HK1067787A1 - Device for loading and unloading silicon wafers inan oven from a multiplecassette station - Google Patents

Device for loading and unloading silicon wafers inan oven from a multiplecassette station

Info

Publication number
HK1067787A1
HK1067787A1 HK04110395A HK04110395A HK1067787A1 HK 1067787 A1 HK1067787 A1 HK 1067787A1 HK 04110395 A HK04110395 A HK 04110395A HK 04110395 A HK04110395 A HK 04110395A HK 1067787 A1 HK1067787 A1 HK 1067787A1
Authority
HK
Hong Kong
Prior art keywords
multiplecassette
loading
station
silicon wafers
unloading silicon
Prior art date
Application number
HK04110395A
Other languages
English (en)
Inventor
Yvon Pellegrin
Claude Giral
Original Assignee
Semco Engineering Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semco Engineering Sa filed Critical Semco Engineering Sa
Publication of HK1067787A1 publication Critical patent/HK1067787A1/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67754Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a batch of workpieces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769Storage means
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/141Associated with semiconductor wafer handling includes means for gripping wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
HK04110395A 2001-05-14 2004-12-31 Device for loading and unloading silicon wafers inan oven from a multiplecassette station HK1067787A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0106756A FR2824543B1 (fr) 2001-05-14 2001-05-14 Dispositif de chargement et de dechargement de plaquettes de silicium dans des fours a partir d'une station multi-cassettes
PCT/FR2002/001619 WO2002093617A2 (fr) 2001-05-14 2002-05-14 Dispositif de chargement et de dechargement de plaquettes de silicium dans des fours a partir d'une station multi-cassettes

Publications (1)

Publication Number Publication Date
HK1067787A1 true HK1067787A1 (en) 2005-04-15

Family

ID=8863563

Family Applications (1)

Application Number Title Priority Date Filing Date
HK04110395A HK1067787A1 (en) 2001-05-14 2004-12-31 Device for loading and unloading silicon wafers inan oven from a multiplecassette station

Country Status (9)

Country Link
US (1) US7326021B2 (ja)
EP (1) EP1388163A2 (ja)
JP (1) JP2004531890A (ja)
KR (1) KR20040012825A (ja)
CN (1) CN1295744C (ja)
AU (1) AU2002302725A1 (ja)
FR (1) FR2824543B1 (ja)
HK (1) HK1067787A1 (ja)
WO (1) WO2002093617A2 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101353222B (zh) * 2007-07-26 2010-12-01 张彩根 悬臂石英桨的制作方法及产品
JP5050761B2 (ja) * 2007-10-03 2012-10-17 東京エレクトロン株式会社 被処理体の処理システム及び被処理体の熱処理方法
WO2012127123A1 (fr) 2011-03-18 2012-09-27 Semco Engineering Sa Support de plaquettes de silicium et procédé de traitement de ces plaquettes
CN102760676B (zh) * 2012-05-18 2015-01-21 南京华伯仪器科技有限公司 一种硅片装卸篮装置
CN104391478B (zh) * 2014-09-18 2017-02-15 上海先进半导体制造股份有限公司 水平扩散炉的进舟系统及其马达电流的监控装置
CN108190345B (zh) * 2018-03-02 2024-06-18 三和盛电子科技(东莞)有限公司 一种用于smt料盘的自动存储设备
CN109531399B (zh) * 2018-11-13 2021-02-05 杭州中为光电技术有限公司 一种用于多晶硅块不同高度检测及抓取的方法及其组件
CN112678093B (zh) * 2020-12-29 2022-02-01 中北大学 一种车载运动平台及自动对接装置
CN113394145B (zh) * 2021-05-07 2022-08-19 拉普拉斯(无锡)半导体科技有限公司 一种硅片的导片系统
CN116666268B (zh) * 2023-05-18 2023-12-01 江苏亚电科技有限公司 一种槽内晶圆篮故障排除方法及装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4568234A (en) * 1983-05-23 1986-02-04 Asq Boats, Inc. Wafer transfer apparatus
US4728246A (en) * 1986-05-16 1988-03-01 Thermco Systems, Inc. Wafer boat transfer tool
US5030057A (en) * 1987-11-06 1991-07-09 Tel Sagami Limited Semiconductor wafer transferring method and apparatus and boat for thermal treatment of a semiconductor wafer
US5193969A (en) * 1991-05-20 1993-03-16 Fortrend Engineering Corporation Wafer transfer machine
US5527390A (en) * 1993-03-19 1996-06-18 Tokyo Electron Kabushiki Treatment system including a plurality of treatment apparatus
US5544421A (en) * 1994-04-28 1996-08-13 Semitool, Inc. Semiconductor wafer processing system
JP3654684B2 (ja) * 1995-05-01 2005-06-02 東京エレクトロン株式会社 処理方法及び処理装置
JP3576346B2 (ja) * 1996-03-25 2004-10-13 信越半導体株式会社 ウェーハ移載装置及び方法
US6203582B1 (en) * 1996-07-15 2001-03-20 Semitool, Inc. Modular semiconductor workpiece processing tool
US5820266A (en) * 1996-12-10 1998-10-13 Fedak; Tibor J. Travelling thermocouple method & apparatus

Also Published As

Publication number Publication date
WO2002093617A3 (fr) 2003-02-27
US20040191027A1 (en) 2004-09-30
JP2004531890A (ja) 2004-10-14
EP1388163A2 (fr) 2004-02-11
WO2002093617A2 (fr) 2002-11-21
KR20040012825A (ko) 2004-02-11
CN1524286A (zh) 2004-08-25
FR2824543B1 (fr) 2003-10-17
US7326021B2 (en) 2008-02-05
CN1295744C (zh) 2007-01-17
AU2002302725A1 (en) 2002-11-25
FR2824543A1 (fr) 2002-11-15

Similar Documents

Publication Publication Date Title
AU2002309506A1 (en) Semiconductor wafer lifting device and methods for implementing the same
AU2003253874A8 (en) Method and apparatus for supporting semiconductor wafers
SG121710A1 (en) Semiconductor device and fabrication method thereof
GB0216883D0 (en) A circuit including a semiconductor component and an operating method for the semiconductor component
IL137533A0 (en) Wafer carrier and semiconductor apparatus for processing a semiconductor substrate
EP1041612A4 (en) METHOD FOR THERMALLY TREATING A SILICON WAFER, AND SILICON WAFER
HK1096199A1 (zh) 用於裝載在電子裝置上的電池器件
SG106081A1 (en) Apparatus and method for testing semiconductor devices
HK1067787A1 (en) Device for loading and unloading silicon wafers inan oven from a multiplecassette station
EP1130634A4 (en) SEMICONDUCTOR DEVICE, METHOD FOR FORMING SILICON OXIDE LAYER, AND APPARATUS FOR FORMING SILICON OXIDE LAYER
EP1391921A4 (en) PROCESS FOR THE PREPARATION OF A NITROGEN-DOPED WAFER AND RECOVERY AND NITROGEN DOPED WAFER AND RECOVERY
HK1049066A1 (zh) 半導體封裝件和半導體封裝件的安裝方法
GB2392309B (en) Substrate loading and unloading apparatus
GB2381374B (en) Apparatus for manufacturing semiconductor device
GB0110088D0 (en) Semiconductor wafer handling method
GB2375883B (en) A method and apparatus for implanting semiconductor wafer substrates
EP1437763A4 (en) SEMICONDUCTOR MANUFACTURING DEVICE AND METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT
SG120053A1 (en) Apparatus for molding a semiconductor wafer and process therefor
EP1235258A4 (en) SUBSTRATE CLEANING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
GB2362757B (en) Method and apparatus for manufacturing semiconductor device
AU2002255557A1 (en) Lithography method for forming semiconductor devices on a wafer and apparatus
SG119154A1 (en) Apparatus and method for testing semiconductor devices
SG123541A1 (en) Handling device and method for loading and unloading work pieces from trays
EP1473841A4 (en) INTEGRATED SEMICONDUCTOR CIRCUIT FOR A RADIO DEVICE AND RADIO COMMUNICATION DEVICE
TW556957U (en) Semiconductor wafer and semiconductor device

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20110514