GB2106314A - Infra-red radiation imaging devices - Google Patents
Infra-red radiation imaging devices Download PDFInfo
- Publication number
- GB2106314A GB2106314A GB08128310A GB8128310A GB2106314A GB 2106314 A GB2106314 A GB 2106314A GB 08128310 A GB08128310 A GB 08128310A GB 8128310 A GB8128310 A GB 8128310A GB 2106314 A GB2106314 A GB 2106314A
- Authority
- GB
- United Kingdom
- Prior art keywords
- radiation
- charge
- semiconductor layer
- infra
- carriers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000005855 radiation Effects 0.000 title claims description 88
- 238000003384 imaging method Methods 0.000 title claims description 23
- 239000004065 semiconductor Substances 0.000 claims description 37
- 239000002800 charge carrier Substances 0.000 claims description 25
- 229910052710 silicon Inorganic materials 0.000 claims description 17
- 239000010703 silicon Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 12
- 230000015556 catabolic process Effects 0.000 claims description 11
- 238000010521 absorption reaction Methods 0.000 claims description 7
- 230000005284 excitation Effects 0.000 claims description 6
- 230000004888 barrier function Effects 0.000 claims description 4
- 238000005452 bending Methods 0.000 claims description 4
- 230000007704 transition Effects 0.000 claims description 4
- 230000000779 depleting effect Effects 0.000 claims description 3
- 230000005684 electric field Effects 0.000 claims description 2
- 238000001514 detection method Methods 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 16
- 230000008901 benefit Effects 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005036 potential barrier Methods 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/15—Charge-coupled device [CCD] image sensors
- H10F39/157—CCD or CID infrared image sensors
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB08128310A GB2106314A (en) | 1981-09-18 | 1981-09-18 | Infra-red radiation imaging devices |
| IL66805A IL66805A (en) | 1981-09-18 | 1982-09-15 | Infra-red radiation c.c.d.imaging device |
| DE8282201146T DE3277791D1 (en) | 1981-09-18 | 1982-09-16 | Infra-red radiation imaging devices |
| EP82201146A EP0075367B1 (en) | 1981-09-18 | 1982-09-16 | Infra-red radiation imaging devices |
| JP57161126A JPS5862982A (ja) | 1981-09-18 | 1982-09-17 | 赤外線撮像装置 |
| US06/625,413 US4561005A (en) | 1981-09-18 | 1984-06-28 | Solid-state infrared radiation imaging devices having a radiation-sensitive portion with a superlattice structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB08128310A GB2106314A (en) | 1981-09-18 | 1981-09-18 | Infra-red radiation imaging devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB2106314A true GB2106314A (en) | 1983-04-07 |
Family
ID=10524601
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB08128310A Withdrawn GB2106314A (en) | 1981-09-18 | 1981-09-18 | Infra-red radiation imaging devices |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4561005A (cg-RX-API-DMAC10.html) |
| EP (1) | EP0075367B1 (cg-RX-API-DMAC10.html) |
| JP (1) | JPS5862982A (cg-RX-API-DMAC10.html) |
| DE (1) | DE3277791D1 (cg-RX-API-DMAC10.html) |
| GB (1) | GB2106314A (cg-RX-API-DMAC10.html) |
| IL (1) | IL66805A (cg-RX-API-DMAC10.html) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4504518A (en) * | 1982-09-24 | 1985-03-12 | Energy Conversion Devices, Inc. | Method of making amorphous semiconductor alloys and devices using microwave energy |
| JPS61241985A (ja) * | 1985-04-19 | 1986-10-28 | Eizo Yamaga | 赤外線検知装置 |
| US4843439A (en) * | 1985-08-28 | 1989-06-27 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Tailorable infrared sensing device with strain layer superlattice structure |
| US5001530A (en) * | 1985-09-04 | 1991-03-19 | Unisearch Limited | Infrared Schottky junction charge coupled device |
| US4720444A (en) * | 1986-07-31 | 1988-01-19 | Xerox Corporation | Layered amorphous silicon alloy photoconductive electrostatographic imaging members with p, n multijunctions |
| US4711857A (en) * | 1986-08-28 | 1987-12-08 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Tailorable infrared sensing device with strain layer superlattice structure |
| US4894526A (en) * | 1987-01-15 | 1990-01-16 | American Telephone And Telegraph Company, At&T Bell Laboratories | Infrared-radiation detector device |
| US4857971A (en) * | 1987-03-23 | 1989-08-15 | Xerox Corporation | (IV)x (III-V)1-x alloys formed in situ in III-V heterostructures |
| DE3710986A1 (de) * | 1987-04-01 | 1988-10-20 | Messerschmitt Boelkow Blohm | Lichtempfindliche detektorvorrichtung |
| US5105248A (en) * | 1987-05-14 | 1992-04-14 | Massachusetts Institute Of Technology | Spatial light modulator using charge coupled device with quantum wells |
| US4860074A (en) * | 1987-11-05 | 1989-08-22 | The United States Of America As Represented By The Administrator, National Aeronautics And Space Administration | Alternating gradient photodetector |
| US4817102A (en) * | 1988-04-18 | 1989-03-28 | Maurer Larry D | Acousto-electromagnetic hologistic resonant system |
| US4873439A (en) * | 1988-06-27 | 1989-10-10 | Massachusetts Institute Of Technology | X-ray detector |
| JP2758472B2 (ja) * | 1990-01-11 | 1998-05-28 | 三菱電機株式会社 | 光変調器 |
| US6890834B2 (en) * | 2001-06-11 | 2005-05-10 | Matsushita Electric Industrial Co., Ltd. | Electronic device and method for manufacturing the same |
| GB0330134D0 (en) * | 2003-12-30 | 2004-02-04 | Univ Liverpool | Charge coupled device |
| FI20070264L (fi) * | 2007-04-04 | 2008-10-05 | Suinno Oy | Aktiivinen aurinkokenno ja valmistusmenetelmä |
| FR2945668B1 (fr) * | 2009-05-14 | 2011-12-16 | Commissariat Energie Atomique | Capteur d'image pour imagerie a tres bas niveau de lumiere. |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3626328A (en) * | 1969-04-01 | 1971-12-07 | Ibm | Semiconductor bulk oscillator |
| US3626257A (en) * | 1969-04-01 | 1971-12-07 | Ibm | Semiconductor device with superlattice region |
| DE2261527C2 (de) * | 1972-12-15 | 1983-04-21 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen | Halbleiterkörper mit in einer vorgegebenen Richtung abwechselnd aufeinanderfolgenden n- und p-dotierten Zonen, Verfahren zu seiner Herstellung und Verwendungen des Halbleiterkörpers |
| US4210922A (en) * | 1975-11-28 | 1980-07-01 | U.S. Philips Corporation | Charge coupled imaging device having selective wavelength sensitivity |
| GB1532859A (en) * | 1976-03-30 | 1978-11-22 | Mullard Ltd | Charge coupled circuit arrangements and devices |
| US4142198A (en) * | 1976-07-06 | 1979-02-27 | Hughes Aircraft Company | Monolithic extrinsic silicon infrared detectors with an improved charge collection structure |
| US4137542A (en) * | 1977-04-20 | 1979-01-30 | International Business Machines Corporation | Semiconductor structure |
| GB1579291A (en) * | 1978-01-17 | 1980-11-19 | Plessey Co Ltd | Photodiode image sensor |
| US4348686A (en) * | 1980-07-28 | 1982-09-07 | The United States Of America As Represented By The Secretary Of The Army | Microwave-infrared detector with semiconductor superlattice region |
-
1981
- 1981-09-18 GB GB08128310A patent/GB2106314A/en not_active Withdrawn
-
1982
- 1982-09-15 IL IL66805A patent/IL66805A/xx unknown
- 1982-09-16 EP EP82201146A patent/EP0075367B1/en not_active Expired
- 1982-09-16 DE DE8282201146T patent/DE3277791D1/de not_active Expired
- 1982-09-17 JP JP57161126A patent/JPS5862982A/ja active Granted
-
1984
- 1984-06-28 US US06/625,413 patent/US4561005A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE3277791D1 (en) | 1988-01-14 |
| IL66805A (en) | 1985-08-30 |
| EP0075367A3 (en) | 1985-05-15 |
| JPS5862982A (ja) | 1983-04-14 |
| EP0075367B1 (en) | 1987-12-02 |
| IL66805A0 (en) | 1982-12-31 |
| US4561005A (en) | 1985-12-24 |
| EP0075367A2 (en) | 1983-03-30 |
| JPH0241180B2 (cg-RX-API-DMAC10.html) | 1990-09-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |