GB1525757A - Light-sensitive printing material - Google Patents
Light-sensitive printing materialInfo
- Publication number
- GB1525757A GB1525757A GB43385/75A GB4338575A GB1525757A GB 1525757 A GB1525757 A GB 1525757A GB 43385/75 A GB43385/75 A GB 43385/75A GB 4338575 A GB4338575 A GB 4338575A GB 1525757 A GB1525757 A GB 1525757A
- Authority
- GB
- United Kingdom
- Prior art keywords
- light
- water
- polymer
- sensitive
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title abstract 3
- 239000000049 pigment Substances 0.000 abstract 3
- 229920000642 polymer Polymers 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- LBSXSAXOLABXMF-UHFFFAOYSA-N 4-Vinylaniline Chemical compound NC1=CC=C(C=C)C=C1 LBSXSAXOLABXMF-UHFFFAOYSA-N 0.000 abstract 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 abstract 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 1
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract 1
- 125000003368 amide group Chemical group 0.000 abstract 1
- 239000006229 carbon black Substances 0.000 abstract 1
- 239000012954 diazonium Substances 0.000 abstract 1
- 150000001989 diazonium salts Chemical class 0.000 abstract 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 abstract 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 abstract 1
- 235000013980 iron oxide Nutrition 0.000 abstract 1
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 abstract 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 abstract 1
- 229920006112 polar polymer Polymers 0.000 abstract 1
- 229920000307 polymer substrate Polymers 0.000 abstract 1
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
- 230000008961 swelling Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/795—Photosensitive materials characterised by the base or auxiliary layers the base being of macromolecular substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7413844A NL7413844A (nl) | 1974-10-23 | 1974-10-23 | Lithografische kopieerfilm. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1525757A true GB1525757A (en) | 1978-09-20 |
Family
ID=19822318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB43385/75A Expired GB1525757A (en) | 1974-10-23 | 1975-10-22 | Light-sensitive printing material |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5166002A (enrdf_load_stackoverflow) |
| DE (1) | DE2547335A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2288994A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1525757A (enrdf_load_stackoverflow) |
| NL (1) | NL7413844A (enrdf_load_stackoverflow) |
| SE (1) | SE7511027L (enrdf_load_stackoverflow) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1982001085A1 (en) * | 1980-09-15 | 1982-04-01 | Systems Inc Napp | Bilayer photosensitive imaging article |
| US4472494A (en) * | 1980-09-15 | 1984-09-18 | Napp Systems (Usa), Inc. | Bilayer photosensitive imaging article |
| US4511640A (en) * | 1983-08-25 | 1985-04-16 | American Hoechst Corporation | Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer |
| EP0151191A1 (de) * | 1984-01-25 | 1985-08-14 | American Hoechst Corporation | Lichtempfindliches Material zur Herstellung von Kopiervorlagen |
| US4564589A (en) * | 1984-02-06 | 1986-01-14 | Advanced Imaging Systems Ltd. | Image-forming composite with film |
| US4618562A (en) * | 1984-12-27 | 1986-10-21 | American Hoechst Corporation | Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor |
| US4729935A (en) * | 1982-03-18 | 1988-03-08 | Hoechst Celanese Corporation | Process for the production of photographic images utilizing a negative working diazo contact film |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5837639A (ja) * | 1981-07-31 | 1983-03-04 | Konishiroku Photo Ind Co Ltd | 画像形成材料 |
-
1974
- 1974-10-23 NL NL7413844A patent/NL7413844A/xx not_active Application Discontinuation
-
1975
- 1975-10-01 SE SE7511027A patent/SE7511027L/xx unknown
- 1975-10-09 JP JP50122394A patent/JPS5166002A/ja active Pending
- 1975-10-21 FR FR7532134A patent/FR2288994A1/fr not_active Withdrawn
- 1975-10-22 GB GB43385/75A patent/GB1525757A/en not_active Expired
- 1975-10-22 DE DE19752547335 patent/DE2547335A1/de active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1982001085A1 (en) * | 1980-09-15 | 1982-04-01 | Systems Inc Napp | Bilayer photosensitive imaging article |
| JPS57501497A (enrdf_load_stackoverflow) * | 1980-09-15 | 1982-08-19 | ||
| US4472494A (en) * | 1980-09-15 | 1984-09-18 | Napp Systems (Usa), Inc. | Bilayer photosensitive imaging article |
| US4729935A (en) * | 1982-03-18 | 1988-03-08 | Hoechst Celanese Corporation | Process for the production of photographic images utilizing a negative working diazo contact film |
| US4511640A (en) * | 1983-08-25 | 1985-04-16 | American Hoechst Corporation | Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer |
| EP0151191A1 (de) * | 1984-01-25 | 1985-08-14 | American Hoechst Corporation | Lichtempfindliches Material zur Herstellung von Kopiervorlagen |
| US4564589A (en) * | 1984-02-06 | 1986-01-14 | Advanced Imaging Systems Ltd. | Image-forming composite with film |
| US4618562A (en) * | 1984-12-27 | 1986-10-21 | American Hoechst Corporation | Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2547335A1 (de) | 1976-04-29 |
| SE7511027L (sv) | 1976-04-26 |
| NL7413844A (nl) | 1976-04-27 |
| FR2288994A1 (fr) | 1976-05-21 |
| JPS5166002A (enrdf_load_stackoverflow) | 1976-06-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |