GB9610103D0 - Method of forming a sog film in a semiconductor device - Google Patents
Method of forming a sog film in a semiconductor deviceInfo
- Publication number
- GB9610103D0 GB9610103D0 GBGB9610103.5A GB9610103A GB9610103D0 GB 9610103 D0 GB9610103 D0 GB 9610103D0 GB 9610103 A GB9610103 A GB 9610103A GB 9610103 D0 GB9610103 D0 GB 9610103D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- forming
- semiconductor device
- sog film
- sog
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950012711A KR0172539B1 (en) | 1995-05-22 | 1995-05-22 | Method of forming s.o.g. in a semiconductor device |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9610103D0 true GB9610103D0 (en) | 1996-07-24 |
GB2301224A GB2301224A (en) | 1996-11-27 |
GB2301224B GB2301224B (en) | 1999-07-14 |
Family
ID=19415020
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9610103A Expired - Fee Related GB2301224B (en) | 1995-05-22 | 1996-05-15 | Method of forming a sog film in a semiconductor device |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPH08330301A (en) |
KR (1) | KR0172539B1 (en) |
CN (1) | CN1076869C (en) |
DE (1) | DE19620677B4 (en) |
GB (1) | GB2301224B (en) |
TW (1) | TW299467B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970052338A (en) * | 1995-12-23 | 1997-07-29 | 김주용 | Manufacturing method of semiconductor device |
GB2322734A (en) * | 1997-02-27 | 1998-09-02 | Nec Corp | Semiconductor device and a method of manufacturing the same |
KR100458081B1 (en) * | 1997-06-26 | 2005-02-23 | 주식회사 하이닉스반도체 | Method for forming via hole of semiconductor device to improve step coverage of metal layer |
KR100459686B1 (en) * | 1997-06-27 | 2005-01-17 | 삼성전자주식회사 | Fabrication method of contact hole for semiconductor device |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2823878B2 (en) * | 1989-03-09 | 1998-11-11 | 触媒化成工業株式会社 | Method for manufacturing semiconductor integrated circuit |
US5270267A (en) * | 1989-05-31 | 1993-12-14 | Mitel Corporation | Curing and passivation of spin on glasses by a plasma process wherein an external polarization field is applied to the substrate |
JPH04158519A (en) * | 1990-10-22 | 1992-06-01 | Seiko Epson Corp | Manufacture of semiconductor device |
JP2913918B2 (en) * | 1991-08-26 | 1999-06-28 | 日本電気株式会社 | Method for manufacturing semiconductor device |
JPH0778816A (en) * | 1993-06-30 | 1995-03-20 | Kawasaki Steel Corp | Manufacture of semiconductor device |
-
1995
- 1995-05-22 KR KR1019950012711A patent/KR0172539B1/en not_active IP Right Cessation
-
1996
- 1996-05-04 TW TW085105671A patent/TW299467B/zh active
- 1996-05-15 GB GB9610103A patent/GB2301224B/en not_active Expired - Fee Related
- 1996-05-20 JP JP8124131A patent/JPH08330301A/en active Pending
- 1996-05-22 CN CN96110029A patent/CN1076869C/en not_active Expired - Fee Related
- 1996-05-22 DE DE19620677A patent/DE19620677B4/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1140898A (en) | 1997-01-22 |
GB2301224B (en) | 1999-07-14 |
TW299467B (en) | 1997-03-01 |
KR960043018A (en) | 1996-12-21 |
JPH08330301A (en) | 1996-12-13 |
DE19620677B4 (en) | 2007-06-14 |
CN1076869C (en) | 2001-12-26 |
DE19620677A1 (en) | 1996-11-28 |
GB2301224A (en) | 1996-11-27 |
KR0172539B1 (en) | 1999-03-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20100515 |