HK1046165A1 - Apparatus and method for correcting sensor drift - Google Patents
Apparatus and method for correcting sensor driftInfo
- Publication number
- HK1046165A1 HK1046165A1 HK02107681A HK02107681A HK1046165A1 HK 1046165 A1 HK1046165 A1 HK 1046165A1 HK 02107681 A HK02107681 A HK 02107681A HK 02107681 A HK02107681 A HK 02107681A HK 1046165 A1 HK1046165 A1 HK 1046165A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- sensor
- zero pressure
- sensor drift
- nominal zero
- calibration
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D3/00—Indicating or recording apparatus with provision for the special purposes referred to in the subgroups
- G01D3/028—Indicating or recording apparatus with provision for the special purposes referred to in the subgroups mitigating undesired influences, e.g. temperature, pressure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L27/00—Testing or calibrating of apparatus for measuring fluid pressure
- G01L27/002—Calibrating, i.e. establishing true relation between transducer output value and value to be measured, zeroing, linearising or span error determination
- G01L27/005—Apparatus for calibrating pressure sensors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D18/00—Testing or calibrating apparatus or arrangements provided for in groups G01D1/00 - G01D15/00
- G01D18/008—Testing or calibrating apparatus or arrangements provided for in groups G01D1/00 - G01D15/00 with calibration coefficients stored in memory
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D3/00—Indicating or recording apparatus with provision for the special purposes referred to in the subgroups
- G01D3/02—Indicating or recording apparatus with provision for the special purposes referred to in the subgroups with provision for altering or correcting the law of variation
- G01D3/022—Indicating or recording apparatus with provision for the special purposes referred to in the subgroups with provision for altering or correcting the law of variation having an ideal characteristic, map or correction data stored in a digital memory
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/02—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning
- G01L9/06—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning of piezo-resistive devices
- G01L9/065—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning of piezo-resistive devices with temperature compensating means
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/257,874 US6237394B1 (en) | 1999-02-25 | 1999-02-25 | Apparatus and method for correcting drift in a sensor |
PCT/US2000/003857 WO2000050848A1 (en) | 1999-02-25 | 2000-02-15 | Apparatus and method for correcting sensor drift |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1046165A1 true HK1046165A1 (en) | 2002-12-27 |
Family
ID=22978149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK02107681A HK1046165A1 (en) | 1999-02-25 | 2002-10-23 | Apparatus and method for correcting sensor drift |
Country Status (9)
Country | Link |
---|---|
US (1) | US6237394B1 (xx) |
EP (1) | EP1163492B1 (xx) |
JP (1) | JP4898984B2 (xx) |
KR (1) | KR20020000768A (xx) |
CN (1) | CN1243954C (xx) |
AT (1) | ATE409847T1 (xx) |
DE (1) | DE60040385D1 (xx) |
HK (1) | HK1046165A1 (xx) |
WO (1) | WO2000050848A1 (xx) |
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US6450005B1 (en) * | 2000-12-21 | 2002-09-17 | Honeywell International Inc. | Method and apparatus for the calibration and compensation of sensors |
US6884296B2 (en) * | 2002-08-23 | 2005-04-26 | Micron Technology, Inc. | Reactors having gas distributors and methods for depositing materials onto micro-device workpieces |
US20040040503A1 (en) * | 2002-08-29 | 2004-03-04 | Micron Technology, Inc. | Micromachines for delivering precursors and gases for film deposition |
US20040040502A1 (en) * | 2002-08-29 | 2004-03-04 | Micron Technology, Inc. | Micromachines for delivering precursors and gases for film deposition |
JP4244652B2 (ja) * | 2003-02-13 | 2009-03-25 | 株式会社デンソー | 内燃機関の排気浄化装置 |
JP4454964B2 (ja) * | 2003-06-09 | 2010-04-21 | 東京エレクトロン株式会社 | 分圧制御システム及び流量制御システム |
JP3863505B2 (ja) | 2003-06-20 | 2006-12-27 | 忠弘 大見 | 圧力センサ及び圧力制御装置並びに圧力式流量制御装置の自動零点補正装置 |
US7282239B2 (en) * | 2003-09-18 | 2007-10-16 | Micron Technology, Inc. | Systems and methods for depositing material onto microfeature workpieces in reaction chambers |
US7202696B1 (en) | 2003-09-26 | 2007-04-10 | Cypress Semiconductor Corporation | Circuit for temperature and beta compensation |
US6935156B2 (en) * | 2003-09-30 | 2005-08-30 | Rosemount Inc. | Characterization of process pressure sensor |
US7647886B2 (en) * | 2003-10-15 | 2010-01-19 | Micron Technology, Inc. | Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers |
DE10351313A1 (de) * | 2003-10-31 | 2005-05-25 | Abb Patent Gmbh | Verfahren zur Nullpunktkorrektur eines Messgerätes |
US7258892B2 (en) | 2003-12-10 | 2007-08-21 | Micron Technology, Inc. | Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition |
DE10357856B4 (de) * | 2003-12-11 | 2008-01-03 | Sartorius Ag | Messvorrichtung |
US7906393B2 (en) | 2004-01-28 | 2011-03-15 | Micron Technology, Inc. | Methods for forming small-scale capacitor structures |
AU2005233983B2 (en) * | 2004-04-06 | 2011-02-17 | Tyco Valves & Control, Inc. | Field replaceable sensor module and methods of use thereof |
US8133554B2 (en) | 2004-05-06 | 2012-03-13 | Micron Technology, Inc. | Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces |
US7699932B2 (en) | 2004-06-02 | 2010-04-20 | Micron Technology, Inc. | Reactors, systems and methods for depositing thin films onto microfeature workpieces |
CN100374075C (zh) * | 2004-09-22 | 2008-03-12 | 合世生医科技股份有限公司 | 电子血压机自动校正方法及其装置 |
WO2006108056A1 (en) * | 2005-04-05 | 2006-10-12 | The Product Group, Llc | Intelligent controller for refrigerating and air conditioning systems |
US20060237138A1 (en) * | 2005-04-26 | 2006-10-26 | Micron Technology, Inc. | Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes |
CN101365374B (zh) | 2005-08-31 | 2011-11-16 | 弗吉尼亚大学专利基金委员会 | 改善连续式葡萄糖传感器的准确度 |
US7653425B2 (en) | 2006-08-09 | 2010-01-26 | Abbott Diabetes Care Inc. | Method and system for providing calibration of an analyte sensor in an analyte monitoring system |
US9119582B2 (en) | 2006-06-30 | 2015-09-01 | Abbott Diabetes Care, Inc. | Integrated analyte sensor and infusion device and methods therefor |
FR2927700B1 (fr) * | 2008-02-18 | 2010-05-14 | Continental Automotive France | Procede d'etalonnage d'un capteur de mesure |
GB2457660A (en) * | 2008-02-19 | 2009-08-26 | Sphere Medical Ltd | Methods of calibrating a sensor in a patient monitoring system |
CN101859109B (zh) * | 2009-04-09 | 2012-05-30 | 上海富辉精密电子有限公司 | 含有压力传感器的设备的控制方法 |
CN102087123B (zh) * | 2009-12-04 | 2013-05-29 | 财团法人工业技术研究院 | 电容式感测组件的校正装置与方法 |
CN102062209B (zh) * | 2010-11-15 | 2014-01-22 | 奇瑞汽车股份有限公司 | 一种用于消除传感器漂移的自适应控制方法及装置 |
CN103257017B (zh) * | 2011-12-29 | 2015-04-29 | 中国燃气涡轮研究院 | 一种传感器温度漂移补偿方法 |
WO2014052136A1 (en) | 2012-09-26 | 2014-04-03 | Abbott Diabetes Care Inc. | Method and apparatus for improving lag correction during in vivo measurement of analyte concentration with analyte concentration variability and range data |
US9804050B2 (en) * | 2013-03-14 | 2017-10-31 | Kulite Semiconductor Products, Inc. | Systems and methods for sensor drift compensation |
CN105723463B (zh) * | 2013-11-13 | 2018-05-04 | 弗兰克公司 | 用于使校准测试流线化的配置文件 |
US9817780B2 (en) | 2013-11-13 | 2017-11-14 | Fluke Corporation | Communicator with profiles |
US9689770B2 (en) * | 2014-07-17 | 2017-06-27 | Infineon Technologies Ag | Selfcalibration of capacitive pressure sensors with electrostatic forces |
CN104296923B (zh) * | 2014-09-22 | 2017-01-25 | 广东合微集成电路技术有限公司 | 一种晶圆级传感器的测试方法 |
US10598624B2 (en) | 2014-10-23 | 2020-03-24 | Abbott Diabetes Care Inc. | Electrodes having at least one sensing structure and methods for making and using the same |
DE102015001500A1 (de) * | 2015-02-05 | 2016-08-11 | Hella Kgaa Hueck & Co. | Verfahren zur Kalibration mindestens eines Sensors, insbesondere eines Drucksensors, mit mindestens einer signalleitenden Verbindung zu mindestens einem Signalwandler |
CN107543654B (zh) * | 2016-06-27 | 2020-02-11 | 北京北方华创微电子装备有限公司 | 获取压力规的误差值的方法和装置、压力控制方法和系统 |
JP6748000B2 (ja) * | 2017-02-08 | 2020-08-26 | アズビル株式会社 | 圧力センサ |
FI128841B (en) * | 2018-03-22 | 2021-01-15 | Univ Helsinki | Sensor calibration |
EP3640600B1 (en) | 2018-10-16 | 2023-03-29 | Infineon Technologies AG | Device and method for self-correcting a sensed physical parameter in a drone or unmanned aerial vehicle |
CN109738116B (zh) * | 2018-12-20 | 2023-09-22 | 苏州能斯达电子科技有限公司 | 一种柔性压力传感器的校准方法和装置 |
CA3153895A1 (en) * | 2019-10-22 | 2021-04-29 | Benjamin S. Rogers | Methods of operating and calibrating a gas sensor, and related gas sensors |
CN114136537A (zh) * | 2021-11-04 | 2022-03-04 | 歌尔微电子股份有限公司 | 压力传感器 |
CN116481713B (zh) * | 2023-06-21 | 2023-09-08 | 新光维医疗科技(苏州)股份有限公司 | 气体输送系统中压力检测电路的校准方法、系统及介质 |
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NL7507567A (nl) * | 1975-06-25 | 1976-12-28 | Goudsche Machinefabriek Bv | Sondeerinrichting voor bodemonderzoek. |
US4051712A (en) * | 1976-08-20 | 1977-10-04 | National Semiconductor Corporation | Pressure transducer auto reference |
IL55622A0 (en) * | 1978-09-22 | 1978-12-17 | Drori Mordeki | Backflushing fluid filter |
GB2034992B (en) * | 1978-11-17 | 1983-09-01 | Burr Brown Res Corp | Analogue-to-digital converter |
DE3143061C2 (de) * | 1981-10-30 | 1986-07-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München | Verfahren zur individuellen Bemessung der Länge der Zugstange und des Segmenthebels eines Überdruckmeßgerätes |
JPS6072529A (ja) * | 1983-09-28 | 1985-04-24 | 住友ベークライト株式会社 | 生体内圧力・温度測定器 |
JP2579143B2 (ja) * | 1984-02-02 | 1997-02-05 | ハネウエル・インコーポレーテッド | プロセス変数センサのディジタル補正の方法およびそのためのプロセス変数発信器 |
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-
1999
- 1999-02-25 US US09/257,874 patent/US6237394B1/en not_active Expired - Lifetime
-
2000
- 2000-02-15 JP JP2000601399A patent/JP4898984B2/ja not_active Expired - Fee Related
- 2000-02-15 EP EP00910193A patent/EP1163492B1/en not_active Expired - Lifetime
- 2000-02-15 KR KR1020017010715A patent/KR20020000768A/ko not_active Application Discontinuation
- 2000-02-15 AT AT00910193T patent/ATE409847T1/de not_active IP Right Cessation
- 2000-02-15 DE DE60040385T patent/DE60040385D1/de not_active Expired - Lifetime
- 2000-02-15 WO PCT/US2000/003857 patent/WO2000050848A1/en not_active Application Discontinuation
- 2000-02-15 CN CNB008067228A patent/CN1243954C/zh not_active Expired - Lifetime
-
2002
- 2002-10-23 HK HK02107681A patent/HK1046165A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1163492B1 (en) | 2008-10-01 |
US6237394B1 (en) | 2001-05-29 |
JP4898984B2 (ja) | 2012-03-21 |
CN1243954C (zh) | 2006-03-01 |
DE60040385D1 (de) | 2008-11-13 |
EP1163492A4 (en) | 2004-09-22 |
EP1163492A1 (en) | 2001-12-19 |
KR20020000768A (ko) | 2002-01-05 |
JP2002538419A (ja) | 2002-11-12 |
CN1348541A (zh) | 2002-05-08 |
WO2000050848A1 (en) | 2000-08-31 |
ATE409847T1 (de) | 2008-10-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PE | Patent expired |
Effective date: 20200214 |