DE69905734D1 - Oberflächenwellenanordnung - Google Patents

Oberflächenwellenanordnung

Info

Publication number
DE69905734D1
DE69905734D1 DE69905734T DE69905734T DE69905734D1 DE 69905734 D1 DE69905734 D1 DE 69905734D1 DE 69905734 T DE69905734 T DE 69905734T DE 69905734 T DE69905734 T DE 69905734T DE 69905734 D1 DE69905734 D1 DE 69905734D1
Authority
DE
Germany
Prior art keywords
surface wave
wave arrangement
arrangement
wave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69905734T
Other languages
English (en)
Other versions
DE69905734T2 (de
Inventor
Noritoshi Kimura
Masahiro Nakano
Katsuo Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Application granted granted Critical
Publication of DE69905734D1 publication Critical patent/DE69905734D1/de
Publication of DE69905734T2 publication Critical patent/DE69905734T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02543—Characteristics of substrate, e.g. cutting angles
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02543—Characteristics of substrate, e.g. cutting angles
    • H03H9/02559—Characteristics of substrate, e.g. cutting angles of lithium niobate or lithium-tantalate substrates
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/125—Driving means, e.g. electrodes, coils
    • H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
DE69905734T 1999-05-31 1999-10-12 Oberflächenwellenanordnung Expired - Fee Related DE69905734T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP15279599 1999-05-31
PCT/JP1999/005608 WO2000074235A1 (fr) 1999-05-31 1999-10-12 Dispositif a ondes acoustiques de surface

Publications (2)

Publication Number Publication Date
DE69905734D1 true DE69905734D1 (de) 2003-04-10
DE69905734T2 DE69905734T2 (de) 2003-07-10

Family

ID=15548324

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69905734T Expired - Fee Related DE69905734T2 (de) 1999-05-31 1999-10-12 Oberflächenwellenanordnung

Country Status (7)

Country Link
US (1) US6407486B1 (de)
EP (1) EP1111779B1 (de)
JP (1) JP3387060B2 (de)
CN (1) CN1109402C (de)
DE (1) DE69905734T2 (de)
HK (1) HK1038837A1 (de)
WO (1) WO2000074235A1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3735550B2 (ja) 2001-09-21 2006-01-18 Ｔｄｋ株式会社 弾性表面波装置およびその製造方法
TWI282660B (en) 2001-12-27 2007-06-11 Murata Manufacturing Co Surface acoustic wave device and manufacturing method therefor
JP2004165879A (ja) * 2002-11-12 2004-06-10 Alps Electric Co Ltd 弾性表面波素子
TWI232991B (en) * 2002-11-15 2005-05-21 Nec Lcd Technologies Ltd Method for manufacturing an LCD device
JP3646116B2 (ja) 2003-07-17 2005-05-11 Ｔｄｋ株式会社 表面弾性波素子、表面弾性波装置、表面弾性波デュプレクサ、及び表面弾性波素子の製造方法
JP3764450B2 (ja) 2003-07-28 2006-04-05 Ｔｄｋ株式会社 表面弾性波素子、表面弾性波装置、表面弾性波デュプレクサ、及び表面弾性波素子の製造方法
US7795788B2 (en) 2004-10-26 2010-09-14 Kyocera Corporation Surface acoustic wave element and communication device
JP4809042B2 (ja) 2005-11-10 2011-11-02 日本電波工業株式会社 弾性表面波素子及びその製造方法
JP3961012B1 (ja) * 2006-03-22 2007-08-15 Ｔｄｋ株式会社 弾性表面波装置
US8143681B2 (en) * 2006-04-20 2012-03-27 The George Washington University Saw devices, processes for making them, and methods of use
US20100007444A1 (en) * 2006-04-20 2010-01-14 Anis Nurashikin Nordin GHz Surface Acoustic Resonators in RF-CMOS
US7728697B2 (en) * 2006-09-26 2010-06-01 Mg Materials Corporation Systems and methods for electrically reducing ferroelectric materials to increase bulk conductivity
US20090124513A1 (en) * 2007-04-20 2009-05-14 Patricia Berg Multiplex Biosensor
CA2694569C (en) 2009-02-27 2017-07-25 Gotohti.Com Inc. Manual fluid dispenser with electrical generator
DE102009056663B4 (de) 2009-12-02 2022-08-11 Tdk Electronics Ag Metallisierung mit hoher Leistungsverträglichkeit und hoher elektrischer Leitfähigkeit und Verfahren zur Herstellung
JP5341006B2 (ja) * 2010-03-30 2013-11-13 新科實業有限公司 弾性表面波装置
US8960004B2 (en) 2010-09-29 2015-02-24 The George Washington University Synchronous one-pole surface acoustic wave resonator
CA2776684C (en) 2012-05-11 2019-07-23 Gotohti.Com Inc. Ozone foam dispenser
US9050775B2 (en) * 2012-10-12 2015-06-09 Nano And Advanced Materials Institute Limited Methods of fabricating transparent and nanomaterial-based conductive film
CN106596604B (zh) * 2016-11-29 2019-05-21 国网辽宁省电力有限公司沈阳供电公司 一种反射电子衍射技术对高压电缆的无损检测装置
CN106603035A (zh) * 2016-12-23 2017-04-26 北京中科飞鸿科技有限公司 一种提高声表面波滤波器耐受功率的方法
JP6986376B2 (ja) * 2017-06-27 2021-12-22 ＮＤＫ ＳＡＷ ｄｅｖｉｃｅｓ株式会社 弾性表面波素子およびその製造方法
JP2020092321A (ja) * 2018-12-05 2020-06-11 太陽誘電株式会社 弾性波デバイスおよびその製造方法、フィルタ並びにマルチプレクサ

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57159113A (en) * 1981-03-27 1982-10-01 Toshiba Corp Surface acoustic wave resonator
JPS5955615A (ja) * 1982-09-24 1984-03-30 Hitachi Ltd 弾性表面波装置およびその製造方法
JPS62168411A (ja) * 1986-01-20 1987-07-24 Victor Co Of Japan Ltd 弾性表面波共振子
US5162690A (en) 1989-04-14 1992-11-10 Murata Manufacturing Co., Ltd. Surface acoustic wave device
JP2545983B2 (ja) * 1989-04-14 1996-10-23 株式会社村田製作所 弾性表面波装置
JPH0314305A (ja) 1989-06-13 1991-01-23 Murata Mfg Co Ltd 弾性表面波装置の製造方法
JP2937613B2 (ja) 1991-07-16 1999-08-23 日本電気株式会社 薄膜配線およびその製造方法
JPH05199062A (ja) * 1991-09-24 1993-08-06 Seiko Epson Corp 弾性表面波素子とその製造方法および弾性表面波素子用基板
JPH05183373A (ja) * 1991-12-30 1993-07-23 Murata Mfg Co Ltd 弾性表面波素子の電極材料
JP3033331B2 (ja) 1992-02-10 2000-04-17 日本電気株式会社 薄膜配線の製造方法
JP2818535B2 (ja) * 1993-11-11 1998-10-30 日本電気株式会社 弾性表面波装置
JP3208977B2 (ja) 1993-12-02 2001-09-17 株式会社村田製作所 弾性表面波素子の電極形成方法
JP3438360B2 (ja) 1994-11-14 2003-08-18 株式会社村田製作所 弾性表面波素子の電極形成方法
JPH08154030A (ja) * 1994-11-25 1996-06-11 Murata Mfg Co Ltd 弾性表面波素子
JP2888158B2 (ja) * 1995-01-18 1999-05-10 日本電気株式会社 弾性表面波装置の製造方法
JPH08340233A (ja) 1995-06-13 1996-12-24 Nec Corp 弾性表面波装置
US5929723A (en) 1995-09-21 1999-07-27 Tdk Corporation Surface acoustic wave apparatus having an electrode that is a doped alloy film
DE19641662B4 (de) * 1995-10-13 2004-07-01 Fujitsu Ltd., Kawasaki Oberflächenakustikwellenvorrichtung mit einem optimierten Schnittwinkel eines piezoelektrischen Substrats
JPH09167936A (ja) * 1995-10-13 1997-06-24 Fujitsu Ltd 弾性表面波装置
JPH09199969A (ja) * 1996-01-19 1997-07-31 Murata Mfg Co Ltd 薄膜体
WO1999016168A1 (fr) * 1997-09-22 1999-04-01 Tdk Corporation Appareil a ondes acoustiques de surface et procede de fabrication de cet appareil
US6259185B1 (en) * 1998-12-02 2001-07-10 Cts Corporation Metallization for high power handling in a surface acoustic wave device and method for providing same

Also Published As

Publication number Publication date
US6407486B1 (en) 2002-06-18
EP1111779A1 (de) 2001-06-27
WO2000074235A1 (fr) 2000-12-07
EP1111779B1 (de) 2003-03-05
CN1303538A (zh) 2001-07-11
HK1038837A1 (en) 2002-03-28
JP3387060B2 (ja) 2003-03-17
EP1111779A4 (de) 2002-01-02
DE69905734T2 (de) 2003-07-10
CN1109402C (zh) 2003-05-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee