GB2149201B - Electron beam vaporiser deflection system - Google Patents
Electron beam vaporiser deflection systemInfo
- Publication number
- GB2149201B GB2149201B GB08423997A GB8423997A GB2149201B GB 2149201 B GB2149201 B GB 2149201B GB 08423997 A GB08423997 A GB 08423997A GB 8423997 A GB8423997 A GB 8423997A GB 2149201 B GB2149201 B GB 2149201B
- Authority
- GB
- United Kingdom
- Prior art keywords
- electron beam
- deflection system
- vaporiser
- beam vaporiser
- deflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
- H01J37/1475—Scanning means magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833339131 DE3339131A1 (de) | 1983-10-28 | 1983-10-28 | Elektronenstrahlverdampfer mit mindestens zwei magnetischen ablenksystemen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB8423997D0 GB8423997D0 (en) | 1984-10-31 |
| GB2149201A GB2149201A (en) | 1985-06-05 |
| GB2149201B true GB2149201B (en) | 1987-03-04 |
Family
ID=6212954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB08423997A Expired GB2149201B (en) | 1983-10-28 | 1984-09-21 | Electron beam vaporiser deflection system |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4611330A (OSRAM) |
| JP (1) | JPS60175355A (OSRAM) |
| CH (1) | CH661288A5 (OSRAM) |
| DE (1) | DE3339131A1 (OSRAM) |
| FR (1) | FR2554969B1 (OSRAM) |
| GB (1) | GB2149201B (OSRAM) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4863581A (en) * | 1987-02-12 | 1989-09-05 | Kawasaki Steel Corp. | Hollow cathode gun and deposition device for ion plating process |
| NL9001751A (nl) * | 1990-08-02 | 1992-03-02 | Philips Nv | Geladen deeltjesbundelsysteem alsmede een koelinrichting, een spoel voorzien van een koelorgaan en een koelorgaan voor toepassing in een dergelijk geladen deeltjesbundelsysteem. |
| DE19745771B4 (de) | 1997-10-16 | 2005-12-22 | Unaxis Deutschland Holding Gmbh | Verfahren für den Betrieb eines Hochleistungs-Elektronenstrahls |
| CN201864770U (zh) * | 2010-11-22 | 2011-06-15 | 江苏淘镜有限公司 | 电子枪蒸发用坩埚 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1248175B (de) * | 1961-08-31 | 1967-08-24 | Heraeus Gmbh W C | Elektronenstrahlerzeugungssystem |
| US3497602A (en) * | 1966-12-16 | 1970-02-24 | Air Reduction | Apparatus for producing and directing an electron beam in an electron beam furnace |
| US3535428A (en) * | 1968-07-17 | 1970-10-20 | Air Reduction | Apparatus for producing and directing an electron beam |
| US3582529A (en) * | 1969-09-24 | 1971-06-01 | Air Reduction | Electron beam heating apparatus and control system therein |
| US3896258A (en) * | 1973-09-04 | 1975-07-22 | Charles W Hanks | Electron beam gun system |
| IT1037702B (it) * | 1975-04-29 | 1979-11-20 | Varian Associates | Apparecchiatura di rescaldamento e o di evaporazione a fascio elettronico |
| SU705699A2 (ru) * | 1976-05-03 | 1979-12-25 | Орденов Ленина И Трудового Красного Знамени Институт Электросварки Им. Е.О.Патона | Установка дл электроннолучевого нагрева материалов |
| DE2812285C2 (de) * | 1978-03-21 | 1986-05-15 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren zum Verdampfen von Legierungsschmelzen aus Metallen mit voneinander abweichenden Dampfdrücken |
-
1983
- 1983-10-28 DE DE19833339131 patent/DE3339131A1/de active Granted
-
1984
- 1984-09-21 CH CH4536/84A patent/CH661288A5/de not_active IP Right Cessation
- 1984-09-21 GB GB08423997A patent/GB2149201B/en not_active Expired
- 1984-10-26 FR FR848416435A patent/FR2554969B1/fr not_active Expired
- 1984-10-26 US US06/665,299 patent/US4611330A/en not_active Expired - Fee Related
- 1984-10-29 JP JP59226034A patent/JPS60175355A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| FR2554969A1 (fr) | 1985-05-17 |
| DE3339131C2 (OSRAM) | 1990-09-06 |
| DE3339131A1 (de) | 1985-05-09 |
| GB2149201A (en) | 1985-06-05 |
| CH661288A5 (de) | 1987-07-15 |
| US4611330A (en) | 1986-09-09 |
| FR2554969B1 (fr) | 1989-01-27 |
| GB8423997D0 (en) | 1984-10-31 |
| JPH0524616B2 (OSRAM) | 1993-04-08 |
| JPS60175355A (ja) | 1985-09-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19930921 |