GB937159A - Improvements in or relating to photo-reproduction coatings - Google Patents
Improvements in or relating to photo-reproduction coatingsInfo
- Publication number
- GB937159A GB937159A GB3097/60A GB309760A GB937159A GB 937159 A GB937159 A GB 937159A GB 3097/60 A GB3097/60 A GB 3097/60A GB 309760 A GB309760 A GB 309760A GB 937159 A GB937159 A GB 937159A
- Authority
- GB
- United Kingdom
- Prior art keywords
- diazide
- compounds
- naphthoquinone
- acid chloride
- sulphonic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000576 coating method Methods 0.000 title abstract 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 abstract 4
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 3
- ASSKVPFEZFQQNQ-UHFFFAOYSA-N 2-benzoxazolinone Chemical compound C1=CC=C2OC(O)=NC2=C1 ASSKVPFEZFQQNQ-UHFFFAOYSA-N 0.000 abstract 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 abstract 2
- 238000009833 condensation Methods 0.000 abstract 2
- 230000005494 condensation Effects 0.000 abstract 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 abstract 2
- SJHPCNCNNSSLPL-CSKARUKUSA-N (4e)-4-(ethoxymethylidene)-2-phenyl-1,3-oxazol-5-one Chemical group O1C(=O)C(=C/OCC)\N=C1C1=CC=CC=C1 SJHPCNCNNSSLPL-CSKARUKUSA-N 0.000 abstract 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 abstract 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract 1
- 150000004982 aromatic amines Chemical class 0.000 abstract 1
- 235000010290 biphenyl Nutrition 0.000 abstract 1
- 239000004305 biphenyl Substances 0.000 abstract 1
- 125000006267 biphenyl group Chemical group 0.000 abstract 1
- 238000009835 boiling Methods 0.000 abstract 1
- 125000002843 carboxylic acid group Chemical group 0.000 abstract 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 150000005619 secondary aliphatic amines Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK36878A DE1097273B (de) | 1959-02-04 | 1959-02-04 | o-Chinondiazide enthaltende Kopierschichten fuer Flachdruckformen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB937159A true GB937159A (en) | 1963-09-18 |
Family
ID=7220828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3097/60A Expired GB937159A (en) | 1959-02-04 | 1960-01-28 | Improvements in or relating to photo-reproduction coatings |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3126281A (en, 2012) |
| BE (1) | BE587146A (en, 2012) |
| CH (1) | CH388778A (en, 2012) |
| DE (1) | DE1097273B (en, 2012) |
| FR (1) | FR1250805A (en, 2012) |
| GB (1) | GB937159A (en, 2012) |
| NL (2) | NL125781C (en, 2012) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2210172A (en) * | 1987-09-18 | 1989-06-01 | Fuji Photo Film Co Ltd | Light-sensitive material and method for forming images |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA774047A (en) * | 1963-12-09 | 1967-12-19 | Shipley Company | Light-sensitive material and process for the development thereof |
| GB1116737A (en) * | 1966-02-28 | 1968-06-12 | Agfa Gevaert Nv | Bis-(o-quinone diazide) modified bisphenols |
| US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
| US4193797A (en) * | 1971-03-22 | 1980-03-18 | E. I. Dupont De Nemours And Company | Method for making photoresists |
| US4196003A (en) * | 1974-02-01 | 1980-04-01 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinone diazide copying composition |
| US4007047A (en) * | 1974-06-06 | 1977-02-08 | International Business Machines Corporation | Modified processing of positive photoresists |
| US4093461A (en) * | 1975-07-18 | 1978-06-06 | Gaf Corporation | Positive working thermally stable photoresist composition, article and method of using |
| US4268602A (en) * | 1978-12-05 | 1981-05-19 | Toray Industries, Ltd. | Photosensitive O-quinone diazide containing composition |
| DE3151078A1 (de) * | 1981-12-23 | 1983-07-28 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung von reliefbildern |
| DE3584316D1 (de) * | 1984-06-01 | 1991-11-14 | Rohm & Haas | Lichtempfindliche beschichtungszusammensetzung, aus diesem hergestellte thermisch stabile beschichtungen und verfahren zur herstellung von thermisch stabilen polymerbildern. |
| JPS61125019A (ja) * | 1984-11-16 | 1986-06-12 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 集積回路製造方法及びその方法に使用する光導電性フオトレジスト複合体 |
| GB8729510D0 (en) * | 1987-12-18 | 1988-02-03 | Ucb Sa | Photosensitive compositions containing phenolic resins & diazoquinone compounds |
| US5272026A (en) * | 1987-12-18 | 1993-12-21 | Ucb S.A. | Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article |
| JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE596731C (de) * | 1932-05-23 | 1934-05-09 | Kalle & Co Akt Ges | Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen |
| BE510151A (en, 2012) * | 1949-07-23 | |||
| US2702243A (en) * | 1950-06-17 | 1955-02-15 | Azoplate Corp | Light-sensitive photographic element and process of producing printing plates |
| NL166823B (nl) * | 1951-02-02 | Petroles Cie Francaise | Electrisch koppelingsorgaan voor koppeling onder water. | |
| BE545042A (en, 2012) * | 1955-02-11 | |||
| BE551933A (en, 2012) * | 1955-10-25 |
-
0
- US US3126281D patent/US3126281A/en not_active Expired - Lifetime
- NL NL247939D patent/NL247939A/xx unknown
- NL NL125781D patent/NL125781C/xx active
-
1959
- 1959-02-04 DE DEK36878A patent/DE1097273B/de active Pending
-
1960
- 1960-01-26 CH CH74460A patent/CH388778A/de unknown
- 1960-01-28 GB GB3097/60A patent/GB937159A/en not_active Expired
- 1960-02-01 BE BE587146A patent/BE587146A/fr unknown
- 1960-02-02 FR FR817295A patent/FR1250805A/fr not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2210172A (en) * | 1987-09-18 | 1989-06-01 | Fuji Photo Film Co Ltd | Light-sensitive material and method for forming images |
Also Published As
| Publication number | Publication date |
|---|---|
| NL125781C (en, 2012) | |
| US3126281A (en) | 1964-03-24 |
| DE1097273B (de) | 1961-01-12 |
| NL247939A (en, 2012) | |
| CH388778A (de) | 1965-02-28 |
| FR1250805A (fr) | 1961-01-13 |
| BE587146A (fr) | 1960-05-30 |
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