HK1001421A1 - Undercoating composition for photolithographic resist - Google Patents

Undercoating composition for photolithographic resist

Info

Publication number
HK1001421A1
HK1001421A1 HK98100307A HK98100307A HK1001421A1 HK 1001421 A1 HK1001421 A1 HK 1001421A1 HK 98100307 A HK98100307 A HK 98100307A HK 98100307 A HK98100307 A HK 98100307A HK 1001421 A1 HK1001421 A1 HK 1001421A1
Authority
HK
Hong Kong
Prior art keywords
undercoating composition
photolithographic resist
photolithographic
resist
undercoating
Prior art date
Application number
HK98100307A
Other languages
English (en)
Inventor
Mitsuru Sato
Katsumi Oomori
Etsuko Iguchi
Kiyoshi Ishikawa
Fumitake Kaneko
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of HK1001421A1 publication Critical patent/HK1001421A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
HK98100307A 1996-04-25 1998-01-15 Undercoating composition for photolithographic resist HK1001421A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10592196A JP3436843B2 (ja) 1996-04-25 1996-04-25 リソグラフィー用下地材及びそれを用いたリソグラフィー用レジスト材料

Publications (1)

Publication Number Publication Date
HK1001421A1 true HK1001421A1 (en) 1998-06-19

Family

ID=14420339

Family Applications (1)

Application Number Title Priority Date Filing Date
HK98100307A HK1001421A1 (en) 1996-04-25 1998-01-15 Undercoating composition for photolithographic resist

Country Status (7)

Country Link
US (2) US5939510A (fr)
EP (1) EP0803777B1 (fr)
JP (1) JP3436843B2 (fr)
KR (1) KR100266731B1 (fr)
DE (1) DE69702422T2 (fr)
HK (1) HK1001421A1 (fr)
TW (1) TW575793B (fr)

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US5948847A (en) * 1996-12-13 1999-09-07 Tokyo Ohka Kogyo Co., Ltd. Undercoating composition for photolithographic patterning
EE05627B1 (et) * 1998-12-23 2013-02-15 Pfizer Inc. CTLA-4 vastased inimese monoklonaalsed antikehad
TW476865B (en) 1999-01-28 2002-02-21 Tokyo Ohka Kogyo Co Ltd Undercoating composition for photolithographic resist
US6544717B2 (en) 1999-01-28 2003-04-08 Tokyo Ohka Kogyo Co., Ltd. Undercoating composition for photolithographic resist
EP1190277B1 (fr) 1999-06-10 2009-10-07 AlliedSignal Inc. Semiconducteur ayant un enduit antireflet spin-on-glass pour photolithographie
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US6323310B1 (en) 2000-04-19 2001-11-27 Brewer Science, Inc. Anti-reflective coating compositions comprising polymerized aminoplasts
US6653411B2 (en) 2000-04-19 2003-11-25 Brewer Science, Inc. Anti-reflective coating compositions comprising polymerized aminoplasts
NL1015524C2 (nl) * 2000-06-26 2001-12-28 Otb Group Bv Werkwijze ter vervaardiging van een substraat om te worden toegepast in een stampervervaardigingsproces, alsmede substraat verkregen volgens een dergelijke werkwijze.
KR101287032B1 (ko) * 2000-08-17 2013-07-17 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 내에칭성 반사방지 코팅 조성물
JP2004519803A (ja) * 2001-02-27 2004-07-02 Ｔｄｋ株式会社 光情報媒体用フォトレジスト原盤の製造方法および光情報媒体用スタンパの製造方法
US6593055B2 (en) * 2001-09-05 2003-07-15 Kodak Polychrome Graphics Llc Multi-layer thermally imageable element
JP2003085829A (ja) * 2001-09-06 2003-03-20 Tdk Corp 光情報媒体用スタンパの製造方法およびこれに用いるフォトレジスト原盤、ならびに、光情報媒体用スタンパおよび光情報媒体
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
JP2003140347A (ja) * 2001-11-02 2003-05-14 Tokyo Ohka Kogyo Co Ltd 厚膜ホトレジスト層積層体、厚膜レジストパターンの製造方法、および接続端子の製造方法
TWI228718B (en) * 2001-11-05 2005-03-01 Tdk Corp Manufacturing method and device of mold plate for information medium
JP4381143B2 (ja) 2001-11-15 2009-12-09 ハネウェル・インターナショナル・インコーポレーテッド フォトリソグラフィー用スピンオン反射防止膜
WO2003058613A1 (fr) * 2001-12-28 2003-07-17 Tdk Corporation Procede de fabrication d'une matrice de pressage pour support d'informations, matrice de pressage et disque original photosensible
TWI258142B (en) * 2002-01-08 2006-07-11 Tdk Corp Manufacturing method of stamper for manufacturing data medium, the stamper, and the stamper spacer with template
TWI264717B (en) 2002-01-08 2006-10-21 Tdk Corp Manufacturing method of stamper for manufacturing data medium, the stamper, and the photoresist template
TWI254306B (en) * 2002-01-08 2006-05-01 Tdk Corp Manufacturing method of stamper for manufacturing data medium, the stamper, and the photoresist template
EP1492093A4 (fr) * 2002-03-11 2009-06-03 Tdk Corp Procede de traitement pour une matrice en resine photosensible, procede de production d'une matrice utilisant un support d'enregistrement, procede de production d'un support d'enregistrement, matrice en resine photosensible, matrice utilisant un support d'enregistrment et support d'enregistrem
JP2004013973A (ja) * 2002-06-05 2004-01-15 Tdk Corp フォトレジスト原盤の製造方法、光記録媒体製造用スタンパの製造方法、スタンパ、フォトレジスト原盤、スタンパ中間体及び光記録媒体
US7038328B2 (en) * 2002-10-15 2006-05-02 Brewer Science Inc. Anti-reflective compositions comprising triazine compounds
JP4523258B2 (ja) * 2003-10-07 2010-08-11 ハッコールケミカル株式会社 凸版印刷用感光性積層印刷原版に用いる紫外線吸収剤及びその製造方法
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US20050151283A1 (en) * 2004-01-08 2005-07-14 Bajorek Christopher H. Method and apparatus for making a stamper for patterning CDs and DVDs
US7427466B2 (en) * 2004-11-29 2008-09-23 Imation Corp. Anti-reflection optical data storage disk master
JP2006154570A (ja) * 2004-11-30 2006-06-15 Tokyo Ohka Kogyo Co Ltd レジストパターンおよび導体パターンの製造方法
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
EP3194502A4 (fr) 2015-04-13 2018-05-16 Honeywell International Inc. Formulations de polysiloxane et revêtements pour applications optoélectroniques
US11262656B2 (en) * 2016-03-31 2022-03-01 Rohm And Haas Electronic Materials Korea Ltd. Coating compositions for use with an overcoated photoresist

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US4197392A (en) * 1978-08-21 1980-04-08 General Electric Company Melamine coatings
SU1052529A1 (ru) * 1982-02-03 1983-11-07 Киевский Филиал По Специальным Видам Печати Всесоюзного Научно-Исследовательского Института Комплексных Проблем Полиграфии Лак
US4910122A (en) * 1982-09-30 1990-03-20 Brewer Science, Inc. Anti-reflective coating
JPS60223121A (ja) * 1984-04-19 1985-11-07 Matsushita Electric Ind Co Ltd パタ−ン形成方法
DE3736758A1 (de) * 1987-10-30 1989-05-11 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen farbstoff, und daraus hergestelltes positiv arbeitendes lichtempfindliches aufzeichnungsmaterial
US6165697A (en) * 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
US5234990A (en) * 1992-02-12 1993-08-10 Brewer Science, Inc. Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography
US5294680A (en) * 1992-07-24 1994-03-15 International Business Machines Corporation Polymeric dyes for antireflective coatings
JP3024694B2 (ja) * 1993-11-29 2000-03-21 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP2953562B2 (ja) * 1994-07-18 1999-09-27 東京応化工業株式会社 リソグラフィー用下地材及びそれを用いた多層レジスト材料
US5498514A (en) * 1994-08-09 1996-03-12 Tokyo Ohka Kogyo Co., Ltd. Lithographic double-coated patterning plate with undercoat levelling layer
US5652317A (en) * 1996-08-16 1997-07-29 Hoechst Celanese Corporation Antireflective coatings for photoresist compositions

Also Published As

Publication number Publication date
EP0803777A1 (fr) 1997-10-29
DE69702422D1 (de) 2000-08-10
JPH09292715A (ja) 1997-11-11
US6087068A (en) 2000-07-11
KR100266731B1 (ko) 2000-09-15
KR970072029A (ko) 1997-11-07
JP3436843B2 (ja) 2003-08-18
US5939510A (en) 1999-08-17
EP0803777B1 (fr) 2000-07-05
DE69702422T2 (de) 2000-12-14
TW575793B (en) 2004-02-11

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Legal Events

Date Code Title Description
PF Patent in force
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20080418