SE7501313L - - Google Patents

Info

Publication number
SE7501313L
SE7501313L SE7501313A SE7501313A SE7501313L SE 7501313 L SE7501313 L SE 7501313L SE 7501313 A SE7501313 A SE 7501313A SE 7501313 A SE7501313 A SE 7501313A SE 7501313 L SE7501313 L SE 7501313L
Authority
SE
Sweden
Application number
SE7501313A
Other versions
SE410622B (en
Inventor
D Bitzer
D Lohmann
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH170074A external-priority patent/CH595891A5/en
Priority claimed from CH170174A external-priority patent/CH593133A5/en
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of SE7501313L publication Critical patent/SE7501313L/xx
Publication of SE410622B publication Critical patent/SE410622B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
SE7501313A 1974-02-07 1975-02-06 PROCEDURE FOR COATING INORGANIC SUBSTRATES WITH LAYERS OF CARBIDES, NITRIDES AND / OR CARBONITRIDES SE410622B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH170074A CH595891A5 (en) 1974-02-07 1974-02-07 Hard coating of carbides or (carbo)nitrides
CH170174A CH593133A5 (en) 1974-02-07 1974-02-07 Hard coating of carbides or (carbo)nitrides - applied by direct thermal reaction of iron, boron, silicon, etc., with di- or triazine cpd.

Publications (2)

Publication Number Publication Date
SE7501313L true SE7501313L (en) 1975-08-08
SE410622B SE410622B (en) 1979-10-22

Family

ID=25688419

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7501313A SE410622B (en) 1974-02-07 1975-02-06 PROCEDURE FOR COATING INORGANIC SUBSTRATES WITH LAYERS OF CARBIDES, NITRIDES AND / OR CARBONITRIDES

Country Status (6)

Country Link
JP (1) JPS5750869B2 (en)
AT (1) AT334708B (en)
CA (1) CA1053547A (en)
FR (1) FR2273078B1 (en)
GB (1) GB1488948A (en)
SE (1) SE410622B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6501560B2 (en) * 2015-03-06 2019-04-17 東京エレクトロン株式会社 Method and apparatus for forming silicon nitride film
KR20210127620A (en) * 2020-04-13 2021-10-22 에이에스엠 아이피 홀딩 비.브이. method of forming a nitrogen-containing carbon film and system for performing the method

Also Published As

Publication number Publication date
DE2505007B2 (en) 1977-06-30
AT334708B (en) 1976-02-10
CA1053547A (en) 1979-05-01
ATA92175A (en) 1976-05-15
FR2273078A1 (en) 1975-12-26
GB1488948A (en) 1977-10-19
JPS5750869B2 (en) 1982-10-29
DE2505007A1 (en) 1975-08-14
JPS50109826A (en) 1975-08-29
SE410622B (en) 1979-10-22
FR2273078B1 (en) 1977-04-15

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