GB2216903A - Transparent conductive zinc oxide layer - Google Patents

Transparent conductive zinc oxide layer Download PDF

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Publication number
GB2216903A
GB2216903A GB8808036A GB8808036A GB2216903A GB 2216903 A GB2216903 A GB 2216903A GB 8808036 A GB8808036 A GB 8808036A GB 8808036 A GB8808036 A GB 8808036A GB 2216903 A GB2216903 A GB 2216903A
Authority
GB
United Kingdom
Prior art keywords
substrate
zinc oxide
layer
droplets
process according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB8808036A
Other languages
English (en)
Other versions
GB8808036D0 (en
Inventor
Sener Oktik
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Priority to GB8808036A priority Critical patent/GB2216903A/en
Publication of GB8808036D0 publication Critical patent/GB8808036D0/en
Priority to EP89302495A priority patent/EP0336574A1/en
Priority to GB898905797A priority patent/GB8905797D0/en
Priority to BR898901586A priority patent/BR8901586A/pt
Priority to AU32456/89A priority patent/AU609277B2/en
Priority to JP1085873A priority patent/JPH01301515A/ja
Priority to KR1019890004518A priority patent/KR890016715A/ko
Publication of GB2216903A publication Critical patent/GB2216903A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1291—Process of deposition of the inorganic material by heating of the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/143—Radiation by light, e.g. photolysis or pyrolysis

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Surface Treatment Of Glass (AREA)
GB8808036A 1988-04-06 1988-04-06 Transparent conductive zinc oxide layer Withdrawn GB2216903A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GB8808036A GB2216903A (en) 1988-04-06 1988-04-06 Transparent conductive zinc oxide layer
EP89302495A EP0336574A1 (en) 1988-04-06 1989-03-14 Producing a layer of transparent conductive zinc oxide
GB898905797A GB8905797D0 (en) 1988-04-06 1989-03-14 Producing a layer of transparent conductive zinc oxide
BR898901586A BR8901586A (pt) 1988-04-06 1989-04-04 Processo para formar uma camada de oxido de zinco transparente eletricamente condutor sobre um substrato e a referida camada
AU32456/89A AU609277B2 (en) 1988-04-06 1989-04-05 Producing a layer of transparent conductive zinc oxide
JP1085873A JPH01301515A (ja) 1988-04-06 1989-04-06 透明な導電性酸化亜鉛層及びその形成方法
KR1019890004518A KR890016715A (ko) 1988-04-06 1989-04-06 투명하고 전도성인 산화아연 레이어의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8808036A GB2216903A (en) 1988-04-06 1988-04-06 Transparent conductive zinc oxide layer

Publications (2)

Publication Number Publication Date
GB8808036D0 GB8808036D0 (en) 1988-05-05
GB2216903A true GB2216903A (en) 1989-10-18

Family

ID=10634656

Family Applications (2)

Application Number Title Priority Date Filing Date
GB8808036A Withdrawn GB2216903A (en) 1988-04-06 1988-04-06 Transparent conductive zinc oxide layer
GB898905797A Pending GB8905797D0 (en) 1988-04-06 1989-03-14 Producing a layer of transparent conductive zinc oxide

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB898905797A Pending GB8905797D0 (en) 1988-04-06 1989-03-14 Producing a layer of transparent conductive zinc oxide

Country Status (6)

Country Link
EP (1) EP0336574A1 (ja)
JP (1) JPH01301515A (ja)
KR (1) KR890016715A (ja)
AU (1) AU609277B2 (ja)
BR (1) BR8901586A (ja)
GB (2) GB2216903A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2264119A (en) * 1992-02-17 1993-08-18 Mitsubishi Electric Corp Oxide-system dielectric thin film formed by cvd method using vapour of organic solvent

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2661623B1 (fr) * 1989-04-04 1992-07-17 Commissariat Energie Atomique Systeme d'injection d'aerosol pour elaboration de couches composites par pyrolyse.
US5190592A (en) * 1990-05-02 1993-03-02 Commissariat A L'energie Atomique Aerosol injection system for producing composite layers by pyrolysis
DE19719162C2 (de) * 1997-05-06 2001-02-08 Fraunhofer Ges Forschung Verfahren zur Herstellung einer elektrisch leitenden ZnO enthaltenden Schicht auf einem Substrat
KR20010066533A (ko) * 1999-12-31 2001-07-11 정종순 안정한 코팅용 기화물 생성방법 및 장치
JP4114060B2 (ja) 2003-02-06 2008-07-09 セイコーエプソン株式会社 受光素子の製造方法
US8354294B2 (en) * 2006-01-24 2013-01-15 De Rochemont L Pierre Liquid chemical deposition apparatus and process and products therefrom
WO2013038484A1 (ja) * 2011-09-13 2013-03-21 東芝三菱電機産業システム株式会社 酸化膜成膜方法および酸化膜成膜装置
JP6510667B2 (ja) * 2015-10-19 2019-05-08 東芝三菱電機産業システム株式会社 成膜装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB776443A (en) * 1953-02-24 1957-06-05 Armour Res Found New or improved methods of forming metal oxide coatings
GB1119539A (en) * 1964-10-16 1968-07-10 Philips Electronic Associated Improvements relating to heat-reflecting filters
GB1553380A (en) * 1975-10-01 1979-09-26 Gen Electric Metal vapour discharge lamps
EP0045600A1 (en) * 1980-07-28 1982-02-10 Monsanto Company Improved method for producing semiconductor grade silicon
GB2131792A (en) * 1982-12-10 1984-06-27 Glaverbel Vitreous material bearing a multi-layer coating and method and apparatus for forming such coating
GB2139612A (en) * 1983-05-13 1984-11-14 Glaverbel Coating a hot vitreous substrate
WO1986006755A1 (en) * 1985-05-10 1986-11-20 General Electric Company Selective chemical vapor deposition method and apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB704793A (en) * 1951-04-11 1954-03-03 Pittsburgh Plate Glass Co Method of producing an electroconductive article
US2791521A (en) * 1953-04-02 1957-05-07 Gen Electric Electric resistance device provided with zinc oxide electroconductive coating

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB776443A (en) * 1953-02-24 1957-06-05 Armour Res Found New or improved methods of forming metal oxide coatings
GB1119539A (en) * 1964-10-16 1968-07-10 Philips Electronic Associated Improvements relating to heat-reflecting filters
GB1553380A (en) * 1975-10-01 1979-09-26 Gen Electric Metal vapour discharge lamps
EP0045600A1 (en) * 1980-07-28 1982-02-10 Monsanto Company Improved method for producing semiconductor grade silicon
GB2131792A (en) * 1982-12-10 1984-06-27 Glaverbel Vitreous material bearing a multi-layer coating and method and apparatus for forming such coating
GB2139612A (en) * 1983-05-13 1984-11-14 Glaverbel Coating a hot vitreous substrate
WO1986006755A1 (en) * 1985-05-10 1986-11-20 General Electric Company Selective chemical vapor deposition method and apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Thin Solid Films, Vol 108, 1983 pages 333-340 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2264119A (en) * 1992-02-17 1993-08-18 Mitsubishi Electric Corp Oxide-system dielectric thin film formed by cvd method using vapour of organic solvent
GB2264119B (en) * 1992-02-17 1995-03-01 Mitsubishi Electric Corp A method for manufacturing an oxide-system dielectric thin film using CVD method

Also Published As

Publication number Publication date
EP0336574A1 (en) 1989-10-11
GB8808036D0 (en) 1988-05-05
AU3245689A (en) 1989-10-19
BR8901586A (pt) 1989-11-21
KR890016715A (ko) 1989-11-29
JPH01301515A (ja) 1989-12-05
GB8905797D0 (en) 1989-04-26
AU609277B2 (en) 1991-04-26

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WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)