BR8901586A - Processo para formar uma camada de oxido de zinco transparente eletricamente condutor sobre um substrato e a referida camada - Google Patents

Processo para formar uma camada de oxido de zinco transparente eletricamente condutor sobre um substrato e a referida camada

Info

Publication number
BR8901586A
BR8901586A BR898901586A BR8901586A BR8901586A BR 8901586 A BR8901586 A BR 8901586A BR 898901586 A BR898901586 A BR 898901586A BR 8901586 A BR8901586 A BR 8901586A BR 8901586 A BR8901586 A BR 8901586A
Authority
BR
Brazil
Prior art keywords
layer
substrate
electrically conductive
zinc oxide
transparent electrically
Prior art date
Application number
BR898901586A
Other languages
English (en)
Portuguese (pt)
Inventor
Sener Oktik
Original Assignee
Ici Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ici Plc filed Critical Ici Plc
Publication of BR8901586A publication Critical patent/BR8901586A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1291—Process of deposition of the inorganic material by heating of the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/143—Radiation by light, e.g. photolysis or pyrolysis

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Ceramic Engineering (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Surface Treatment Of Glass (AREA)
BR898901586A 1988-04-06 1989-04-04 Processo para formar uma camada de oxido de zinco transparente eletricamente condutor sobre um substrato e a referida camada BR8901586A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8808036A GB2216903A (en) 1988-04-06 1988-04-06 Transparent conductive zinc oxide layer

Publications (1)

Publication Number Publication Date
BR8901586A true BR8901586A (pt) 1989-11-21

Family

ID=10634656

Family Applications (1)

Application Number Title Priority Date Filing Date
BR898901586A BR8901586A (pt) 1988-04-06 1989-04-04 Processo para formar uma camada de oxido de zinco transparente eletricamente condutor sobre um substrato e a referida camada

Country Status (6)

Country Link
EP (1) EP0336574A1 (ja)
JP (1) JPH01301515A (ja)
KR (1) KR890016715A (ja)
AU (1) AU609277B2 (ja)
BR (1) BR8901586A (ja)
GB (2) GB2216903A (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2661623B1 (fr) * 1989-04-04 1992-07-17 Commissariat Energie Atomique Systeme d'injection d'aerosol pour elaboration de couches composites par pyrolyse.
US5190592A (en) * 1990-05-02 1993-03-02 Commissariat A L'energie Atomique Aerosol injection system for producing composite layers by pyrolysis
DE4304679C2 (de) * 1992-02-17 1996-03-21 Mitsubishi Electric Corp Verfahren zur Herstellung einer dünnen dielektrischen Schicht eines Oxid-Systems unter Verwendung des CVD-Verfahrens
DE19719162C2 (de) * 1997-05-06 2001-02-08 Fraunhofer Ges Forschung Verfahren zur Herstellung einer elektrisch leitenden ZnO enthaltenden Schicht auf einem Substrat
KR20010066533A (ko) * 1999-12-31 2001-07-11 정종순 안정한 코팅용 기화물 생성방법 및 장치
JP4114060B2 (ja) 2003-02-06 2008-07-09 セイコーエプソン株式会社 受光素子の製造方法
US8354294B2 (en) * 2006-01-24 2013-01-15 De Rochemont L Pierre Liquid chemical deposition apparatus and process and products therefrom
US10016785B2 (en) 2011-09-13 2018-07-10 Toshiba Mitsubishi-Electric Industrial Systems Corporation Oxide film deposition method and oxide film deposition device
CN108138319B (zh) * 2015-10-19 2020-12-01 东芝三菱电机产业系统株式会社 成膜装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB704793A (en) * 1951-04-11 1954-03-03 Pittsburgh Plate Glass Co Method of producing an electroconductive article
BE526755A (ja) * 1953-02-24 1900-01-01
US2791521A (en) * 1953-04-02 1957-05-07 Gen Electric Electric resistance device provided with zinc oxide electroconductive coating
DE1496590C3 (de) * 1964-10-16 1973-10-31 N.V. Philips' Gloeilampenfabrieken, Eindhoven (Niederlande) Verfahren zur Herstellung von warme reflektierenden SnO tief 2 Schichten mit reproduzierbaren optischen und elektrischen Eigenschaften auf Tragern
US4006378A (en) * 1975-10-01 1977-02-01 General Electric Company Optical coating with selectable transmittance characteristics and method of making the same
DE3166609D1 (en) * 1980-07-28 1984-11-15 Monsanto Co Improved method for producing semiconductor grade silicon
GB2131792A (en) * 1982-12-10 1984-06-27 Glaverbel Vitreous material bearing a multi-layer coating and method and apparatus for forming such coating
GB2139612B (en) * 1983-05-13 1987-03-11 Glaverbel Coating a hot vitreous substrate
EP0223787B1 (en) * 1985-05-10 1992-03-18 General Electric Company Selective chemical vapor deposition method and apparatus

Also Published As

Publication number Publication date
GB2216903A (en) 1989-10-18
GB8905797D0 (en) 1989-04-26
AU3245689A (en) 1989-10-19
JPH01301515A (ja) 1989-12-05
EP0336574A1 (en) 1989-10-11
GB8808036D0 (en) 1988-05-05
KR890016715A (ko) 1989-11-29
AU609277B2 (en) 1991-04-26

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