GB877637A - Acid electrolytic copper-plating baths - Google Patents
Acid electrolytic copper-plating bathsInfo
- Publication number
- GB877637A GB877637A GB11129/60A GB1112960A GB877637A GB 877637 A GB877637 A GB 877637A GB 11129/60 A GB11129/60 A GB 11129/60A GB 1112960 A GB1112960 A GB 1112960A GB 877637 A GB877637 A GB 877637A
- Authority
- GB
- United Kingdom
- Prior art keywords
- sulphonic acid
- plating baths
- amino
- copper
- agents
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Indole Compounds (AREA)
Abstract
877,637. Copper-plating baths. DEHYDAG DEUTSCHE HYDRIERWERKE G.m.b.H. March 30, 1960 [June 6, 1959], No. 11129/60. Class 41. Copper-plating baths are improved by adding a basic dyestuff which contains an ethenyl chromophore i.e. one or more groups > C = C < and nitrogen, e.g. cyanine, acridine, pyronine, quinoline, tri-phenyl methane, thiazole, and thioflavine dyes. These act as levelling agents at low current densities. There may also be present lustering agents, e.g. N mono- or disubstituted dithiocarbamic acid alkyl ester sulphonic acid, 1.3.5-triazine-2.4.6-tris-mercapto alkane sulphonic acid, thio amides and iso thio amides having a sulphonic group. In addition, to render mains water usable, there may be added amino compounds free of carboxyl groups, e.g. N: N-dimethyl bromaniline, 3-diethyl amino-1-chlorpropanol 2, and halogen salts of quaternary ammonium compounds. Wetting agents, e.g. polyethylene oxide addition products may be present. The deposition of anode mud is prevented by adding sulphonic acid salts, e.g. Na salt of azido-propane sulphonic acid. In examples, the dyestuffs added are thioflavine, p-dimethyl-amino-triphenyl carbenium chloride, 3-3<1>-diethylthiocyanine iodide thiopyronine and an indolenine dye.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DED30820A DE1133610B (en) | 1959-06-06 | 1959-06-06 | Acid galvanic copper baths |
Publications (1)
Publication Number | Publication Date |
---|---|
GB877637A true GB877637A (en) | 1961-09-20 |
Family
ID=7040656
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB11129/60A Expired GB877637A (en) | 1959-06-06 | 1960-03-30 | Acid electrolytic copper-plating baths |
Country Status (3)
Country | Link |
---|---|
US (1) | US3081240A (en) |
DE (1) | DE1133610B (en) |
GB (1) | GB877637A (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL291575A (en) * | 1962-04-16 | |||
US3328273A (en) * | 1966-08-15 | 1967-06-27 | Udylite Corp | Electro-deposition of copper from acidic baths |
US3373095A (en) * | 1967-06-05 | 1968-03-12 | Dayton Bright Copper Company | Electroplating of copper |
US3966565A (en) * | 1972-12-14 | 1976-06-29 | M & T Chemicals Inc. | Electrodeposition of copper |
US3956078A (en) * | 1972-12-14 | 1976-05-11 | M & T Chemicals Inc. | Electrodeposition of copper |
US3956079A (en) * | 1972-12-14 | 1976-05-11 | M & T Chemicals Inc. | Electrodeposition of copper |
US3956084A (en) * | 1972-12-14 | 1976-05-11 | M & T Chemicals Inc. | Electrodeposition of copper |
US3940320A (en) * | 1972-12-14 | 1976-02-24 | M & T Chemicals Inc. | Electrodeposition of copper |
US3956120A (en) * | 1972-12-14 | 1976-05-11 | M & T Chemicals Inc. | Electrodeposition of copper |
US4036710A (en) * | 1974-11-21 | 1977-07-19 | M & T Chemicals Inc. | Electrodeposition of copper |
US4014760A (en) * | 1974-11-21 | 1977-03-29 | M & T Chemicals Inc. | Electrodeposition of copper |
US4036711A (en) * | 1975-12-18 | 1977-07-19 | M & T Chemicals Inc. | Electrodeposition of copper |
US4376685A (en) * | 1981-06-24 | 1983-03-15 | M&T Chemicals Inc. | Acid copper electroplating baths containing brightening and leveling additives |
CN117966225B (en) * | 2024-03-28 | 2024-07-16 | 昆山一鼎工业科技有限公司 | QFP blister copper electroplating solution, preparation method and electroplating method |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR51000E (en) * | 1939-12-13 | 1941-05-19 | Habshaw Chemical Company | Process for obtaining electrolytic deposits of shiny and ductile nickel |
US2637687A (en) * | 1951-05-31 | 1953-05-05 | Lloyd B Portzer | Electrodeposition of nickel |
GB701717A (en) * | 1951-10-08 | 1953-12-30 | Internat Kenmore Ltd | Electrodeposition with nickel |
US2663684A (en) * | 1952-06-02 | 1953-12-22 | Houdaille Hershey Corp | Method of and composition for plating copper |
DE934508C (en) * | 1954-04-23 | 1955-10-27 | Dehydag Gmbh | Process for the production of galvanic metal coatings |
US2805194A (en) * | 1955-07-18 | 1957-09-03 | Dayton Bright Copper Company | Bright copper plating |
BE565994A (en) * | 1957-04-16 | |||
US2882209A (en) * | 1957-05-20 | 1959-04-14 | Udylite Res Corp | Electrodeposition of copper from an acid bath |
BE572186A (en) * | 1957-12-17 |
-
1959
- 1959-06-06 DE DED30820A patent/DE1133610B/en active Pending
-
1960
- 1960-03-30 GB GB11129/60A patent/GB877637A/en not_active Expired
- 1960-05-31 US US32555A patent/US3081240A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US3081240A (en) | 1963-03-12 |
DE1133610B (en) | 1962-07-19 |
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