CH388778A - o-Chinondiazide enthaltendes Kopiermaterial - Google Patents

o-Chinondiazide enthaltendes Kopiermaterial

Info

Publication number
CH388778A
CH388778A CH74460A CH74460A CH388778A CH 388778 A CH388778 A CH 388778A CH 74460 A CH74460 A CH 74460A CH 74460 A CH74460 A CH 74460A CH 388778 A CH388778 A CH 388778A
Authority
CH
Switzerland
Prior art keywords
quinonediazides
material containing
copying material
copying
Prior art date
Application number
CH74460A
Other languages
English (en)
Inventor
Oskar Dr Sues
Karl Dr Moeller
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of CH388778A publication Critical patent/CH388778A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
CH74460A 1959-02-04 1960-01-26 o-Chinondiazide enthaltendes Kopiermaterial CH388778A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK36878A DE1097273B (de) 1959-02-04 1959-02-04 o-Chinondiazide enthaltende Kopierschichten fuer Flachdruckformen

Publications (1)

Publication Number Publication Date
CH388778A true CH388778A (de) 1965-02-28

Family

ID=7220828

Family Applications (1)

Application Number Title Priority Date Filing Date
CH74460A CH388778A (de) 1959-02-04 1960-01-26 o-Chinondiazide enthaltendes Kopiermaterial

Country Status (7)

Country Link
US (1) US3126281A (de)
BE (1) BE587146A (de)
CH (1) CH388778A (de)
DE (1) DE1097273B (de)
FR (1) FR1250805A (de)
GB (1) GB937159A (de)
NL (2) NL125781C (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
GB1116737A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Bis-(o-quinone diazide) modified bisphenols
US3837860A (en) * 1969-06-16 1974-09-24 L Roos PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
US4193797A (en) * 1971-03-22 1980-03-18 E. I. Dupont De Nemours And Company Method for making photoresists
US4196003A (en) * 1974-02-01 1980-04-01 Fuji Photo Film Co., Ltd. Light-sensitive o-quinone diazide copying composition
US4007047A (en) * 1974-06-06 1977-02-08 International Business Machines Corporation Modified processing of positive photoresists
US4093461A (en) * 1975-07-18 1978-06-06 Gaf Corporation Positive working thermally stable photoresist composition, article and method of using
US4268602A (en) * 1978-12-05 1981-05-19 Toray Industries, Ltd. Photosensitive O-quinone diazide containing composition
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
NO173574C (no) * 1984-06-01 1993-12-29 Rohm & Haas Fremgangsmaate til fremstilling av et termisk stabilt, positivt eller negativt bilde paa en underlagsflate
JPS61125019A (ja) * 1984-11-16 1986-06-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 集積回路製造方法及びその方法に使用する光導電性フオトレジスト複合体
JPS6478249A (en) * 1987-09-18 1989-03-23 Fuji Photo Film Co Ltd Photosensitive material and image forming method
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE596731C (de) * 1932-05-23 1934-05-09 Kalle & Co Akt Ges Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen
NL80569C (de) * 1949-07-23
US2702243A (en) * 1950-06-17 1955-02-15 Azoplate Corp Light-sensitive photographic element and process of producing printing plates
NL166823B (nl) * 1951-02-02 Petroles Cie Francaise Electrisch koppelingsorgaan voor koppeling onder water.
BE545042A (de) * 1955-02-11
BE551933A (de) * 1955-10-25

Also Published As

Publication number Publication date
BE587146A (fr) 1960-05-30
FR1250805A (fr) 1961-01-13
NL125781C (de)
DE1097273B (de) 1961-01-12
GB937159A (en) 1963-09-18
US3126281A (en) 1964-03-24
NL247939A (de)

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