GB9608822D0 - Method of manufacturing a semiconductor device - Google Patents
Method of manufacturing a semiconductor deviceInfo
- Publication number
- GB9608822D0 GB9608822D0 GBGB9608822.4A GB9608822A GB9608822D0 GB 9608822 D0 GB9608822 D0 GB 9608822D0 GB 9608822 A GB9608822 A GB 9608822A GB 9608822 D0 GB9608822 D0 GB 9608822D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- manufacturing
- semiconductor device
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic System
- H01L21/28525—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic System the conductive layers comprising semiconducting material
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950010983A KR100208439B1 (en) | 1995-05-04 | 1995-05-04 | Method of forming polysilicon layer in semiconductor device |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9608822D0 true GB9608822D0 (en) | 1996-07-03 |
GB2300517A GB2300517A (en) | 1996-11-06 |
GB2300517B GB2300517B (en) | 1999-07-28 |
Family
ID=19413757
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9608822A Expired - Fee Related GB2300517B (en) | 1995-05-04 | 1996-04-30 | Method of manufacturing a semiconductor device |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPH08306642A (en) |
KR (1) | KR100208439B1 (en) |
CN (1) | CN1083158C (en) |
DE (1) | DE19617833A1 (en) |
GB (1) | GB2300517B (en) |
TW (1) | TW291572B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6107192A (en) * | 1997-12-30 | 2000-08-22 | Applied Materials, Inc. | Reactive preclean prior to metallization for sub-quarter micron application |
JP2010123866A (en) | 2008-11-21 | 2010-06-03 | Sharp Corp | Semiconductor device and method of manufacturing the same |
KR102178535B1 (en) | 2014-02-19 | 2020-11-13 | 삼성전자주식회사 | Methods of manufacturing semiconductor devices |
CN106571289B (en) * | 2015-10-13 | 2020-01-03 | 中芯国际集成电路制造(上海)有限公司 | Semiconductor device, preparation method thereof and electronic device |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1239706A (en) * | 1984-11-26 | 1988-07-26 | Hisao Hayashi | Method of forming a thin semiconductor film |
JPH0322527A (en) * | 1989-06-20 | 1991-01-30 | Fujitsu Ltd | Manufacture of semiconductor device |
JPH0350823A (en) * | 1989-07-19 | 1991-03-05 | Nec Corp | Manufacture of semiconductor device |
JP3125302B2 (en) * | 1990-11-21 | 2001-01-15 | セイコーエプソン株式会社 | Method for manufacturing semiconductor device |
JPH05275365A (en) * | 1992-03-30 | 1993-10-22 | Oki Electric Ind Co Ltd | Manufacture of semiconductor element |
US5266514A (en) * | 1992-12-21 | 1993-11-30 | Industrial Technology Research Institute | Method for producing a roughened surface capacitor |
JPH0729852A (en) * | 1993-07-07 | 1995-01-31 | Kawasaki Steel Corp | Fabrication of semiconductor device |
JP2697645B2 (en) * | 1994-10-31 | 1998-01-14 | 日本電気株式会社 | Method for manufacturing semiconductor device |
-
1995
- 1995-05-04 KR KR1019950010983A patent/KR100208439B1/en not_active IP Right Cessation
-
1996
- 1996-04-26 JP JP8106869A patent/JPH08306642A/en active Pending
- 1996-04-30 GB GB9608822A patent/GB2300517B/en not_active Expired - Fee Related
- 1996-05-03 DE DE19617833A patent/DE19617833A1/en not_active Ceased
- 1996-05-04 TW TW085105355A patent/TW291572B/zh active
- 1996-05-04 CN CN96107491A patent/CN1083158C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100208439B1 (en) | 1999-07-15 |
CN1083158C (en) | 2002-04-17 |
GB2300517B (en) | 1999-07-28 |
GB2300517A (en) | 1996-11-06 |
JPH08306642A (en) | 1996-11-22 |
DE19617833A1 (en) | 1996-11-07 |
TW291572B (en) | 1996-11-21 |
CN1144397A (en) | 1997-03-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20100430 |