HK1038837A1 - Surface acoustic wave device - Google Patents
Surface acoustic wave deviceInfo
- Publication number
- HK1038837A1 HK1038837A1 HK01109169A HK01109169A HK1038837A1 HK 1038837 A1 HK1038837 A1 HK 1038837A1 HK 01109169 A HK01109169 A HK 01109169A HK 01109169 A HK01109169 A HK 01109169A HK 1038837 A1 HK1038837 A1 HK 1038837A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- acoustic wave
- surface acoustic
- wave device
- wave
- acoustic
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02559—Characteristics of substrate, e.g. cutting angles of lithium niobate or lithium-tantalate substrates
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15279599 | 1999-05-31 | ||
PCT/JP1999/005608 WO2000074235A1 (fr) | 1999-05-31 | 1999-10-12 | Dispositif a ondes acoustiques de surface |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1038837A1 true HK1038837A1 (en) | 2002-03-28 |
Family
ID=15548324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK01109169A HK1038837A1 (en) | 1999-05-31 | 2001-12-28 | Surface acoustic wave device |
Country Status (7)
Country | Link |
---|---|
US (1) | US6407486B1 (fr) |
EP (1) | EP1111779B1 (fr) |
JP (1) | JP3387060B2 (fr) |
CN (1) | CN1109402C (fr) |
DE (1) | DE69905734T2 (fr) |
HK (1) | HK1038837A1 (fr) |
WO (1) | WO2000074235A1 (fr) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3735550B2 (ja) * | 2001-09-21 | 2006-01-18 | Tdk株式会社 | 弾性表面波装置およびその製造方法 |
TWI282660B (en) | 2001-12-27 | 2007-06-11 | Murata Manufacturing Co | Surface acoustic wave device and manufacturing method therefor |
JP2004165879A (ja) * | 2002-11-12 | 2004-06-10 | Alps Electric Co Ltd | 弾性表面波素子 |
TWI232991B (en) * | 2002-11-15 | 2005-05-21 | Nec Lcd Technologies Ltd | Method for manufacturing an LCD device |
JP3646116B2 (ja) | 2003-07-17 | 2005-05-11 | Tdk株式会社 | 表面弾性波素子、表面弾性波装置、表面弾性波デュプレクサ、及び表面弾性波素子の製造方法 |
JP3764450B2 (ja) | 2003-07-28 | 2006-04-05 | Tdk株式会社 | 表面弾性波素子、表面弾性波装置、表面弾性波デュプレクサ、及び表面弾性波素子の製造方法 |
US7795788B2 (en) | 2004-10-26 | 2010-09-14 | Kyocera Corporation | Surface acoustic wave element and communication device |
JP4809042B2 (ja) * | 2005-11-10 | 2011-11-02 | 日本電波工業株式会社 | 弾性表面波素子及びその製造方法 |
JP3961012B1 (ja) * | 2006-03-22 | 2007-08-15 | Tdk株式会社 | 弾性表面波装置 |
US8143681B2 (en) * | 2006-04-20 | 2012-03-27 | The George Washington University | Saw devices, processes for making them, and methods of use |
US20100007444A1 (en) * | 2006-04-20 | 2010-01-14 | Anis Nurashikin Nordin | GHz Surface Acoustic Resonators in RF-CMOS |
US7728697B2 (en) * | 2006-09-26 | 2010-06-01 | Mg Materials Corporation | Systems and methods for electrically reducing ferroelectric materials to increase bulk conductivity |
US20090124513A1 (en) * | 2007-04-20 | 2009-05-14 | Patricia Berg | Multiplex Biosensor |
CA2967107C (fr) | 2009-02-27 | 2020-04-21 | Heiner Ophardt | Distributeur manuel de liquide avec generateur d'electricite |
DE102009056663B4 (de) | 2009-12-02 | 2022-08-11 | Tdk Electronics Ag | Metallisierung mit hoher Leistungsverträglichkeit und hoher elektrischer Leitfähigkeit und Verfahren zur Herstellung |
JP5341006B2 (ja) * | 2010-03-30 | 2013-11-13 | 新科實業有限公司 | 弾性表面波装置 |
US8960004B2 (en) | 2010-09-29 | 2015-02-24 | The George Washington University | Synchronous one-pole surface acoustic wave resonator |
CA2776684C (fr) | 2012-05-11 | 2019-07-23 | Gotohti.Com Inc. | Distributeur de mousse ozonee |
US9050775B2 (en) * | 2012-10-12 | 2015-06-09 | Nano And Advanced Materials Institute Limited | Methods of fabricating transparent and nanomaterial-based conductive film |
CN106596604B (zh) * | 2016-11-29 | 2019-05-21 | 国网辽宁省电力有限公司沈阳供电公司 | 一种反射电子衍射技术对高压电缆的无损检测装置 |
CN106603035A (zh) * | 2016-12-23 | 2017-04-26 | 北京中科飞鸿科技有限公司 | 一种提高声表面波滤波器耐受功率的方法 |
JP6986376B2 (ja) * | 2017-06-27 | 2021-12-22 | NDK SAW devices株式会社 | 弾性表面波素子およびその製造方法 |
JP2020092321A (ja) * | 2018-12-05 | 2020-06-11 | 太陽誘電株式会社 | 弾性波デバイスおよびその製造方法、フィルタ並びにマルチプレクサ |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57159113A (en) * | 1981-03-27 | 1982-10-01 | Toshiba Corp | Surface acoustic wave resonator |
JPS5955615A (ja) * | 1982-09-24 | 1984-03-30 | Hitachi Ltd | 弾性表面波装置およびその製造方法 |
JPS62168411A (ja) * | 1986-01-20 | 1987-07-24 | Victor Co Of Japan Ltd | 弾性表面波共振子 |
JP2545983B2 (ja) * | 1989-04-14 | 1996-10-23 | 株式会社村田製作所 | 弾性表面波装置 |
US5162690A (en) | 1989-04-14 | 1992-11-10 | Murata Manufacturing Co., Ltd. | Surface acoustic wave device |
JPH0314305A (ja) | 1989-06-13 | 1991-01-23 | Murata Mfg Co Ltd | 弾性表面波装置の製造方法 |
JP2937613B2 (ja) | 1991-07-16 | 1999-08-23 | 日本電気株式会社 | 薄膜配線およびその製造方法 |
JPH05199062A (ja) * | 1991-09-24 | 1993-08-06 | Seiko Epson Corp | 弾性表面波素子とその製造方法および弾性表面波素子用基板 |
JPH05183373A (ja) * | 1991-12-30 | 1993-07-23 | Murata Mfg Co Ltd | 弾性表面波素子の電極材料 |
JP3033331B2 (ja) | 1992-02-10 | 2000-04-17 | 日本電気株式会社 | 薄膜配線の製造方法 |
JP2818535B2 (ja) * | 1993-11-11 | 1998-10-30 | 日本電気株式会社 | 弾性表面波装置 |
JP3208977B2 (ja) | 1993-12-02 | 2001-09-17 | 株式会社村田製作所 | 弾性表面波素子の電極形成方法 |
JP3438360B2 (ja) | 1994-11-14 | 2003-08-18 | 株式会社村田製作所 | 弾性表面波素子の電極形成方法 |
JPH08154030A (ja) * | 1994-11-25 | 1996-06-11 | Murata Mfg Co Ltd | 弾性表面波素子 |
JP2888158B2 (ja) * | 1995-01-18 | 1999-05-10 | 日本電気株式会社 | 弾性表面波装置の製造方法 |
JPH08340233A (ja) | 1995-06-13 | 1996-12-24 | Nec Corp | 弾性表面波装置 |
CN1110132C (zh) | 1995-09-21 | 2003-05-28 | Tdk株式会社 | 弹性表面波器件及其制造方法 |
JPH09167936A (ja) * | 1995-10-13 | 1997-06-24 | Fujitsu Ltd | 弾性表面波装置 |
DE19641662B4 (de) * | 1995-10-13 | 2004-07-01 | Fujitsu Ltd., Kawasaki | Oberflächenakustikwellenvorrichtung mit einem optimierten Schnittwinkel eines piezoelektrischen Substrats |
JPH09199969A (ja) * | 1996-01-19 | 1997-07-31 | Murata Mfg Co Ltd | 薄膜体 |
CN1205744C (zh) * | 1997-09-22 | 2005-06-08 | Tdk株式会社 | 声表面波器件及其制造工艺 |
US6259185B1 (en) * | 1998-12-02 | 2001-07-10 | Cts Corporation | Metallization for high power handling in a surface acoustic wave device and method for providing same |
-
1999
- 1999-10-12 CN CN99806810A patent/CN1109402C/zh not_active Expired - Fee Related
- 1999-10-12 JP JP2000601280A patent/JP3387060B2/ja not_active Expired - Fee Related
- 1999-10-12 DE DE69905734T patent/DE69905734T2/de not_active Expired - Fee Related
- 1999-10-12 EP EP99973837A patent/EP1111779B1/fr not_active Expired - Lifetime
- 1999-10-12 WO PCT/JP1999/005608 patent/WO2000074235A1/fr active IP Right Grant
-
2000
- 2000-10-26 US US09/696,281 patent/US6407486B1/en not_active Expired - Lifetime
-
2001
- 2001-12-28 HK HK01109169A patent/HK1038837A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1111779A1 (fr) | 2001-06-27 |
WO2000074235A1 (fr) | 2000-12-07 |
JP3387060B2 (ja) | 2003-03-17 |
CN1303538A (zh) | 2001-07-11 |
US6407486B1 (en) | 2002-06-18 |
EP1111779A4 (fr) | 2002-01-02 |
DE69905734D1 (de) | 2003-04-10 |
CN1109402C (zh) | 2003-05-21 |
DE69905734T2 (de) | 2003-07-10 |
EP1111779B1 (fr) | 2003-03-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PF | Patent in force | ||
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20091012 |