AU2001252770A1 - Electron-beam lithography - Google Patents
Electron-beam lithographyInfo
- Publication number
- AU2001252770A1 AU2001252770A1 AU2001252770A AU5277001A AU2001252770A1 AU 2001252770 A1 AU2001252770 A1 AU 2001252770A1 AU 2001252770 A AU2001252770 A AU 2001252770A AU 5277001 A AU5277001 A AU 5277001A AU 2001252770 A1 AU2001252770 A1 AU 2001252770A1
- Authority
- AU
- Australia
- Prior art keywords
- electron
- beam lithography
- lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1015155A NL1015155C2 (en) | 2000-05-11 | 2000-05-11 | Electron beam lithography. |
NL1015155 | 2000-05-11 | ||
PCT/NL2001/000328 WO2001086649A1 (en) | 2000-05-11 | 2001-05-01 | Electron-beam lithography |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001252770A1 true AU2001252770A1 (en) | 2001-11-20 |
Family
ID=19771350
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001252770A Abandoned AU2001252770A1 (en) | 2000-05-11 | 2001-05-01 | Electron-beam lithography |
Country Status (6)
Country | Link |
---|---|
US (1) | US6835943B2 (en) |
EP (1) | EP1290685A1 (en) |
KR (1) | KR20030025226A (en) |
AU (1) | AU2001252770A1 (en) |
NL (1) | NL1015155C2 (en) |
WO (1) | WO2001086649A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004005872A (en) * | 2002-04-09 | 2004-01-08 | Matsushita Electric Ind Co Ltd | Master optical disk manufacturing method, optical disk and its manufacturing method |
US6915374B2 (en) * | 2003-02-19 | 2005-07-05 | Dell Products L.P. | Method and system for setting optical drive write strategies |
JP5226943B2 (en) * | 2006-08-31 | 2013-07-03 | 株式会社リコー | Drawing method, drawing apparatus, and information recording medium |
US8361699B2 (en) * | 2008-02-05 | 2013-01-29 | Nil Technology Aps | Method for performing electron beam lithography |
KR101769493B1 (en) * | 2011-12-23 | 2017-08-30 | 주식회사 원익아이피에스 | Substrate processing apparatus and substrate processing system |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6034754B2 (en) * | 1976-02-18 | 1985-08-10 | 松下電器産業株式会社 | hologram recording device |
JPS5472980A (en) * | 1977-11-24 | 1979-06-11 | Hitachi Ltd | Electron-beam drawing unit |
US5216219A (en) * | 1991-05-10 | 1993-06-01 | Pioneer Electronic Corporation | Disk manufacturing apparatus |
EP0660314B1 (en) * | 1993-12-24 | 2000-12-27 | Koninklijke Philips Electronics N.V. | Method of manufacturing an optical information carrier, arrangement for carrying out the method, and optical information carrier obtained by means of the method |
US5561008A (en) * | 1995-01-27 | 1996-10-01 | Lucent Technologies Inc. | Process for device fabrication using projection lithography and an apparatus therefor |
US5942760A (en) * | 1997-11-03 | 1999-08-24 | Motorola Inc. | Method of forming a semiconductor device utilizing scalpel mask, and mask therefor |
JPH11288532A (en) * | 1998-03-31 | 1999-10-19 | Sony Corp | Exposure device, exposure method and recording medium |
JP4196425B2 (en) * | 1998-03-31 | 2008-12-17 | ソニー株式会社 | Disc master production device |
US6051346A (en) * | 1998-04-29 | 2000-04-18 | Lucent Technologies Inc. | Process for fabricating a lithographic mask |
-
2000
- 2000-05-11 NL NL1015155A patent/NL1015155C2/en not_active IP Right Cessation
-
2001
- 2001-05-01 AU AU2001252770A patent/AU2001252770A1/en not_active Abandoned
- 2001-05-01 KR KR1020027015137A patent/KR20030025226A/en not_active Application Discontinuation
- 2001-05-01 EP EP01926238A patent/EP1290685A1/en not_active Withdrawn
- 2001-05-01 WO PCT/NL2001/000328 patent/WO2001086649A1/en not_active Application Discontinuation
- 2001-05-01 US US10/275,649 patent/US6835943B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6835943B2 (en) | 2004-12-28 |
EP1290685A1 (en) | 2003-03-12 |
US20030155532A1 (en) | 2003-08-21 |
NL1015155C2 (en) | 2001-11-13 |
KR20030025226A (en) | 2003-03-28 |
WO2001086649A1 (en) | 2001-11-15 |
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