HK1060212A1 - Field emission device for creating a focused electron beam - Google Patents

Field emission device for creating a focused electron beam

Info

Publication number
HK1060212A1
HK1060212A1 HK04102998A HK04102998A HK1060212A1 HK 1060212 A1 HK1060212 A1 HK 1060212A1 HK 04102998 A HK04102998 A HK 04102998A HK 04102998 A HK04102998 A HK 04102998A HK 1060212 A1 HK1060212 A1 HK 1060212A1
Authority
HK
Hong Kong
Prior art keywords
creating
electron beam
field emission
emission device
focused electron
Prior art date
Application number
HK04102998A
Other languages
English (en)
Inventor
Paul J Benning
William R Knight
Michael J Regan
Original Assignee
Hewlett Packard Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hewlett Packard Co filed Critical Hewlett Packard Co
Publication of HK1060212A1 publication Critical patent/HK1060212A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
    • G11B9/10—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using electron beam; Record carriers therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
    • G11B9/12—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor
    • G11B9/14—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor using microscopic probe means, i.e. recording or reproducing by means directly associated with the tip of a microscopic electrical probe as used in Scanning Tunneling Microscopy [STM] or Atomic Force Microscopy [AFM] for inducing physical or electrical perturbations in a recording medium; Record carriers or media specially adapted for such transducing of information
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
    • G11B9/12—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor
    • G11B9/14—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor using microscopic probe means, i.e. recording or reproducing by means directly associated with the tip of a microscopic electrical probe as used in Scanning Tunneling Microscopy [STM] or Atomic Force Microscopy [AFM] for inducing physical or electrical perturbations in a recording medium; Record carriers or media specially adapted for such transducing of information
    • G11B9/1418—Disposition or mounting of heads or record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/23—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using electrostatic storage on a common layer, e.g. Forrester-Haeff tubes or William tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
    • H01J3/022—Electron guns using a field emission, photo emission, or secondary emission electron source with microengineered cathode, e.g. Spindt-type

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Plasma & Fusion (AREA)
  • Computer Hardware Design (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Cold Cathode And The Manufacture (AREA)
HK04102998A 2001-06-14 2004-04-28 Field emission device for creating a focused electron beam HK1060212A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/882,933 US6741016B2 (en) 2001-06-14 2001-06-14 Focusing lens for electron emitter with shield layer
PCT/US2002/018474 WO2002103740A2 (en) 2001-06-14 2002-06-10 Focusing lens for electron emitter

Publications (1)

Publication Number Publication Date
HK1060212A1 true HK1060212A1 (en) 2004-07-30

Family

ID=25381634

Family Applications (1)

Application Number Title Priority Date Filing Date
HK04102998A HK1060212A1 (en) 2001-06-14 2004-04-28 Field emission device for creating a focused electron beam

Country Status (10)

Country Link
US (1) US6741016B2 (ja)
EP (1) EP1396005B1 (ja)
JP (1) JP2004535657A (ja)
KR (1) KR20040012930A (ja)
CN (1) CN1515016A (ja)
AU (1) AU2002310391A1 (ja)
DE (1) DE60215161T2 (ja)
HK (1) HK1060212A1 (ja)
TW (1) TW563154B (ja)
WO (1) WO2002103740A2 (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7057353B2 (en) * 2003-01-13 2006-06-06 Hewlett-Packard Development Company, L.P. Electronic device with wide lens for small emission spot size
US20040147056A1 (en) * 2003-01-29 2004-07-29 Mckinnell James C. Micro-fabricated device and method of making
US20040213098A1 (en) * 2003-04-25 2004-10-28 Marshall Daniel R. Focus-detecting emitter for a data storage device
US20040213128A1 (en) * 2003-04-25 2004-10-28 Marshall Daniel R. Beam deflector for a data storage device
US6891185B2 (en) * 2003-06-24 2005-05-10 Hewlett-Packard Development Company, L.P. Electronic device with aperture and wide lens for small emission spot size
JP4322166B2 (ja) * 2003-09-19 2009-08-26 富士フイルム株式会社 固体撮像素子
KR100580645B1 (ko) * 2004-02-20 2006-05-16 삼성전자주식회사 이중 캐소드 전극을 가진 전계방출소자 및 전계방출표시소자
KR100707160B1 (ko) 2005-05-24 2007-04-13 삼성에스디아이 주식회사 전계방출소자
US7454221B1 (en) * 2005-07-12 2008-11-18 Hewlett-Packard Development Company, L.P. Electron tube amplification
DE102005040267B4 (de) * 2005-08-24 2007-12-27 Universität Karlsruhe Verfahren zum Herstellen einer mehrschichtigen elektrostatischen Linsenanordnung, insbesondere einer Phasenplatte und derartige Phasenplatte
US7402942B2 (en) * 2005-10-31 2008-07-22 Samsung Sdi Co., Ltd. Electron emission device and electron emission display using the same
US20070096621A1 (en) * 2005-10-31 2007-05-03 Sang-Ho Jeon Electron emission display
KR101111669B1 (ko) * 2008-12-22 2012-02-14 한국전자통신연구원 검출 장치
JP2012195096A (ja) * 2011-03-15 2012-10-11 Canon Inc 荷電粒子線レンズおよびそれを用いた露光装置
US9402138B2 (en) * 2012-10-12 2016-07-26 Infineon Technologies Ag MEMS device and method of manufacturing a MEMS device
EP3063780B1 (en) * 2013-10-29 2021-06-02 Varex Imaging Corporation X-ray tube having planar emitter with tunable emission characteristics and magnetic steering and focusing

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4760567A (en) 1986-08-11 1988-07-26 Electron Beam Memories Electron beam memory system with ultra-compact, high current density electron gun
EP0365630B1 (fr) 1988-03-25 1994-03-02 Thomson-Csf Procede de fabrication de sources d'electrons du type a emission de champ, et son application a la realisation de reseaux d'emetteurs
US4923421A (en) 1988-07-06 1990-05-08 Innovative Display Development Partners Method for providing polyimide spacers in a field emission panel display
US5191217A (en) * 1991-11-25 1993-03-02 Motorola, Inc. Method and apparatus for field emission device electrostatic electron beam focussing
US5223764A (en) * 1991-12-09 1993-06-29 Chunghwa Picture Tubes, Ltd. Electron gun with low voltage limiting aperture main lens
FR2690005B1 (fr) 1992-04-10 1994-05-20 Commissariat A Energie Atomique Canon a electrons compact comportant une source d'electrons a micropointes et laser a semi-conducteur utilisant ce canon pour le pompage electronique.
US5424605A (en) 1992-04-10 1995-06-13 Silicon Video Corporation Self supporting flat video display
JPH08507643A (ja) * 1993-03-11 1996-08-13 フェド．コーポレイション エミッタ先端構造体及び該エミッタ先端構造体を備える電界放出装置並びにその製造方法
US5528103A (en) 1994-01-31 1996-06-18 Silicon Video Corporation Field emitter with focusing ridges situated to sides of gate
US5557596A (en) * 1995-03-20 1996-09-17 Gibson; Gary Ultra-high density storage device
FR2737041A1 (fr) 1995-07-07 1997-01-24 Nec Corp Canon a electrons pourvu d'une cathode froide a emission de champ
JP2907113B2 (ja) 1996-05-08 1999-06-21 日本電気株式会社 電子ビーム装置
JP3171785B2 (ja) 1996-06-20 2001-06-04 富士通株式会社 薄型表示装置、及びそれに用いる電界放出陰極の製造方法
KR100279737B1 (ko) * 1997-12-19 2001-02-01 정선종 전계방출소자와 광소자로 구성된 단파장 광전소자 및 그의 제작방법
JP2000011859A (ja) 1998-06-22 2000-01-14 Yamaha Corp 電界放射型素子の製造方法
US6137213A (en) 1998-10-21 2000-10-24 Motorola, Inc. Field emission device having a vacuum bridge focusing structure and method
JP3293571B2 (ja) 1998-10-28 2002-06-17 日本電気株式会社 電界放出型冷陰極素子及びその駆動方法並びにそれらを用いた画像表示装置
US6137272A (en) 1999-11-03 2000-10-24 Motorola, Inc. Method of operating an AC-DC converter

Also Published As

Publication number Publication date
DE60215161D1 (de) 2006-11-16
US6741016B2 (en) 2004-05-25
TW563154B (en) 2003-11-21
DE60215161T2 (de) 2007-04-26
KR20040012930A (ko) 2004-02-11
WO2002103740A3 (en) 2003-08-14
WO2002103740A2 (en) 2002-12-27
US20020193036A1 (en) 2002-12-19
EP1396005A2 (en) 2004-03-10
JP2004535657A (ja) 2004-11-25
EP1396005B1 (en) 2006-10-04
CN1515016A (zh) 2004-07-21
AU2002310391A1 (en) 2003-01-02

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20100610