JPS5750869B2 - - Google Patents

Info

Publication number
JPS5750869B2
JPS5750869B2 JP50016169A JP1616975A JPS5750869B2 JP S5750869 B2 JPS5750869 B2 JP S5750869B2 JP 50016169 A JP50016169 A JP 50016169A JP 1616975 A JP1616975 A JP 1616975A JP S5750869 B2 JPS5750869 B2 JP S5750869B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50016169A
Other languages
Japanese (ja)
Other versions
JPS50109826A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH170174A external-priority patent/CH593133A5/en
Priority claimed from CH170074A external-priority patent/CH595891A5/en
Application filed filed Critical
Publication of JPS50109826A publication Critical patent/JPS50109826A/ja
Publication of JPS5750869B2 publication Critical patent/JPS5750869B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
JP50016169A 1974-02-07 1975-02-07 Expired JPS5750869B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH170174A CH593133A5 (en) 1974-02-07 1974-02-07 Hard coating of carbides or (carbo)nitrides - applied by direct thermal reaction of iron, boron, silicon, etc., with di- or triazine cpd.
CH170074A CH595891A5 (en) 1974-02-07 1974-02-07 Hard coating of carbides or (carbo)nitrides

Publications (2)

Publication Number Publication Date
JPS50109826A JPS50109826A (en) 1975-08-29
JPS5750869B2 true JPS5750869B2 (en) 1982-10-29

Family

ID=25688419

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50016169A Expired JPS5750869B2 (en) 1974-02-07 1975-02-07

Country Status (6)

Country Link
JP (1) JPS5750869B2 (en)
AT (1) AT334708B (en)
CA (1) CA1053547A (en)
FR (1) FR2273078B1 (en)
GB (1) GB1488948A (en)
SE (1) SE410622B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6501560B2 (en) * 2015-03-06 2019-04-17 東京エレクトロン株式会社 Method and apparatus for forming silicon nitride film
KR20210127620A (en) * 2020-04-13 2021-10-22 에이에스엠 아이피 홀딩 비.브이. method of forming a nitrogen-containing carbon film and system for performing the method

Also Published As

Publication number Publication date
AT334708B (en) 1976-02-10
DE2505007A1 (en) 1975-08-14
SE410622B (en) 1979-10-22
ATA92175A (en) 1976-05-15
FR2273078A1 (en) 1975-12-26
CA1053547A (en) 1979-05-01
FR2273078B1 (en) 1977-04-15
JPS50109826A (en) 1975-08-29
SE7501313L (en) 1975-08-08
GB1488948A (en) 1977-10-19
DE2505007B2 (en) 1977-06-30

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