JPS5236043B2 - - Google Patents

Info

Publication number
JPS5236043B2
JPS5236043B2 JP49020925A JP2092574A JPS5236043B2 JP S5236043 B2 JPS5236043 B2 JP S5236043B2 JP 49020925 A JP49020925 A JP 49020925A JP 2092574 A JP2092574 A JP 2092574A JP S5236043 B2 JPS5236043 B2 JP S5236043B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49020925A
Other languages
Japanese (ja)
Other versions
JPS50113305A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP49020925A priority Critical patent/JPS5236043B2/ja
Priority to FR7505313A priority patent/FR2262329B1/fr
Priority to GB7230/75A priority patent/GB1494043A/en
Priority to DE2507548A priority patent/DE2507548C2/de
Priority to CA220,777A priority patent/CA1061156A/en
Publication of JPS50113305A publication Critical patent/JPS50113305A/ja
Priority to US05/789,587 priority patent/US4139384A/en
Publication of JPS5236043B2 publication Critical patent/JPS5236043B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F112/02—Monomers containing only one unsaturated aliphatic radical
    • C08F112/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F112/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F112/22—Oxygen
    • C08F112/24—Phenols or alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Emergency Medicine (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP49020925A 1974-02-21 1974-02-21 Expired JPS5236043B2 (enrdf_load_stackoverflow)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP49020925A JPS5236043B2 (enrdf_load_stackoverflow) 1974-02-21 1974-02-21
FR7505313A FR2262329B1 (enrdf_load_stackoverflow) 1974-02-21 1975-02-20
GB7230/75A GB1494043A (en) 1974-02-21 1975-02-20 Photosensitive lithographic printing plate precursors
DE2507548A DE2507548C2 (de) 1974-02-21 1975-02-21 Vorsensibilisierte lithographische Druckplatte und deren Verwendung zur Erzeugung von Bildern
CA220,777A CA1061156A (en) 1974-02-21 1975-02-21 Lithographic plate with layer of photosensitive diazo-oxide resin
US05/789,587 US4139384A (en) 1974-02-21 1977-04-21 Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49020925A JPS5236043B2 (enrdf_load_stackoverflow) 1974-02-21 1974-02-21

Publications (2)

Publication Number Publication Date
JPS50113305A JPS50113305A (enrdf_load_stackoverflow) 1975-09-05
JPS5236043B2 true JPS5236043B2 (enrdf_load_stackoverflow) 1977-09-13

Family

ID=12040784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49020925A Expired JPS5236043B2 (enrdf_load_stackoverflow) 1974-02-21 1974-02-21

Country Status (5)

Country Link
JP (1) JPS5236043B2 (enrdf_load_stackoverflow)
CA (1) CA1061156A (enrdf_load_stackoverflow)
DE (1) DE2507548C2 (enrdf_load_stackoverflow)
FR (1) FR2262329B1 (enrdf_load_stackoverflow)
GB (1) GB1494043A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2523324A1 (fr) * 1982-03-15 1983-09-16 Shipley Co Composition pour reserve photochimique contenant un sensibilisateur diazo et une resine de polyvinylphenol et ses applications

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62227143A (ja) * 1986-03-28 1987-10-06 Toshiba Corp 感光性組成物
FR2648468B1 (fr) * 1989-05-30 1992-12-04 Commissariat Energie Atomique Composition de resine sensible aux rayonnements uv et aux electrons
JP2567282B2 (ja) * 1989-10-02 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
DE4106356A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
JP3506295B2 (ja) 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
KR100363695B1 (ko) * 1998-12-31 2003-04-11 주식회사 하이닉스반도체 유기난반사방지중합체및그의제조방법
US6528228B2 (en) * 1999-12-22 2003-03-04 Kodak Polychrome Graphics, Llc Chemical resistant underlayer for positive-working printing plates
EP1884372B1 (en) 2006-08-03 2009-10-21 Agfa Graphics N.V. A lithographic printing plate support
EP2065211B1 (en) 2007-11-30 2010-05-26 Agfa Graphics N.V. A method for treating a lithographic printing plate
EP2098376B1 (en) 2008-03-04 2013-09-18 Agfa Graphics N.V. A method for making a lithographic printing plate support
ES2365885T3 (es) 2008-03-31 2011-10-13 Agfa Graphics N.V. Un método para tratar una plancha de impresión litográfica.
EP3032334B1 (en) 2014-12-08 2017-10-18 Agfa Graphics Nv A system for reducing ablation debris
AU2017234830A1 (en) 2016-03-16 2018-07-19 Agfa Nv Method for processing a lithographic printing plate
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
CN112650023B (zh) * 2020-12-23 2023-07-14 上海彤程电子材料有限公司 一种高分辨率光刻胶组合物及其应用

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (enrdf_load_stackoverflow) * 1972-05-05 1974-11-27

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2523324A1 (fr) * 1982-03-15 1983-09-16 Shipley Co Composition pour reserve photochimique contenant un sensibilisateur diazo et une resine de polyvinylphenol et ses applications

Also Published As

Publication number Publication date
JPS50113305A (enrdf_load_stackoverflow) 1975-09-05
DE2507548A1 (de) 1975-09-04
CA1061156A (en) 1979-08-28
FR2262329A1 (enrdf_load_stackoverflow) 1975-09-19
DE2507548C2 (de) 1984-10-11
FR2262329B1 (enrdf_load_stackoverflow) 1977-04-15
GB1494043A (en) 1977-12-07

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