BR8901586A - PROCESS TO FORM A TRANSPARENT ELECTRICALLY CONDUCTIVE ZINC OXIDE LAYER ON A SUBSTRATE AND THE REFERRED LAYER - Google Patents

PROCESS TO FORM A TRANSPARENT ELECTRICALLY CONDUCTIVE ZINC OXIDE LAYER ON A SUBSTRATE AND THE REFERRED LAYER

Info

Publication number
BR8901586A
BR8901586A BR898901586A BR8901586A BR8901586A BR 8901586 A BR8901586 A BR 8901586A BR 898901586 A BR898901586 A BR 898901586A BR 8901586 A BR8901586 A BR 8901586A BR 8901586 A BR8901586 A BR 8901586A
Authority
BR
Brazil
Prior art keywords
layer
substrate
electrically conductive
zinc oxide
transparent electrically
Prior art date
Application number
BR898901586A
Other languages
Portuguese (pt)
Inventor
Sener Oktik
Original Assignee
Ici Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ici Plc filed Critical Ici Plc
Publication of BR8901586A publication Critical patent/BR8901586A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1291—Process of deposition of the inorganic material by heating of the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/143—Radiation by light, e.g. photolysis or pyrolysis

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Non-Insulated Conductors (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Surface Treatment Of Glass (AREA)
BR898901586A 1988-04-06 1989-04-04 PROCESS TO FORM A TRANSPARENT ELECTRICALLY CONDUCTIVE ZINC OXIDE LAYER ON A SUBSTRATE AND THE REFERRED LAYER BR8901586A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8808036A GB2216903A (en) 1988-04-06 1988-04-06 Transparent conductive zinc oxide layer

Publications (1)

Publication Number Publication Date
BR8901586A true BR8901586A (en) 1989-11-21

Family

ID=10634656

Family Applications (1)

Application Number Title Priority Date Filing Date
BR898901586A BR8901586A (en) 1988-04-06 1989-04-04 PROCESS TO FORM A TRANSPARENT ELECTRICALLY CONDUCTIVE ZINC OXIDE LAYER ON A SUBSTRATE AND THE REFERRED LAYER

Country Status (6)

Country Link
EP (1) EP0336574A1 (en)
JP (1) JPH01301515A (en)
KR (1) KR890016715A (en)
AU (1) AU609277B2 (en)
BR (1) BR8901586A (en)
GB (2) GB2216903A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2661623B1 (en) * 1989-04-04 1992-07-17 Commissariat Energie Atomique AEROSOL INJECTION SYSTEM FOR PREPARING COMPOSITE LAYERS BY PYROLYSIS.
US5190592A (en) * 1990-05-02 1993-03-02 Commissariat A L'energie Atomique Aerosol injection system for producing composite layers by pyrolysis
DE4304679C2 (en) * 1992-02-17 1996-03-21 Mitsubishi Electric Corp Process for producing a thin dielectric layer of an oxide system using the CVD process
DE19719162C2 (en) * 1997-05-06 2001-02-08 Fraunhofer Ges Forschung Process for producing an electrically conductive layer containing ZnO on a substrate
KR20010066533A (en) * 1999-12-31 2001-07-11 정종순 Vaporization method and equipment for preparation of stable vapor mixture for coating
JP4114060B2 (en) * 2003-02-06 2008-07-09 セイコーエプソン株式会社 Manufacturing method of light receiving element
US8354294B2 (en) * 2006-01-24 2013-01-15 De Rochemont L Pierre Liquid chemical deposition apparatus and process and products therefrom
WO2013038484A1 (en) * 2011-09-13 2013-03-21 東芝三菱電機産業システム株式会社 Oxide film deposition method and oxide film deposition device
US10544509B2 (en) * 2015-10-19 2020-01-28 Toshiba Mitsubishi-Electric Industrial Systems Corporation Film forming device

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB704793A (en) * 1951-04-11 1954-03-03 Pittsburgh Plate Glass Co Method of producing an electroconductive article
BE526755A (en) * 1953-02-24 1900-01-01
US2791521A (en) * 1953-04-02 1957-05-07 Gen Electric Electric resistance device provided with zinc oxide electroconductive coating
DE1496590C3 (en) * 1964-10-16 1973-10-31 N.V. Philips' Gloeilampenfabrieken, Eindhoven (Niederlande) Process for the production of warm reflective SnO deep 2 layers with reproducible optical and electrical properties on carriers
US4006378A (en) * 1975-10-01 1977-02-01 General Electric Company Optical coating with selectable transmittance characteristics and method of making the same
EP0045600B1 (en) * 1980-07-28 1984-10-10 Monsanto Company Improved method for producing semiconductor grade silicon
GB2131792A (en) * 1982-12-10 1984-06-27 Glaverbel Vitreous material bearing a multi-layer coating and method and apparatus for forming such coating
GB2139612B (en) * 1983-05-13 1987-03-11 Glaverbel Coating a hot vitreous substrate
WO1986006755A1 (en) * 1985-05-10 1986-11-20 General Electric Company Selective chemical vapor deposition method and apparatus

Also Published As

Publication number Publication date
GB8905797D0 (en) 1989-04-26
EP0336574A1 (en) 1989-10-11
KR890016715A (en) 1989-11-29
JPH01301515A (en) 1989-12-05
AU609277B2 (en) 1991-04-26
AU3245689A (en) 1989-10-19
GB8808036D0 (en) 1988-05-05
GB2216903A (en) 1989-10-18

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