GB2164203B - Electron beam focusing system for an electron microscope - Google Patents

Electron beam focusing system for an electron microscope

Info

Publication number
GB2164203B
GB2164203B GB8515311A GB8515311A GB2164203B GB 2164203 B GB2164203 B GB 2164203B GB 8515311 A GB8515311 A GB 8515311A GB 8515311 A GB8515311 A GB 8515311A GB 2164203 B GB2164203 B GB 2164203B
Authority
GB
United Kingdom
Prior art keywords
focusing system
electron
beam focusing
electron beam
electron microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8515311A
Other languages
English (en)
Other versions
GB8515311D0 (en
GB2164203A (en
Inventor
Takeshi Tomita
Yu Ishibashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Publication of GB8515311D0 publication Critical patent/GB8515311D0/en
Publication of GB2164203A publication Critical patent/GB2164203A/en
Application granted granted Critical
Publication of GB2164203B publication Critical patent/GB2164203B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/295—Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
GB8515311A 1984-06-16 1985-06-17 Electron beam focusing system for an electron microscope Expired GB2164203B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59123993A JPS614142A (ja) 1984-06-16 1984-06-16 電子顕微鏡

Publications (3)

Publication Number Publication Date
GB8515311D0 GB8515311D0 (en) 1985-07-17
GB2164203A GB2164203A (en) 1986-03-12
GB2164203B true GB2164203B (en) 1989-05-17

Family

ID=14874381

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8515311A Expired GB2164203B (en) 1984-06-16 1985-06-17 Electron beam focusing system for an electron microscope

Country Status (3)

Country Link
US (1) US4626689A (enExample)
JP (1) JPS614142A (enExample)
GB (1) GB2164203B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6119046A (ja) * 1984-07-04 1986-01-27 Hitachi Ltd 収束電子線回折用電子顕微鏡
JPH0815060B2 (ja) * 1985-06-12 1996-02-14 株式会社日立製作所 透過形電子顕微鏡
FR2605143B1 (fr) * 1986-10-14 1994-04-29 Thomson Csf Dispositif d'optique electronique, d'illumination et de limitation d'ouverture variables, et son application a un systeme de lithographie par faisceau d'electrons
JPH0793119B2 (ja) * 1988-06-17 1995-10-09 日本電子株式会社 電子顕微鏡
JPH0233843A (ja) * 1988-07-25 1990-02-05 Hitachi Ltd 走査電子顕微鏡
JP2685603B2 (ja) * 1989-10-20 1997-12-03 日本電子株式会社 電子線装置
JPH06215714A (ja) * 1992-06-05 1994-08-05 Hitachi Ltd 電界放出型透過電子顕微鏡
DE4243489A1 (de) * 1992-12-22 1994-06-23 Zeiss Carl Fa Verfahren zur Beleuchtung mit einem fokussierten Elektronenstrahl und zugehöriges elektronen-optisches Beleuchtungssystem
JP5438937B2 (ja) * 2008-09-05 2014-03-12 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
DE102009028013B9 (de) * 2009-07-24 2014-04-17 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät mit einer Blendeneinheit und Verfahren zur Einstellung eines Strahlstroms in einem Teilchenstrahlgerät
US8748817B2 (en) * 2010-07-27 2014-06-10 Vineet Kumar Orientation imaging using wide angle convergent beam diffraction in transmission electron microscopy
JP6595856B2 (ja) * 2015-09-07 2019-10-23 日本電子株式会社 荷電粒子装置および測定方法
CN119833376B (zh) * 2024-12-27 2025-10-10 东方晶源微电子科技(北京)股份有限公司 一种电子束流的调节方法、装置、设备、介质及产品

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3715582A (en) * 1970-02-13 1973-02-06 Hitachi Ltd Method of and apparatus for attaining focusing following variation in magnification in electron microscope
GB2005065A (en) * 1977-09-20 1979-04-11 Zeiss Stiftung Electron microscope or the like and method of use
GB2039139A (en) * 1978-12-01 1980-07-30 Hitachi Ltd Transmissions electron microscope
EP0068896A2 (en) * 1981-07-01 1983-01-05 Hitachi, Ltd. Image distortion-free, image rotation-free electron microscope

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2457092A (en) * 1945-04-17 1948-12-21 American Cyanamid Co Method and apparatus for producing electron diffraction spectra
JPS51124371A (en) * 1975-04-23 1976-10-29 Jeol Ltd Scanning type electron microscope and similar equipment provided with means for controlling opening angle of electron beam for irradiating s amples
JPS51138064U (enExample) * 1975-04-28 1976-11-08
DE2652273C2 (de) * 1976-11-12 1978-11-02 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur bildlichen Darstellung eines Beugungsbildes bei einem Durchstrahlungs-Raster-Korpuskularstrahlmikroskop
JPS55126951A (en) * 1979-03-23 1980-10-01 Hitachi Ltd Electron microscope
JPS55128243A (en) * 1979-03-28 1980-10-03 Hitachi Ltd Electron microscope
GB2118771B (en) * 1982-04-08 1987-03-25 Jeol Ltd Electron microscope
JPS60193248A (ja) * 1984-03-15 1985-10-01 Internatl Precision Inc 電子線装置の電子線照射方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3715582A (en) * 1970-02-13 1973-02-06 Hitachi Ltd Method of and apparatus for attaining focusing following variation in magnification in electron microscope
GB2005065A (en) * 1977-09-20 1979-04-11 Zeiss Stiftung Electron microscope or the like and method of use
GB2039139A (en) * 1978-12-01 1980-07-30 Hitachi Ltd Transmissions electron microscope
EP0068896A2 (en) * 1981-07-01 1983-01-05 Hitachi, Ltd. Image distortion-free, image rotation-free electron microscope

Also Published As

Publication number Publication date
JPS614142A (ja) 1986-01-10
JPH041459B2 (enExample) 1992-01-13
GB8515311D0 (en) 1985-07-17
US4626689A (en) 1986-12-02
GB2164203A (en) 1986-03-12

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20000617