AU2001230639A1 - Emission electron microscope - Google Patents
Emission electron microscopeInfo
- Publication number
- AU2001230639A1 AU2001230639A1 AU2001230639A AU3063901A AU2001230639A1 AU 2001230639 A1 AU2001230639 A1 AU 2001230639A1 AU 2001230639 A AU2001230639 A AU 2001230639A AU 3063901 A AU3063901 A AU 3063901A AU 2001230639 A1 AU2001230639 A1 AU 2001230639A1
- Authority
- AU
- Australia
- Prior art keywords
- electron microscope
- emission electron
- emission
- microscope
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/285—Emission microscopes, e.g. field-emission microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/29—Reflection microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06383—Spin polarised electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24495—Signal processing, e.g. mixing of two or more signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/285—Emission microscopes
- H01J2237/2857—Particle bombardment induced emission
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PL338538 | 2000-02-20 | ||
PL00338538A PL338538A1 (en) | 2000-02-20 | 2000-02-20 | Emission-type electron microscope |
PCT/PL2001/000010 WO2001061725A1 (en) | 2000-02-20 | 2001-02-05 | Emission electron microscope |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001230639A1 true AU2001230639A1 (en) | 2001-08-27 |
Family
ID=20076088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001230639A Abandoned AU2001230639A1 (en) | 2000-02-20 | 2001-02-05 | Emission electron microscope |
Country Status (5)
Country | Link |
---|---|
US (1) | US6667477B2 (en) |
AU (1) | AU2001230639A1 (en) |
DE (2) | DE10190535B4 (en) |
PL (1) | PL338538A1 (en) |
WO (1) | WO2001061725A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10252129A1 (en) * | 2002-11-04 | 2004-05-27 | Omicron Nano Technology Gmbh | Image generating energy filter for electrically charged particles has transfer lens device between first/second energy analyzer output and input planes with negative lateral, angular magnification |
JPWO2005069346A1 (en) * | 2004-01-14 | 2007-09-06 | 株式会社ニコン | Mapping electron microscope, electron microscope, sample surface observation method, and microdevice manufacturing method |
PL368785A1 (en) * | 2004-06-28 | 2006-01-09 | Krzysztof Grzelakowski | Imaging energy filter for electrons and other electrically charged particles and method for filtering electron energy in electro-optical equipment using imaging filter |
GB2428868B (en) * | 2005-10-28 | 2008-11-19 | Thermo Electron Corp | Spectrometer for surface analysis and method therefor |
WO2019063529A1 (en) * | 2017-09-28 | 2019-04-04 | Asml Netherlands B.V. | Optical system with compensation lens |
CN110993473A (en) * | 2019-11-29 | 2020-04-10 | 河南河大科技发展有限公司 | Device for inverting high-voltage electron gun system of transmission electron microscope |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1047333B (en) * | 1955-03-28 | 1958-12-24 | Leitz Ernst Gmbh | Method and device for the electron microscopic imaging of electrical potential fields and / or surfaces |
NL7105978A (en) * | 1971-04-30 | 1972-11-01 | ||
US4096386A (en) * | 1977-04-04 | 1978-06-20 | Taylor-Kincaid Company | Light reflecting electrostatic electron lens |
DE2842527C3 (en) * | 1978-09-29 | 1981-12-17 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen | Electrostatic emission lens |
US4564758A (en) * | 1984-02-01 | 1986-01-14 | Cameca | Process and device for the ionic analysis of an insulating sample |
JPH0754684B2 (en) * | 1987-08-28 | 1995-06-07 | 株式会社日立製作所 | electronic microscope |
DE3904032A1 (en) * | 1989-02-10 | 1990-08-16 | Max Planck Gesellschaft | ELECTRONIC MICROSCOPE FOR THE STUDY OF SOLID CARBON SURFACES |
DE3943211C2 (en) * | 1989-12-28 | 1995-02-02 | Max Planck Gesellschaft | Imaging electron optical device |
DE19543652C1 (en) * | 1995-11-23 | 1997-01-09 | Focus Gmbh | Reflection electron microscope |
US6011262A (en) * | 1997-03-26 | 2000-01-04 | Nikon Corporation | Object observing apparatus and method for adjusting the same |
AU8746998A (en) * | 1997-08-19 | 1999-03-08 | Nikon Corporation | Object observation device and object observation method |
US5973323A (en) * | 1997-11-05 | 1999-10-26 | Kla-Tencor Corporation | Apparatus and method for secondary electron emission microscope |
JP3403036B2 (en) * | 1997-11-14 | 2003-05-06 | 株式会社東芝 | Electron beam inspection method and apparatus |
JP3724949B2 (en) * | 1998-05-15 | 2005-12-07 | 株式会社東芝 | Substrate inspection apparatus, substrate inspection system including the same, and substrate inspection method |
WO2000036630A1 (en) * | 1998-12-17 | 2000-06-22 | Philips Electron Optics B.V. | Particle-optical apparatus involving detection of auger electrons |
-
2000
- 2000-02-20 PL PL00338538A patent/PL338538A1/en unknown
-
2001
- 2001-02-05 AU AU2001230639A patent/AU2001230639A1/en not_active Abandoned
- 2001-02-05 DE DE10190535T patent/DE10190535B4/en not_active Expired - Fee Related
- 2001-02-05 US US10/204,643 patent/US6667477B2/en not_active Expired - Fee Related
- 2001-02-05 WO PCT/PL2001/000010 patent/WO2001061725A1/en active Application Filing
- 2001-02-05 DE DE10164895A patent/DE10164895B4/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE10190535D2 (en) | 2003-02-20 |
DE10164895B4 (en) | 2007-10-04 |
DE10190535B4 (en) | 2007-09-20 |
PL338538A1 (en) | 2001-08-27 |
WO2001061725B1 (en) | 2001-11-22 |
US20030010915A1 (en) | 2003-01-16 |
WO2001061725A1 (en) | 2001-08-23 |
US6667477B2 (en) | 2003-12-23 |
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