-27 Daejin Dsp Co Ltd Foglio decorativo laminato in acciaio inossidabile con disegno goffrato e suo procedimento di fabbricazione
JP6208493B2 (ja) * 2013-08-07 2017-10-04 トーヨーエイテック株式会社 コーティング膜でコーティングされた金型及び工具の製造方法
JP6874803B2 (ja) * 2018-11-19 2021-05-19 Ｊｆｅスチール株式会社 耐かじり性評価方法
WO2020116291A1 (ja) * 2018-12-03 2020-06-11 日立金属株式会社 ホットスタンプ用被覆金型

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1017264B (zh) 1986-09-12 1992-07-01 青岛化工学院 等离子体沉积保护膜的方法和装置
JPH0550473A (ja) * 1991-08-28 1993-03-02 Toshiba Corp 注型用金型
JPH0617230A (ja) * 1992-07-02 1994-01-25 Mitsubishi Materials Corp 傾斜硬質層被覆超硬合金製切削工具
WO1994011174A1 (en) * 1992-11-06 1994-05-26 Sodick Co., Ltd. Screw preplasticating injection molding machine
JPH06145960A (ja) 1992-11-12 1994-05-27 Tdk Corp 耐摩耗性保護膜
JP2944905B2 (ja) * 1995-01-31 1999-09-06 東洋鋼鈑株式会社 しごき加工用ポンチ
US6010777A (en) * 1997-01-31 2000-01-04 Ngk Spark Plug Co., Ltd. Titanium carbo-nitride complex silicon nitride tool
JP3057077B1 (ja) * 1999-03-08 2000-06-26 シチズン時計株式会社 樹脂成形用金型および樹脂成形用金型への硬質被膜形成方法
JP3644591B2 (ja) * 2000-10-23 2005-04-27 日立粉末冶金株式会社 粉末成形用ダイスおよびそれを用いた粉末成形方法
US6576162B2 (en) * 2001-04-30 2003-06-10 Essilor International Compagnie Generale D'optique Method for injection molding of weld line free thermoplastic articles such as ophthalmic lenses
JP4394445B2 (ja) * 2001-11-05 2010-01-06 日本碍子株式会社 ハニカム構造体成形用口金、及びその製造方法
JP2003266212A (ja) * 2002-03-19 2003-09-24 Hitachi Tool Engineering Ltd クロム含有膜被覆工具
JP4114741B2 (ja) * 2002-11-19 2008-07-09 日立ツール株式会社 チタンクロム化合物皮膜被覆工具
JP4205546B2 (ja) * 2003-09-16 2009-01-07 株式会社神戸製鋼所 耐摩耗性、耐熱性および基材との密着性に優れた積層皮膜の製造方法
JP2005264222A (ja) * 2004-03-18 2005-09-29 Jfe Steel Kk 金属粉末の高密度成形法
JP4523378B2 (ja) * 2004-10-21 2010-08-11 日本碍子株式会社 セラミックス押出成形用金型
CN100335673C (zh) 2005-01-28 2007-09-05 武汉理工大学 冷锻模型面硬质覆膜强化处理方法

Also Published As

Publication number Publication date
CN101254515A (zh) 2008-09-03
US20080203272A1 (en) 2008-08-28
JP2008207219A (ja) 2008-09-11
US8087918B2 (en) 2012-01-03
JP4975481B2 (ja) 2012-07-11
CN101254515B (zh) 2014-01-29

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20171204