GB1494043A - Photosensitive lithographic printing plate precursors - Google Patents
Photosensitive lithographic printing plate precursorsInfo
- Publication number
- GB1494043A GB1494043A GB7230/75A GB723075A GB1494043A GB 1494043 A GB1494043 A GB 1494043A GB 7230/75 A GB7230/75 A GB 7230/75A GB 723075 A GB723075 A GB 723075A GB 1494043 A GB1494043 A GB 1494043A
- Authority
- GB
- United Kingdom
- Prior art keywords
- photo
- sensitive
- layer
- printing plate
- styrene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002243 precursor Substances 0.000 title abstract 3
- 229920005989 resin Polymers 0.000 abstract 5
- 239000011347 resin Substances 0.000 abstract 5
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 abstract 3
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 abstract 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical group OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 abstract 1
- 229920001800 Shellac Polymers 0.000 abstract 1
- 235000010724 Wisteria floribunda Nutrition 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 230000001680 brushing effect Effects 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 229930003836 cresol Natural products 0.000 abstract 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 1
- 239000000975 dye Substances 0.000 abstract 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 150000002895 organic esters Chemical class 0.000 abstract 1
- 125000004430 oxygen atom Chemical group O* 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 239000004014 plasticizer Substances 0.000 abstract 1
- 239000004208 shellac Substances 0.000 abstract 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 abstract 1
- 229940113147 shellac Drugs 0.000 abstract 1
- 235000013874 shellac Nutrition 0.000 abstract 1
- 150000003440 styrenes Chemical group 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F112/02—Monomers containing only one unsaturated aliphatic radical
- C08F112/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F112/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
- C08F112/22—Oxygen
- C08F112/24—Phenols or alcohols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Emergency Medicine (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49020925A JPS5236043B2 (enrdf_load_stackoverflow) | 1974-02-21 | 1974-02-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1494043A true GB1494043A (en) | 1977-12-07 |
Family
ID=12040784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB7230/75A Expired GB1494043A (en) | 1974-02-21 | 1975-02-20 | Photosensitive lithographic printing plate precursors |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5236043B2 (enrdf_load_stackoverflow) |
| CA (1) | CA1061156A (enrdf_load_stackoverflow) |
| DE (1) | DE2507548C2 (enrdf_load_stackoverflow) |
| FR (1) | FR2262329B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1494043A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0713143A2 (en) | 1994-11-18 | 1996-05-22 | Fuji Photo Film Co., Ltd. | Photosensitive planographic printing plate |
| EP0780730A2 (en) | 1995-12-22 | 1997-06-25 | Fuji Photo Film Co., Ltd. | Positive-type light-sensitive lithographic printing plate |
| EP1111467A1 (en) * | 1999-12-22 | 2001-06-27 | Kodak Polychrome Graphics Company Ltd. | Chemical resistant underlayer for positive-working printing plates |
| CN112650023A (zh) * | 2020-12-23 | 2021-04-13 | 阜阳申邦新材料技术有限公司 | 一种高分辨率光刻胶组合物及其应用 |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4439516A (en) * | 1982-03-15 | 1984-03-27 | Shipley Company Inc. | High temperature positive diazo photoresist processing using polyvinyl phenol |
| JPS62227143A (ja) * | 1986-03-28 | 1987-10-06 | Toshiba Corp | 感光性組成物 |
| FR2648468B1 (fr) * | 1989-05-30 | 1992-12-04 | Commissariat Energie Atomique | Composition de resine sensible aux rayonnements uv et aux electrons |
| JP2567282B2 (ja) * | 1989-10-02 | 1996-12-25 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
| DE4106356A1 (de) * | 1991-02-28 | 1992-09-03 | Hoechst Ag | Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial |
| KR100363695B1 (ko) * | 1998-12-31 | 2003-04-11 | 주식회사 하이닉스반도체 | 유기난반사방지중합체및그의제조방법 |
| EP1884372B1 (en) | 2006-08-03 | 2009-10-21 | Agfa Graphics N.V. | A lithographic printing plate support |
| EP2065211B1 (en) | 2007-11-30 | 2010-05-26 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
| EP2098376B1 (en) | 2008-03-04 | 2013-09-18 | Agfa Graphics N.V. | A method for making a lithographic printing plate support |
| ES2365885T3 (es) | 2008-03-31 | 2011-10-13 | Agfa Graphics N.V. | Un método para tratar una plancha de impresión litográfica. |
| EP3032334B1 (en) | 2014-12-08 | 2017-10-18 | Agfa Graphics Nv | A system for reducing ablation debris |
| AU2017234830A1 (en) | 2016-03-16 | 2018-07-19 | Agfa Nv | Method for processing a lithographic printing plate |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1375461A (enrdf_load_stackoverflow) * | 1972-05-05 | 1974-11-27 |
-
1974
- 1974-02-21 JP JP49020925A patent/JPS5236043B2/ja not_active Expired
-
1975
- 1975-02-20 FR FR7505313A patent/FR2262329B1/fr not_active Expired
- 1975-02-20 GB GB7230/75A patent/GB1494043A/en not_active Expired
- 1975-02-21 DE DE2507548A patent/DE2507548C2/de not_active Expired
- 1975-02-21 CA CA220,777A patent/CA1061156A/en not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0713143A2 (en) | 1994-11-18 | 1996-05-22 | Fuji Photo Film Co., Ltd. | Photosensitive planographic printing plate |
| EP0780730A2 (en) | 1995-12-22 | 1997-06-25 | Fuji Photo Film Co., Ltd. | Positive-type light-sensitive lithographic printing plate |
| EP1111467A1 (en) * | 1999-12-22 | 2001-06-27 | Kodak Polychrome Graphics Company Ltd. | Chemical resistant underlayer for positive-working printing plates |
| US6528228B2 (en) | 1999-12-22 | 2003-03-04 | Kodak Polychrome Graphics, Llc | Chemical resistant underlayer for positive-working printing plates |
| CN112650023A (zh) * | 2020-12-23 | 2021-04-13 | 阜阳申邦新材料技术有限公司 | 一种高分辨率光刻胶组合物及其应用 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5236043B2 (enrdf_load_stackoverflow) | 1977-09-13 |
| JPS50113305A (enrdf_load_stackoverflow) | 1975-09-05 |
| DE2507548A1 (de) | 1975-09-04 |
| CA1061156A (en) | 1979-08-28 |
| FR2262329A1 (enrdf_load_stackoverflow) | 1975-09-19 |
| DE2507548C2 (de) | 1984-10-11 |
| FR2262329B1 (enrdf_load_stackoverflow) | 1977-04-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1494043A (en) | Photosensitive lithographic printing plate precursors | |
| US3669658A (en) | Photosensitive printing plate | |
| US3785825A (en) | Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate | |
| EP0035028B1 (en) | Single sheet color proofing diazo oxide system | |
| US4334006A (en) | Peel-apart process for forming relief images | |
| US3890152A (en) | Light-sensitive copying composition containing diazo resin and quinone diazide | |
| AU650697B2 (en) | Photosensitive polymeric printing medium and water developable printing plates | |
| GB919671A (en) | Improvements in or relating to the production of printing elements by photographic means | |
| GB1493833A (en) | Photosensitive films | |
| GB1187980A (en) | Presensitised Lithographic Plates. | |
| GB1494640A (en) | Image-forming on light-sensitive element containing a quinone diazide | |
| JPH04247458A (ja) | 湿し水不要感光性平版印刷版 | |
| US5017462A (en) | Process of producing negative relief copies utilizing photosensitive copying material with thermal hardening triazine compound | |
| JPH024260A (ja) | 放射線感応性記録材料及び画像の形成法 | |
| US4299893A (en) | Photosensitive article for making visual aids with diazonium compounds and liquid epoxy resin | |
| CA1104867A (en) | Photosensitive recording material with a layer container nitrone in an alkali soluble polymer and a subadjacent metallic imaging layer | |
| JPS5680046A (en) | Lithographic plate requiring no dampening water and its manufacture | |
| ES8207357A1 (es) | Un procedimiento para preparar un aducto fotosensible. | |
| US3650754A (en) | Photoresist compositions containing limed rosin and photoactinator | |
| GB1350521A (en) | Light-sensitive compositions for presensitized printing plates | |
| FR2253772A1 (en) | Photopolymerisable maleic anhydride (co)polymers - soluble in alkaline medium, for prepn. of photoresist etc. | |
| US1911955A (en) | Phototransfer process | |
| GB2020836A (en) | Dry Processable Lithographic Printing Plate | |
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| GB793550A (en) | Improvements in or relating to photolithography |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |