GB1493833A - Photosensitive films - Google Patents

Photosensitive films

Info

Publication number
GB1493833A
GB1493833A GB45826/74A GB4582674A GB1493833A GB 1493833 A GB1493833 A GB 1493833A GB 45826/74 A GB45826/74 A GB 45826/74A GB 4582674 A GB4582674 A GB 4582674A GB 1493833 A GB1493833 A GB 1493833A
Authority
GB
United Kingdom
Prior art keywords
photo
sensitive
layer
oct
polyester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB45826/74A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Publication of GB1493833A publication Critical patent/GB1493833A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0577—Double layer of resist having the same pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0585—Second resist used as mask for selective stripping of first resist

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
GB45826/74A 1973-10-25 1974-10-23 Photosensitive films Expired GB1493833A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40964673A 1973-10-25 1973-10-25

Publications (1)

Publication Number Publication Date
GB1493833A true GB1493833A (en) 1977-11-30

Family

ID=23621393

Family Applications (2)

Application Number Title Priority Date Filing Date
GB45826/74A Expired GB1493833A (en) 1973-10-25 1974-10-23 Photosensitive films
GB30114/77A Expired GB1493834A (en) 1973-10-25 1974-10-23 Method of making a printed circuit

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB30114/77A Expired GB1493834A (en) 1973-10-25 1974-10-23 Method of making a printed circuit

Country Status (13)

Country Link
JP (1) JPS5529426B2 (enrdf_load_stackoverflow)
AU (1) AU466665B2 (enrdf_load_stackoverflow)
BE (1) BE821421A (enrdf_load_stackoverflow)
BR (1) BR7408768D0 (enrdf_load_stackoverflow)
CA (1) CA1051707A (enrdf_load_stackoverflow)
DE (1) DE2450380C2 (enrdf_load_stackoverflow)
ES (2) ES431310A1 (enrdf_load_stackoverflow)
FR (1) FR2249364B1 (enrdf_load_stackoverflow)
GB (2) GB1493833A (enrdf_load_stackoverflow)
IT (1) IT1025144B (enrdf_load_stackoverflow)
NL (1) NL7413916A (enrdf_load_stackoverflow)
SE (1) SE422631B (enrdf_load_stackoverflow)
ZA (1) ZA746683B (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0091651A3 (en) * 1982-04-12 1984-10-17 Nippon Telegraph And Telephone Public Corporation Method for forming micropattern
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
EP0110145A3 (en) * 1982-11-01 1986-06-11 E.I. Du Pont De Nemours And Company Single exposure positive contact litho film
US4672020A (en) * 1982-09-29 1987-06-09 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer
US4756988A (en) * 1982-09-29 1988-07-12 Minnesota Mining And Manufacturing Company Multilayer dry-film negative-acting photoresist
US4983500A (en) * 1987-10-30 1991-01-08 Hitachi, Ltd. Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer
US4985344A (en) * 1986-07-04 1991-01-15 Hitachi, Ltd. Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2623925C2 (de) * 1975-06-03 1985-02-14 E.I. Du Pont De Nemours And Co., Wilmington, Del. Bildreproduktionsverfahren
US4316951A (en) 1975-06-03 1982-02-23 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4356251A (en) 1975-06-03 1982-10-26 E. I. Du Pont De Nemours And Company Multilayer photosensitive element with solvent-soluble layer
US4191572A (en) 1975-06-03 1980-03-04 E. I. Du Pont De Nemours And Company Process for image reproduction using multilayer photosensitive element with solvent-soluble layer
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
GB2047909B (en) * 1978-12-25 1982-10-06 Karpov V D Dry film photoresist
US4357416A (en) 1980-04-21 1982-11-02 E. I. Du Pont De Nemours And Company Process for preparation of multilayer photosensitive solvent-processable litho element
DE3036710A1 (de) * 1980-09-29 1982-05-13 Siemens AG, 1000 Berlin und 8000 München Verfahren zur erzeugung von photolackstrukuren
JPH0612452B2 (ja) * 1982-09-30 1994-02-16 ブリュ−ワ−・サイエンス・インコ−ポレイテッド 集積回路素子の製造方法
GB8418938D0 (en) * 1984-07-25 1984-08-30 Davies Bros Ltd Image on substrate
US4687720A (en) * 1984-12-21 1987-08-18 Hughes Aircraft Company Side lobe suppression in holograms using pre-exposure
US4815800A (en) * 1984-12-21 1989-03-28 Hughes Aircraft Company Flare reduction in holograms
US4799746A (en) * 1985-02-27 1989-01-24 Hughes Aircraft Company Efficient holograms and method for making same
US4854674A (en) * 1985-02-27 1989-08-08 Hughes Aircraft Company Process for improving holographic efficiency
CA1337864C (en) * 1988-03-28 1996-01-02 Isao Kobayashi Electrodeposition coating process of photoresist for printed circuit board
EP0433720A3 (en) * 1989-12-22 1992-08-26 Siemens Aktiengesellschaft Method of applying a solder stop coating on printed circuit boards
JP2004140313A (ja) * 2002-08-22 2004-05-13 Jsr Corp 二層積層膜を用いた電極パッド上へのバンプ形成方法
CN112980410B (zh) * 2021-02-25 2022-09-13 山东滨州昱诚化工科技有限公司 一种油田暂堵剂及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE711043C (de) * 1935-08-09 1941-09-25 Bekk & Kaulen Chem Fab G M B H Verfahren zum Herstellen von Flachdruckformen durch Projektion gerasterter Bilder
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0091651A3 (en) * 1982-04-12 1984-10-17 Nippon Telegraph And Telephone Public Corporation Method for forming micropattern
US4672020A (en) * 1982-09-29 1987-06-09 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer
US4756988A (en) * 1982-09-29 1988-07-12 Minnesota Mining And Manufacturing Company Multilayer dry-film negative-acting photoresist
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
EP0110145A3 (en) * 1982-11-01 1986-06-11 E.I. Du Pont De Nemours And Company Single exposure positive contact litho film
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
US4985344A (en) * 1986-07-04 1991-01-15 Hitachi, Ltd. Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer
US4983500A (en) * 1987-10-30 1991-01-08 Hitachi, Ltd. Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer

Also Published As

Publication number Publication date
NL7413916A (nl) 1975-04-29
AU466665B2 (en) 1975-11-06
AU7446074A (en) 1975-11-06
SE422631B (sv) 1982-03-15
JPS5072704A (enrdf_load_stackoverflow) 1975-06-16
DE2450380C2 (de) 1984-10-11
JPS5529426B2 (enrdf_load_stackoverflow) 1980-08-04
BE821421A (fr) 1975-04-24
FR2249364B1 (enrdf_load_stackoverflow) 1982-04-23
BR7408768D0 (pt) 1975-08-05
ZA746683B (en) 1975-11-26
ES448212A1 (es) 1977-12-01
FR2249364A1 (enrdf_load_stackoverflow) 1975-05-23
ES431310A1 (es) 1977-04-16
CA1051707A (en) 1979-04-03
IT1025144B (it) 1978-08-10
GB1493834A (en) 1977-11-30
DE2450380A1 (de) 1975-05-07
SE7412818L (enrdf_load_stackoverflow) 1975-04-28

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee