GB1536763A - Manufacture of semiconductor body - Google Patents

Manufacture of semiconductor body

Info

Publication number
GB1536763A
GB1536763A GB1538576A GB1538576A GB1536763A GB 1536763 A GB1536763 A GB 1536763A GB 1538576 A GB1538576 A GB 1538576A GB 1538576 A GB1538576 A GB 1538576A GB 1536763 A GB1536763 A GB 1536763A
Authority
GB
United Kingdom
Prior art keywords
coating
tool
etchant
april
projections
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1538576A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Micronas GmbH
ITT Inc
Original Assignee
Deutsche ITT Industries GmbH
ITT Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deutsche ITT Industries GmbH, ITT Industries Inc filed Critical Deutsche ITT Industries GmbH
Publication of GB1536763A publication Critical patent/GB1536763A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/31051—Planarisation of the insulating layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Weting (AREA)

Abstract

1536763 Processing semiconductors ITT INDUSTRIES Inc 14 April 1976 [18 April 1975] 15385/76 Heading H1K Unwanted spike-like projections which form during epitaxial deposition of a semiconductor layer 1 on a substrate 6 (Fig. 3) are removed by covering the surface with a thin coating 2, e.g. of thermal oxide affording mechanical protection, traversing a shearing tool 4 across the coating to break off the projections and treating with an etchant to remove damaged semiconductor material. As described the semiconductor is silicon and the tool may also be of pure silicon or be of or tipped with a hard plastics material. The substrate is preferably rotated on a turntable beneath the tool. If the etchant also acts on the protective coating treatment is continued to remove this, otherwise the coating is removed in a separate etching step.
GB1538576A 1975-04-18 1976-04-14 Manufacture of semiconductor body Expired GB1536763A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752517159 DE2517159B2 (en) 1975-04-18 1975-04-18 METHOD OF ELIMINATING CRYSTAL DEFAULTS FROM EPITACTIC SEMICONDUCTOR LAYERS

Publications (1)

Publication Number Publication Date
GB1536763A true GB1536763A (en) 1978-12-20

Family

ID=5944351

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1538576A Expired GB1536763A (en) 1975-04-18 1976-04-14 Manufacture of semiconductor body

Country Status (2)

Country Link
DE (1) DE2517159B2 (en)
GB (1) GB1536763A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5612723A (en) * 1979-07-11 1981-02-07 Fujitsu Ltd Manufacture of semiconductor device
DE3524765A1 (en) * 1985-07-11 1987-01-22 Licentia Gmbh METHOD FOR PRODUCING A TRANSPARENT PHOTOCATHOD

Also Published As

Publication number Publication date
DE2517159A1 (en) 1976-10-28
DE2517159B2 (en) 1977-02-17

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee