GB1488948A - Process for coating inorganic substrates with carbides nitrides and/or carbonitrides - Google Patents

Process for coating inorganic substrates with carbides nitrides and/or carbonitrides

Info

Publication number
GB1488948A
GB1488948A GB5349/75A GB534975A GB1488948A GB 1488948 A GB1488948 A GB 1488948A GB 5349/75 A GB5349/75 A GB 5349/75A GB 534975 A GB534975 A GB 534975A GB 1488948 A GB1488948 A GB 1488948A
Authority
GB
United Kingdom
Prior art keywords
alkyl
halogen
nitrides
carbides
carbonitrides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5349/75A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH170074A external-priority patent/CH595891A5/en
Priority claimed from CH170174A external-priority patent/CH593133A5/en
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of GB1488948A publication Critical patent/GB1488948A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

Abstract

1488948 Coating with carbides, nitrides and carbonitrides CIBA-GEIGY AG 7 Feb 1975 [7 Feb 1974 (2)] 5349/75 Heading C7F An inorganic substrate is coated with a carbide, nitride, or carbonitride by reacting at least one of Fe, B, Si, or a transition metal of Groups IVB to VIB, e.g. Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W and U with a source of carbon and nitrogen which is a compound of the Formula:- @ where Y represents = N-, = CH- or C-halogen, X 1 , X 2 , and X 3 may be the same or different and one of them is H, halogen, alkyl, phenyl, -CN, and each of the other two is halogen, where R 1 , R 3 and R 4 are H, alkyl, halogenoalkyl, cyanoalkyl, aminoalkyl, alkylaminoalkyl or albenyl, R2 is alkyl, halogenoalkyl, cyanoalkyl, aminoalkyl, alkylaminoalkyl, or alkenyl, and Rs is H or alkyl. Several of the compounds are specified. The Fe, B, Si or transition metals may be in the form of elements, hydrides, carbonyls, organometallic compounds, and halides. Several examples are described. The process can be carried out in the presence of H, HCl, N, methane, ethane, n-butane, N- methylamine, N,N-diethylamine, ethylenediamine, benzene and ammonia. The reaction may be gaseous and a plasma may be used. Alternatively, liquid or solid phase reactions may be used. The substrates may be carbon, glass, ceramic, oxides, nitrides, steel, cast iron, W, Mo, Nb, V, Ta, B, Si or sintered carbides with e.g. cobalt as a binder.
GB5349/75A 1974-02-07 1975-02-07 Process for coating inorganic substrates with carbides nitrides and/or carbonitrides Expired GB1488948A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH170074A CH595891A5 (en) 1974-02-07 1974-02-07 Hard coating of carbides or (carbo)nitrides
CH170174A CH593133A5 (en) 1974-02-07 1974-02-07 Hard coating of carbides or (carbo)nitrides - applied by direct thermal reaction of iron, boron, silicon, etc., with di- or triazine cpd.

Publications (1)

Publication Number Publication Date
GB1488948A true GB1488948A (en) 1977-10-19

Family

ID=25688419

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5349/75A Expired GB1488948A (en) 1974-02-07 1975-02-07 Process for coating inorganic substrates with carbides nitrides and/or carbonitrides

Country Status (6)

Country Link
JP (1) JPS5750869B2 (en)
AT (1) AT334708B (en)
CA (1) CA1053547A (en)
FR (1) FR2273078B1 (en)
GB (1) GB1488948A (en)
SE (1) SE410622B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6501560B2 (en) * 2015-03-06 2019-04-17 東京エレクトロン株式会社 Method and apparatus for forming silicon nitride film

Also Published As

Publication number Publication date
CA1053547A (en) 1979-05-01
AT334708B (en) 1976-02-10
FR2273078B1 (en) 1977-04-15
DE2505007A1 (en) 1975-08-14
SE7501313L (en) 1975-08-08
DE2505007B2 (en) 1977-06-30
SE410622B (en) 1979-10-22
ATA92175A (en) 1976-05-15
FR2273078A1 (en) 1975-12-26
JPS5750869B2 (en) 1982-10-29
JPS50109826A (en) 1975-08-29

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee